公开(公告)号：KR20100135198A

公开(公告)日：2010-12-24

申请号：KR20100056706

申请日：2010-06-15

Applicant: ASML NETHERLANDS BV

Inventor： DIRECKS DANIEL JOZEF MARIA ,  KEMPER NICOLAAS RUDOLF ,  PHILIPS DANNY MARIA HUBERTUS ,  RIEPEN MICHEL ,  VAN DEN DUNGEN CLEMENS JOHANNES GERARDUS ,  SCHEPERS MAIKEL ADRIANUS CORNELIS

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70341 ,  H01L21/0274 ,  G03F7/2041 ,  G03F7/7085

Abstract: PURPOSE: A lithography apparatus, a method for controlling the same, and a method for manufacturing a device using the same are provided to reduce the generation risk of imaging defects by supplying immersing liquid into a space between a projection system and an opposite surface. CONSTITUTION: Patterned radiation beam directs toward a substrate through a projection system. The substrate is supported by a table. A liquid handling system supplies immersing liquid into a space between the projection system and an opposite surface. The structure of an opening(70) affects the influence of a liquid handling structure(12) in which the liquid is contained. A controller controls the operation of the table with respect to the liquid handling system.

Abstract translation: 目的：提供一种光刻设备及其控制方法，以及使用该方法的设备的制造方法，以通过将浸入液体供入投影系统与相对面之间的空间来降低成像缺陷的产生风险。 构成：图案化的辐射束通过投影系统指向衬底。 基板由桌子支撑。 液体处理系统将浸入液体提供到投影系统和相对表面之间的空间中。 开口（70）的结构影响液体处理结构（12）的含有液体的影响。 控制器控制工作台相对于液体处理系统的操作。

公开(公告)号：NL1036715A1

公开(公告)日：2009-10-19

申请号：NL1036715

申请日：2009-03-17

Applicant: ASML NETHERLANDS BV

Inventor： DUNGEN CLEMENS JOHANNES GERARD VAN DEN ,  KOPPELAARS NICOLAAS FRANCISCUS ,  LEENDERS MARTINUS HENDRIKUS ANTONIUS ,  LIEBREGTS PAULUS MARTINUS MARIA ,  MULKENS JOHANNES CATHARINUS HUBERTUS ,  EUMMELEN ERIK HENRICUS EGIDIUS ,  BECKERS MARCEL ,  MOERMAN RICHARD ,  GROUWSTRA CEDRIC DESIRE ,  PHILIPS DANNY MARIA HUBERTUS ,  VERHEES REMKO JAN PETER ,  MULDER PIETER ,  VLIET EVERT VAN

IPC: G03F7/20

公开(公告)号：NL1038041A

公开(公告)日：2010-08-02

申请号：NL1038041

申请日：2010-06-14

Applicant: ASML NETHERLANDS BV

Inventor： PHILIPS DANNY MARIA HUBERTUS ,  DIRECKS DANIEL JOZEF MARIA ,  SCHEPERS MAIKEL ADRIANUS CORNELIS ,  BERKVENS PAUL PETRUS JOANNES

IPC: G03F7/20

公开(公告)号：SG159467A1

公开(公告)日：2010-03-30

申请号：SG2009054792

申请日：2009-08-17

Applicant: ASML NETHERLANDS BV

Inventor： TANASA GHEORGHE ,  TEN KATE NICOLAAS ,  VERMEULEN JOHANNES PETRUS MARTINUS BERNARDUS ,  PHILIPS DANNY MARIA HUBERTUS ,  SCHEPERS MAIKEL ADRIANUS CORNERLIS ,  VAN BOKHOVEN LAURENTIUS JOHANNES ADRIANUS

Abstract: A fluid handling structure is disclosed which is designed for all wet immersion lithography. The fluid handling structure has a first opening to provide fluid to a space between a final element of a projection system and a substrate and/or substrate table, a barrier to resist the flow of liquid out of the space between the fluid handling structure and the substrate, and a second opening, which opens into an area radially outwardly of the space, to provide a flow of fluid from the fluid handling structure onto a top surface of the substrate and/or substrate table radially outwardly of the space. A controller may be provided such that flow of fluid towards a center of the substrate table is greater than the flow of fluid in a direction away from the center of the substrate table. [Figure 6]

公开(公告)号：SG157283A1

公开(公告)日：2009-12-29

申请号：SG2009023326

申请日：2009-04-03

Applicant: ASML NETHERLANDS BV

Inventor： DIRECKS DANIEL JOZEF MARIA ,  PHILIPS DANNY MARIA HUBERTUS ,  VAN DEN DUNGEN CLEMENS JOHANNES GERARDUS ,  STEFFENS KOEN ,  VAN PUTTEN ARNOLD JAN

Abstract: A fluid handling structure is disclosed in which measures are taken to increase the speed at which meniscus breakdown occurs. Measures include the shape of a plurality of fluid extraction openings and the shape and density of a plurality of fluid supply openings in the fluid handling structure.

公开(公告)号：SG157300A1

公开(公告)日：2009-12-29

申请号：SG2009031923

申请日：2009-05-08

Applicant: ASML NETHERLANDS BV

Inventor： RIEPEN MICHEL ,  KEMPER NICOLAAS RUDOLF ,  VERMEULEN JOHANNES PETRUS MART ,  DIRECKS DANIEL JOZEF MARIA ,  PHILIPS DANNY MARIA HUBERTUS ,  VAN PUTTEN ARNOLD JAN

Abstract: An immersion lithographic apparatus is described in which a liquid removal device is arranged to remove liquid from the substrate, e.g. during exposures, through a plurality of elongate slots arranged along a line and angled to that line. The liquid removal device may act as a meniscus pinning device in an immersion hood or may be used in a drying device to remove a droplet from the substrate.

公开(公告)号：NL1036631A1

公开(公告)日：2009-09-25

申请号：NL1036631

申请日：2009-02-25

Applicant: ASML NETHERLANDS BV

Inventor： DIRECKS DANIEL JOZEF MARIA ,  KEMPER NICOLAAS RUDOLF ,  LIEBREGTS PAULUS MARTINUS MARIA ,  HAM RONALD VAN DER ,  SIMONS WILHELMUS FRANCISCUS JO ,  PHILIPS DANNY MARIA HUBERTUS ,  BRANDS GERT-JAN GERARDUS JOHANNES ,  STEFFENS KOEN ,  LEMPENS HAN HENRICUS ALDEGONDA ,  ZANDEN MARCUS JOHANNES VAN DER ,  MULDER PIETER

IPC: G03F7/20