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    Lithographic apparatus, and device manufacturing method
    2.
    发明专利
    Lithographic apparatus, and device manufacturing method 有权
    LITHOGRAPHIC设备和设备制造方法

    公开(公告)号：JP2008078648A

    公开(公告)日：2008-04-03

    申请号：JP2007237470

    申请日：2007-09-13

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： STREEFKERK BOB ,  VAN DOMMELEN YOURI JOHANNES LA ,  MOERMAN RICHARD ,  GROUWSTRA CEDRIC DESIRE

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70341 ,  G03F7/70425

    Abstract: PROBLEM TO BE SOLVED: To provide an apparatus and an operation method which reduce defects caused by using an immersion liquid in an immersion liquid lithographic apparatus. SOLUTION: A lithographic apparatus comprises: a support configured to support a patterning device, where the patterning device can impart a radiation beam with a pattern in its cross-section, to form a patterned radiation beam; a substrate table configured to hold a substrate; a liquid supply system configured to provide a liquid to a local area of a top surface of a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate through the liquid; and a controller adapted to coordinate movement of the substrate table and the support during imaging of a line of dies across the substrate and this is accomplished by movement of the line of dies under the projection system backwards and/or forwards only in a direction substantially parallel to a first direction, where the first direction is in a plane substantially parallel to the top surface. COPYRIGHT: (C)2008,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种减少在浸没液体光刻设备中使用浸没液体引起的缺陷的设备和操作方法。 光刻设备包括：构造成支撑图案形成装置的支撑件，其中图案形成装置可以在其横截面中赋予具有图案的辐射束，以形成图案化的辐射束; 被配置为保持基板的基板台; 液体供应系统，被配置为向衬底的顶表面的局部区域提供液体; 投影系统，被配置为通过液体将图案化的辐射束投影到基板的目标部分上; 以及控制器，其适于在穿过衬底的一行模具成像期间协调衬底台和支撑件的运动，并且这通过在投影系统下方的模具线在大致平行的方向上向后和/或向前移动来实现 到第一方向，其中第一方向在基本上平行于顶表面的平面中。 版权所有（C）2008，JPO＆INPIT

    Immersion lithography
    4.
    发明专利
    Immersion lithography 有权
    倾斜图

    公开(公告)号：JP2009177162A

    公开(公告)日：2009-08-06

    申请号：JP2008328877

    申请日：2008-12-25

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： DE VRIES DIRK ,  MOERMAN RICHARD ,  GROUWSTRA CEDRIC DESIRE ,  VAN ROOY MICHEL FRANCISCUS JOH

    IPC: H01L21/027

    CPC classification number: G03F7/70916 ,  G03F7/70341 ,  G03F7/70608

    Abstract: PROBLEM TO BE SOLVED: To reduce the presence of particles in an immersion system, and/or at least obtain information indicative of a defect so that it may be better understood with the aim of reducing its occurrence or number.
    SOLUTION: A method is disclosed that obtains information related to a defect 110 present during irradiation of a substrate W coated with a layer of radiation sensitive material using immersion lithography. The method includes irradiating an area of the radiation sensitive material with a non-patterned radiation beam, the area being irradiated with a dose which is sufficient for the radiation sensitive material to be substantially removed during subsequent development of the radiation sensitive material if the radiation sensitive material is a positive radiation sensitive material, or with a dose which is sufficient for the radiation sensitive material to be substantially insoluble during subsequent development of the radiation sensitive material if the radiation sensitive material is a negative radiation sensitive material. The method further includes developing the radiation sensitive material and obtaining information at least indicative of the topography of radiation sensitive material remaining on the substrate after the radiation sensitive material has been developed in order to obtain information related to the defect.
    COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题：为了减少沉浸系统中的颗粒的存在，和/或至少获得指示缺陷的信息，以便可以更好地理解为了减少其发生或数量。 解决方案：公开了一种方法，其获得与使用浸渍光刻法涂覆有辐射敏感材料层的基板W的照射期间存在的缺陷110相关的信息。 该方法包括用未图案化的辐射束照射辐射敏感材料的区域，如果辐射敏感材料的辐射敏感材料的后续显影期间，该辐射敏感材料的辐射敏感材料的辐射敏感材料的辐照敏感材料的辐射敏感材料的辐照敏感材料 材料是正的辐射敏感材料，或者如果辐射敏感材料是负辐射敏感材料，则辐射敏感材料在辐射敏感材料的后续显影期间足以使辐射敏感材料基本上不溶的剂量。 该方法还包括开发辐射敏感材料并获得至少指示辐射敏感材料已被开发之后剩余在基底上的辐射敏感材料的形貌的信息，以获得与该缺陷有关的信息。 版权所有（C）2009，JPO＆INPIT

    Lithographic apparatus, and device manufacturing method
    5.
    发明专利
    Lithographic apparatus, and device manufacturing method 有权
    LITHOGRAPHIC设备和设备制造方法

    公开(公告)号：JP2011018915A

    公开(公告)日：2011-01-27

    申请号：JP2010187099

    申请日：2010-08-24

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： STREEFKERK BOB ,  VAN DOMMELEN YOURI JOHANNES LAURENTIUS MARIA ,  MOERMAN RICHARD ,  GROUWSTRA CEDRIC DESIRE

    IPC: H01L21/027

    CPC classification number: G03F7/70341 ,  G03F7/70425

    Abstract: PROBLEM TO BE SOLVED: To reduce defects caused by using an immersion liquid in an immersion liquid lithographic apparatus.SOLUTION: The lithographic apparatus includes: a support configured to support a patterning device, where the patterning device can impart a radiation beam with a pattern in its cross-section, to form a patterned radiation beam; a substrate table configured to hold a substrate; a liquid supply system configured to provide a liquid to a local area of a top surface of a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate through the liquid. The lithographic apparatus is configured to coordinate movement of the substrate table and the support during imaging of a line of dies across the substrate and this is accomplished by movement of the line of dies under the projection system backwards and/or forwards only in a direction substantially parallel to a first direction, where the first direction is in a plane substantially parallel to the top surface.

    Abstract translation: 要解决的问题：减少在浸没液体光刻设备中使用浸没液体引起的缺陷。解决方案：光刻设备包括：支撑构造成支撑图案形成装置的支撑件，其中图案形成装置可以将辐射束赋予图案 其横截面，以形成图案化的辐射束; 被配置为保持基板的基板台; 液体供应系统，被配置为向衬底的顶表面的局部区域提供液体; 以及投影系统，被配置为通过液体将图案化的辐射束投影到基板的目标部分上。 光刻设备被配置为在跨越衬底的一行模具成像期间协调衬底台和支撑件的移动，并且这通过在投影系统下方的模具线在大致方向上向后和/或向前移动来实现 平行于第一方向，其中第一方向在基本上平行于顶表面的平面中。

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