公开(公告)号：NL2004808A

公开(公告)日：2011-01-12

申请号：NL2004808

申请日：2010-06-03

Applicant: ASML NETHERLANDS BV

Inventor： PATEL HRISHIKESH ,  STEFFENS KOEN ,  LEMPENS HAN ,  LIEROP MATHIEUS ,  METSENAERE CHRISTOPHE ,  SPRUYTENBURG PATRICK ,  VERSTRAETE JORIS ,  BLOKS RUUD ,  MIRANDA MARCIO ,  JACOBS JOHANNES ,  LIEBREGTS PAULUS ,  HAM RONALD ,  SIMONS WILHELMUS ,  DIRECKS DANIEL ,  JANSSEN FRANCISCUS ,  BERKVENS PAUL ,  BRANDS GERT-JAN

IPC: G03F7/20

Abstract: A fluid handling structure configured to supply and confine immersion liquid to a space defined between a projection system and a facing surface facing the fluid handling structure is disclosed. The fluid handling structure includes a supply passage formed therein for the passage of fluid from outside the fluid handling structure to the space, and a thermal isolator positioned adjacent the supply passage at least partly to isolate fluid in the supply passage from a thermal load induced in the fluid handling structure.

公开(公告)号：NL2004547A

公开(公告)日：2010-11-18

申请号：NL2004547

申请日：2010-04-13

Applicant: ASML NETHERLANDS BV

Inventor： METSENAERE CHRISTOPHE ,  KUNST RONALD ,  BERKVENS PAUL ,  SCHNEIDERS MAURITIUS ,  WINKEL JIMMY ,  CORCORAN GREGORY

IPC: G03F7/20

Abstract: An immersion lithographic apparatus has a pressure sensor configured to measure the pressure of immersion liquid in a space between the substrate and a projection system. A control system is responsive to a pressure signal generated by the pressure sensor and controls a positioner to exert a force on the substrate table to compensate for the force exerted on the substrate table by the immersion liquid.

公开(公告)号：NL2003933A

公开(公告)日：2010-06-14

申请号：NL2003933

申请日：2009-12-10

Applicant: ASML NETHERLANDS BV

Inventor： KEMPER NICOLAAS ,  BALLEGOIJ ROBERTUS ,  VERMEULEN MARCUS ,  BERKVENS PAUL ,  METSENAERE CHRISTOPHE ,  ROPS CORNELIUS ,  RIEPEN MICHEL ,  HEUVEL MARTINUS ,  WINKEL JIMMY

IPC: G03F7/20