公开(公告)号：NL2009272A

公开(公告)日：2013-03-04

申请号：NL2009272

申请日：2012-08-03

Applicant: ASML NETHERLANDS BV

Inventor： THOMAS IVO ,  VERSPAGET COEN ,  HAM RONALD ,  LAURENT THIBAULT ,  CORCORAN GREGORY ,  BLOKS RUUD ,  PIETERSE GERBEN ,  GUNTER PIETER

IPC: G03F7/20

公开(公告)号：NL2006913A

公开(公告)日：2012-01-17

申请号：NL2006913

申请日：2011-06-09

Applicant: ASML NETHERLANDS BV

Inventor： LAURENT THIBAULT ,  KUNNEN JOHAN ,  BADIE RAMIN ,  KUSTERS GERARDUS ,  KNARREN BASTIAAN ,  LAFARRE RAYMOND ,  STEFFENS KOEN ,  KANEKO TAKESHI ,  VOOGD ROBBERT JAN ,  CORCORAN GREGORY ,  BLOKS RUUD

IPC: G03F7/20

公开(公告)号：NL2009692A

公开(公告)日：2013-06-10

申请号：NL2009692

申请日：2012-10-25

Applicant: ASML NETHERLANDS BV

Inventor： POLET THEODORUS ,  COX HENRIKUS ,  HAM RONALD ,  SIMONS WILHELMUS ,  WINKEL JIMMY ,  CORCORAN GREGORY ,  BOXTEL FRANK

IPC: G03F7/20

公开(公告)号：NL2004547A

公开(公告)日：2010-11-18

申请号：NL2004547

申请日：2010-04-13

Applicant: ASML NETHERLANDS BV

Inventor： METSENAERE CHRISTOPHE ,  KUNST RONALD ,  BERKVENS PAUL ,  SCHNEIDERS MAURITIUS ,  WINKEL JIMMY ,  CORCORAN GREGORY

IPC: G03F7/20

Abstract: An immersion lithographic apparatus has a pressure sensor configured to measure the pressure of immersion liquid in a space between the substrate and a projection system. A control system is responsive to a pressure signal generated by the pressure sensor and controls a positioner to exert a force on the substrate table to compensate for the force exerted on the substrate table by the immersion liquid.