公开(公告)号：SG120263A1

公开(公告)日：2006-03-28

申请号：SG200505153

申请日：2005-08-12

Applicant: ASML NETHERLANDS BV

Inventor： DEN BOEF ARIE JEFFREY ,  BLEEKER ARNO JAN ,  VAN DOMMELEN YOURI JOHANNES LA ,  DUSA MIRCEA ,  KIERS ANTOINE GASTON MARIE ,  LUEHRMANN PAUL FRANK ,  PELLEMAN HENRICUS PETRUS MARIA ,  VAN DER SCHAAR MAURITS ,  GROUWSTRA CEDRIC DESIRE ,  VAN KRAAIJ MARKUS GERARDUS MAR

Abstract: An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized light and their relative phase difference. The apparatus according to the invention may be used for calculating variations in substrate tilt by putting a shaped obscuration in the radiation beam and detecting changes in the width and shape of the shaped obscuration on the substrate caused by variations in the substrate tilt. The shaped obscuration may be a cross-hair or any other shape. The idea of measuring wafer tilt is based on the fundamental relation that a tilt in the wafer plane causes a shift in the pupil plane.