公开(公告)号：SG143241A1

公开(公告)日：2008-06-27

申请号：SG2007184781

申请日：2007-12-10

Applicant: ASML NETHERLANDS BV

Inventor： HENNUS PIETER RENAAT MARIA ,  FRITS VAN DER MEULEN ,  OTTENS JOOST JEROEN ,  STEIJAERT PETER PAUL ,  STEIJNS HUBERT MATTHIEU RICHAR ,  PETER SMITS

Abstract: Substrate support and lithographic process A substrate support constructed to support a substrate for immersion lithographic processing is disclosed. The substrate support has a central part and a peripheral part, the peripheral part comprising an extraction duct configured to extract a liquid from a top surface of the substrate support, the extraction duct connected to an exit duct configured to duct the liquid away from the substrate support. The substrate support further includes a thermal decoupler, arranged in the peripheral part, configured to arranged to decrease heat transport between the central part and the peripheral part.

公开(公告)号：SG178675A1

公开(公告)日：2012-03-29

申请号：SG2011057411

申请日：2011-08-10

Applicant: ASML NETHERLANDS BV

Inventor： WESTERLAKEN JAN STEVEN CHRISTIAAN ,  VAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS ,  STEIJAERT PETER PAUL ,  VAN DE MAST FRANCISCUS ,  JANSSEN GERARDUS ARNOLDUS HENDRICUS FRANCISCUS

Abstract: A lithographic apparatus having a first outlet to provide a thermally conditioned fluidwith a first flow characteristic to at least part of a sensor beam path, and a second outlet associated with the first outlet and to provide a thermally conditioned fluid with a second flow characteristic, different to the first flow characteristic, adjacent the thermally conditioned fluid from the first outlet.[Fig. 1]

公开(公告)号：NL1036709A1

公开(公告)日：2009-10-27

申请号：NL1036709

申请日：2009-03-13

Applicant: ASML NETHERLANDS BV

Inventor： WATSO ROBERT DOUGLAS ,  DOMMELEN YOURI JOHANNES LAURENTIUS MARIA VAN ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  JANSEN HANS ,  LEENDERS MARTINUS HENDRIKUS ANTONIUS ,  MERTENS JEROEN JOHANNES SOPHIA ,  STEIJAERT PETER PAUL ,  JONG ANTHONIUS MARTINUS CORNELIS PETRUS DE ,  WINKEL JIMMY MATHEUS WILHELMUS ,  SENA JOAO PAULO DA PAZ ,  LEE MAURICE MARTINUS JOHANNES ,  LIER HENRICUS MARTINUS DOROTHE ,  TANASA GHEORGHE

IPC: G03F7/20