公开(公告)号：KR20100135198A

公开(公告)日：2010-12-24

申请号：KR20100056706

申请日：2010-06-15

Applicant: ASML NETHERLANDS BV

Inventor： DIRECKS DANIEL JOZEF MARIA ,  KEMPER NICOLAAS RUDOLF ,  PHILIPS DANNY MARIA HUBERTUS ,  RIEPEN MICHEL ,  VAN DEN DUNGEN CLEMENS JOHANNES GERARDUS ,  SCHEPERS MAIKEL ADRIANUS CORNELIS

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  H01L21/0274 ,  G03F7/2041 ,  G03F7/7085

Abstract: PURPOSE: A lithography apparatus, a method for controlling the same, and a method for manufacturing a device using the same are provided to reduce the generation risk of imaging defects by supplying immersing liquid into a space between a projection system and an opposite surface. CONSTITUTION: Patterned radiation beam directs toward a substrate through a projection system. The substrate is supported by a table. A liquid handling system supplies immersing liquid into a space between the projection system and an opposite surface. The structure of an opening(70) affects the influence of a liquid handling structure(12) in which the liquid is contained. A controller controls the operation of the table with respect to the liquid handling system.

Abstract translation: 目的：提供一种光刻设备及其控制方法，以及使用该方法的设备的制造方法，以通过将浸入液体供入投影系统与相对面之间的空间来降低成像缺陷的产生风险。 构成：图案化的辐射束通过投影系统指向衬底。 基板由桌子支撑。 液体处理系统将浸入液体提供到投影系统和相对表面之间的空间中。 开口（70）的结构影响液体处理结构（12）的含有液体的影响。 控制器控制工作台相对于液体处理系统的操作。

公开(公告)号：KR20100098479A

公开(公告)日：2010-09-07

申请号：KR20100067520

申请日：2010-07-13

Applicant: ASML NETHERLANDS BV

Inventor： BERKVENS PAUL PETRUS JOANNES ,  DE GRAAF ROELOF FREDERIK ,  LEIBREGTS PAULUS MARTINUS MARIA ,  VAN DER HAM RONALD ,  SIMONS WILHELMUS FRANCISCUS JOHANNES ,  DIRECKS DANIEL JOZEF MARIA ,  JANSSEN FRANCISCUS JOHANNES JOSEPH ,  SCHOLTES PAUL WILLIAM ,  BRANDS GERT JAN GERARDUS JOHANNES THOMAS ,  STEFFENS KOEN ,  LEMPENS HAN HENRICUS ALDEGONDA ,  VAN LIEROP MATHIEUS ANNA KAREL ,  DE METSENAERE CHRISTOPHE ,  MIRANDA MARCIO ALEXANDRE CANO ,  SPRUYTENBURG PATRICK JOHANNES WILHELMUS ,  VERSTRAETE JORIS JOHAN ANNE MARIE

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/2041 ,  H01L21/0274 ,  H01L21/0275

Abstract: PURPOSE: A lithography apparatus and a method for manufacturing a device are provided to control the flow of fluid through a fluid inlet by varying the flux of the fluid. CONSTITUTION: An illuminator(IL) receives a radiation beam(B) from a radiation source(SO). The illuminator includes an adjusting unit(AD) which adjusts the angular intensity distribution of the radiation beam. The radiation beam passes through a projection system(PS) and is focused on the target parts(C) on a substrate(W). A first location setting unit(PM) accurately locates a pattern device(MA). A substrate table(WT) moves to locate the target parts in the path of the radiation beam.

Abstract translation: 目的：提供一种光刻设备和用于制造器件的方法，以通过改变流体的通量来控制通过流体入口的流体流动。 构成：照射器（IL）从辐射源（SO）接收辐射束（B）。 照明器包括调节单元（AD），该调节单元调节辐射束的角度强度分布。 辐射束通过投影系统（PS）并聚焦在基底（W）上的目标部分（C）上。 第一位置设置单元（PM）精确地定位图案设备（MA）。 衬底台（WT）移动以将目标部件定位在辐射束的路径中。

公开(公告)号：NL1036253A1

公开(公告)日：2009-06-11

申请号：NL1036253

申请日：2008-11-28

Applicant: ASML NETHERLANDS BV

Inventor： STEFFENS KOEN ,  LIEBREGTS PAULUS MARTINUS MARIA ,  HAM RONALD VAN DER ,  DIRECKS DANIEL JOZEF MARIA ,  BRANDS GERT-JAN GERARDUS JOHAN

