公开(公告)号：KR20100135198A

公开(公告)日：2010-12-24

申请号：KR20100056706

申请日：2010-06-15

Applicant: ASML NETHERLANDS BV

Inventor： DIRECKS DANIEL JOZEF MARIA ,  KEMPER NICOLAAS RUDOLF ,  PHILIPS DANNY MARIA HUBERTUS ,  RIEPEN MICHEL ,  VAN DEN DUNGEN CLEMENS JOHANNES GERARDUS ,  SCHEPERS MAIKEL ADRIANUS CORNELIS

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  H01L21/0274 ,  G03F7/2041 ,  G03F7/7085

Abstract: PURPOSE: A lithography apparatus, a method for controlling the same, and a method for manufacturing a device using the same are provided to reduce the generation risk of imaging defects by supplying immersing liquid into a space between a projection system and an opposite surface. CONSTITUTION: Patterned radiation beam directs toward a substrate through a projection system. The substrate is supported by a table. A liquid handling system supplies immersing liquid into a space between the projection system and an opposite surface. The structure of an opening(70) affects the influence of a liquid handling structure(12) in which the liquid is contained. A controller controls the operation of the table with respect to the liquid handling system.

Abstract translation: 目的：提供一种光刻设备及其控制方法，以及使用该方法的设备的制造方法，以通过将浸入液体供入投影系统与相对面之间的空间来降低成像缺陷的产生风险。 构成：图案化的辐射束通过投影系统指向衬底。 基板由桌子支撑。 液体处理系统将浸入液体提供到投影系统和相对表面之间的空间中。 开口（70）的结构影响液体处理结构（12）的含有液体的影响。 控制器控制工作台相对于液体处理系统的操作。

公开(公告)号：NL1038041A

公开(公告)日：2010-08-02

申请号：NL1038041

申请日：2010-06-14

Applicant: ASML NETHERLANDS BV

Inventor： PHILIPS DANNY MARIA HUBERTUS ,  DIRECKS DANIEL JOZEF MARIA ,  SCHEPERS MAIKEL ADRIANUS CORNELIS ,  BERKVENS PAUL PETRUS JOANNES

IPC: G03F7/20