公开(公告)号：SG143241A1

公开(公告)日：2008-06-27

申请号：SG2007184781

申请日：2007-12-10

Applicant: ASML NETHERLANDS BV

Inventor： HENNUS PIETER RENAAT MARIA ,  FRITS VAN DER MEULEN ,  OTTENS JOOST JEROEN ,  STEIJAERT PETER PAUL ,  STEIJNS HUBERT MATTHIEU RICHAR ,  PETER SMITS

Abstract: Substrate support and lithographic process A substrate support constructed to support a substrate for immersion lithographic processing is disclosed. The substrate support has a central part and a peripheral part, the peripheral part comprising an extraction duct configured to extract a liquid from a top surface of the substrate support, the extraction duct connected to an exit duct configured to duct the liquid away from the substrate support. The substrate support further includes a thermal decoupler, arranged in the peripheral part, configured to arranged to decrease heat transport between the central part and the peripheral part.