公开(公告)号：NL2004547A

公开(公告)日：2010-11-18

申请号：NL2004547

申请日：2010-04-13

Applicant: ASML NETHERLANDS BV

Inventor： METSENAERE CHRISTOPHE ,  KUNST RONALD ,  BERKVENS PAUL ,  SCHNEIDERS MAURITIUS ,  WINKEL JIMMY ,  CORCORAN GREGORY

IPC: G03F7/20

Abstract: An immersion lithographic apparatus has a pressure sensor configured to measure the pressure of immersion liquid in a space between the substrate and a projection system. A control system is responsive to a pressure signal generated by the pressure sensor and controls a positioner to exert a force on the substrate table to compensate for the force exerted on the substrate table by the immersion liquid.