IPC: G03F7/20 ,  G03F9/00

公开(公告)号：NL1038041A

公开(公告)日：2010-08-02

申请号：NL1038041

申请日：2010-06-14

Applicant: ASML NETHERLANDS BV

Inventor： PHILIPS DANNY MARIA HUBERTUS ,  DIRECKS DANIEL JOZEF MARIA ,  SCHEPERS MAIKEL ADRIANUS CORNELIS ,  BERKVENS PAUL PETRUS JOANNES

IPC: G03F7/20

公开(公告)号：SG157283A1

公开(公告)日：2009-12-29

申请号：SG2009023326

申请日：2009-04-03

Applicant: ASML NETHERLANDS BV

Inventor： DIRECKS DANIEL JOZEF MARIA ,  PHILIPS DANNY MARIA HUBERTUS ,  VAN DEN DUNGEN CLEMENS JOHANNES GERARDUS ,  STEFFENS KOEN ,  VAN PUTTEN ARNOLD JAN

Abstract: A fluid handling structure is disclosed in which measures are taken to increase the speed at which meniscus breakdown occurs. Measures include the shape of a plurality of fluid extraction openings and the shape and density of a plurality of fluid supply openings in the fluid handling structure.

公开(公告)号：NL1035816A1

公开(公告)日：2009-03-16

申请号：NL1035816

申请日：2008-08-12

Applicant: ASML NETHERLANDS BV

Inventor： BERKVENS PAUL PETRUS JOANNES ,  GRAAF ROELOF FREDERIK DE ,  LIEBREGTS PAULUS MARTINUS MARIA ,  HAM RONALD VAN DER ,  SIMONS WILHELMUS FRANCISCUS JOHANNES ,  DIRECKS DANIEL JOZEF MARIA ,  JANSSEN FRANCISCUS JOHANNES JOSEPH ,  SCHOLTES PAUL WILLIAM ,  BRANDS GERT-JAN GERARDUS JOHANNES THOMAS ,  STEFFENS KOEN ,  LEMPENS HAN HENRICUS ALDEGONDA ,  LIEROP MATHIEUS ANNA KAREL VAN ,  METSENAERE CHRISTOPHE DE ,  MIRANDA MARCIO ALEXANDRE CANO ,  SPRUYTENBURG PATRICK JOHANNES WILHELMUS ,  VERSTRAETE JORIS JOHAN ANNE-MARIE

IPC: G03F7/20 ,  H01L21/027

公开(公告)号：SG157300A1

公开(公告)日：2009-12-29

申请号：SG2009031923

申请日：2009-05-08

Applicant: ASML NETHERLANDS BV

Inventor： RIEPEN MICHEL ,  KEMPER NICOLAAS RUDOLF ,  VERMEULEN JOHANNES PETRUS MART ,  DIRECKS DANIEL JOZEF MARIA ,  PHILIPS DANNY MARIA HUBERTUS ,  VAN PUTTEN ARNOLD JAN

Abstract: An immersion lithographic apparatus is described in which a liquid removal device is arranged to remove liquid from the substrate, e.g. during exposures, through a plurality of elongate slots arranged along a line and angled to that line. The liquid removal device may act as a meniscus pinning device in an immersion hood or may be used in a drying device to remove a droplet from the substrate.

公开(公告)号：NL1036631A1

公开(公告)日：2009-09-25

申请号：NL1036631

申请日：2009-02-25

Applicant: ASML NETHERLANDS BV

Inventor： DIRECKS DANIEL JOZEF MARIA ,  KEMPER NICOLAAS RUDOLF ,  LIEBREGTS PAULUS MARTINUS MARIA ,  HAM RONALD VAN DER ,  SIMONS WILHELMUS FRANCISCUS JO ,  PHILIPS DANNY MARIA HUBERTUS ,  BRANDS GERT-JAN GERARDUS JOHANNES ,  STEFFENS KOEN ,  LEMPENS HAN HENRICUS ALDEGONDA ,  ZANDEN MARCUS JOHANNES VAN DER ,  MULDER PIETER

IPC: G03F7/20