公开(公告)号：NL2003933A

公开(公告)日：2010-06-14

申请号：NL2003933

申请日：2009-12-10

Applicant: ASML NETHERLANDS BV

Inventor： KEMPER NICOLAAS ,  BALLEGOIJ ROBERTUS ,  VERMEULEN MARCUS ,  BERKVENS PAUL ,  METSENAERE CHRISTOPHE ,  ROPS CORNELIUS ,  RIEPEN MICHEL ,  HEUVEL MARTINUS ,  WINKEL JIMMY

IPC: G03F7/20

公开(公告)号：NL2008183A

公开(公告)日：2012-08-28

申请号：NL2008183

申请日：2012-01-26

Applicant: ASML NETHERLANDS BV

Inventor： MULDER PIETER ,  CROMWIJK JAN ,  WINKEL JIMMY ,  HOOFMAN MARJAN ,  HENDRIKS FERDINAND

IPC: G03F7/20

Abstract: An immersion lithographic apparatus is disclosed having a projection system configured to direct a patterned beam of radiation onto a substrate and a liquid handling system configured to supply and confine immersion liquid to a space defined between the projection system and a substrate, or a substrate table, or both. A controller is provided to adjust an angle of a lower surface of the liquid handling system relative to the top surface of the substrate during motion of the substrate and/or substrate table relative to the liquid handling system dependent upon a position of the substrate and/or substrate table relative to the liquid handling system and/or a direction of relative movement between the substrate and/or substrate table and the liquid handling system.

公开(公告)号：NL2009692A

公开(公告)日：2013-06-10

申请号：NL2009692

申请日：2012-10-25

Applicant: ASML NETHERLANDS BV

Inventor： POLET THEODORUS ,  COX HENRIKUS ,  HAM RONALD ,  SIMONS WILHELMUS ,  WINKEL JIMMY ,  CORCORAN GREGORY ,  BOXTEL FRANK

IPC: G03F7/20

公开(公告)号：NL2007453A

公开(公告)日：2012-04-19

申请号：NL2007453

申请日：2011-09-21

Applicant: ASML NETHERLANDS BV

Inventor： BESSEMS DAVID ,  CORTIE ROGIER ,  ZANDEN MARCUS ,  ROPS CORNELIUS ,  WILLEMS PAUL ,  EUMMELEN ERIK ,  WINKEL JIMMY

IPC: G03F7/20

公开(公告)号：NL2004547A

公开(公告)日：2010-11-18

申请号：NL2004547

申请日：2010-04-13

Applicant: ASML NETHERLANDS BV

Inventor： METSENAERE CHRISTOPHE ,  KUNST RONALD ,  BERKVENS PAUL ,  SCHNEIDERS MAURITIUS ,  WINKEL JIMMY ,  CORCORAN GREGORY

IPC: G03F7/20

Abstract: An immersion lithographic apparatus has a pressure sensor configured to measure the pressure of immersion liquid in a space between the substrate and a projection system. A control system is responsive to a pressure signal generated by the pressure sensor and controls a positioner to exert a force on the substrate table to compensate for the force exerted on the substrate table by the immersion liquid.