公开(公告)号：JP2005216872A

公开(公告)日：2005-08-11

申请号：JP2003417887

申请日：2003-12-16

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： LEVASIER LEON M ,  DEN BOEF ARIE JEFFREY ,  DIRNSTORFER INGO ,  JEUNINK ANDRE BERNARDUS ,  KRUIJSWIJK STEFAN G ,  PELLEMANS HENRICUS PETRUS MARI ,  SETIJA IRWAN DANI ,  TOLSMA HOITE PIETER THEODOOR

IPC: G01B11/00 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027

CPC classification number: G03F9/7003 ,  G03F9/7049 ,  G03F9/7076

Abstract: PROBLEM TO BE SOLVED: To provide a lithography projection system performing alignment using a small size alignment structure and/or a reference structure while sustaining the capturing range or the error strength. SOLUTION: The lithography system comprises an alignment subsystem (21) for aligning substrates (W) for a mask (MA), the alignment structure (10) includes an acyclic formulation (15) detectable as a capturing position or a check position between phase grating parts (11) and (12) of the same periodicity using a reference grating (26) in the alignment subsystem (21). It causes phase effect or amplitude effect in a detected signal of the alignment subsystem (21). The alignment structure can be made thin enough to enter a scribe lane and effective area of the substrate is not reduced. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种在保持捕获范围或误差强度的同时使用小尺寸对准结构和/或参考结构进行对准的光刻投影系统。 解决方案：光刻系统包括用于对准用于掩模（MA）的衬底（W）的对准子系统（21），对准结构（10）包括可检测为捕获位置的无环制剂（15）或检查位置 在对准子系统（21）中使用参考光栅（26）在相位光栅部分（11）和（12）之间相同的周期。 它在对准子系统（21）的检测信号中引起相位效应或幅度效应。 可以使对准结构足够薄以进入划线，并且不减少基板的有效面积。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2009038339A

公开(公告)日：2009-02-19

申请号：JP2008120101

申请日：2008-05-02

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DEN BOEF ARIE JEFFREY ,  CRAMER HUGO AUGUSTINUS JOSEPH ,  DUSA MIRCEA ,  SETIJA IRWAN DANI

IPC: H01L21/027 ,  G01B11/00 ,  G01B11/24 ,  G01N21/956 ,  G03F7/20

CPC classification number: G03F1/84 ,  G03F7/7065

Abstract: PROBLEM TO BE SOLVED: To provide a method and an apparatus for accurately determining the location on a patterned substrate from which a measurement of an image of the pattern is being obtained. SOLUTION: A method of measuring a property of a substrate includes generating a patterned mask configured to cause a radiation beam B passing through the mask MA to acquire the pattern, simulating radiating the substrate W with a patterned radiation beam that has been patterned using the mask to obtain a simulated pattern, determining at least one location of the simulated pattern that is prone to patterning errors, and irradiating the substrate with the patterned radiation beam using a lithographic process. The method also includes measuring the accuracy of at least one property of the at least one location of the pattern on the substrate that has been determined as being prone to patterning errors, and adjusting the lithographic process according to the measuring. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于精确地确定图案化基板上的位置的方法和装置，从该图案基板获得图案的图像的测量。 解决方案：测量衬底的性质的方法包括：生成图案化掩模，其被配置成使通过掩模MA的辐射束B获得图案，模拟用图案化的图案化辐射束辐射衬底W 使用掩模获得模拟图案，确定易于图案化错误的模拟图案的至少一个位置，以及使用光刻工艺对图案化辐射束照射基板。 该方法还包括测量已被确定为易于图案化错误的衬底上的图案的至少一个位置的至少一个特性的精度，以及根据测量来调整光刻工艺。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008042202A

公开(公告)日：2008-02-21

申请号：JP2007200847

申请日：2007-08-01

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： SETIJA IRWAN DANI ,  DEN BOEF ARIE JEFFREY

IPC: H01L21/027

CPC classification number: G06K9/4661 ,  G03F7/70625

Abstract: PROBLEM TO BE SOLVED: To provide reconfiguration of a target which diffracts radiation.
SOLUTION: This reconfiguration includes estimating the geometry of a target; obtaining a model diffraction pattern based on the estimated geometry; irradiating radiation to the target; detecting a diffraction pattern of the radiation diffracted by the target; comparing the model diffraction pattern and the detected diffraction pattern; and determining the actual geometry of the target based on the difference between the model diffraction pattern and the detected diffraction pattern. The model diffraction pattern is determined based on the Bloch mode expansion.
COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供衍射辐射的靶的重新配置。 解决方案：该重新配置包括估计目标的几何形状; 基于估计的几何获得模型衍射图; 向目标照射辐射; 检测由靶衍射的辐射的衍射图案; 比较模型衍射图和检测衍射图; 并且基于模型衍射图案和检测到的衍射图案之间的差异来确定目标的实际几何形状。 基于Bloch模式扩展确定模型衍射图案。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：IL316606A

公开(公告)日：2024-12-01

申请号：IL31660624

申请日：2024-10-28

Applicant: ASML NETHERLANDS BV ,  SETIJA IRWAN DANI ,  SOKOLOV SERGEI

Inventor： SETIJA IRWAN DANI ,  SOKOLOV SERGEI

Abstract: Passive integrated optical systems and methods are described. The present systems and methods facilitate reduction of spatial optical coherence in source radiation used for metrology, for example. Current coherence scramblers used for metrology typically include one or more (moving) mechanical components configured to reduce the coherence of source radiation. However, these mechanical coherence scramblers occupy volume within a system and introduce the threat of mechanical wear and/or failure. In contrast, the present systems and methods utilize a combination of passive integrated optical elements to form a coherence scrambler. This reduces or eliminates the use of mechanical components and increases durability, among other advantages.

公开(公告)号：DE60124336D1

公开(公告)日：2006-12-21

申请号：DE60124336

申请日：2001-04-26

Applicant: ASML NETHERLANDS BV

Inventor： VAN DER SCHAAR MAURITS ,  SETIJA IRWAN DANI ,  MOS EVERHARDUS CORNELIS

IPC: G01B17/00 ,  G03F9/00 ,  G01B17/02 ,  G03F7/20 ,  G03F7/22 ,  H01L21/027

Abstract: Alignment to buried marks is carried out by using electromagnetic radiation to induce waves in the layers covering the buried layer. The acoustic or thermal waves cause reflectivity changes and displacements in the surface whose position and/or time dependence reveals the true position of the buried alignment mark. The buried alignment mark may be revealed by mapping the thickness of covering layers in its vicinity, e.g. by measuring the time dependence of the decay of a standing wave induced in the covering layers or by measuring the delay time of echoes of a travelling wave created at interfaces between different ones of the covering layers. Alternatively, a travelling wave can be created over the whole area of the mark so that echoes off the top and bottom of the buried mark carry positive and negative images of the mark; these cause reflectivity differences and displacements when they reach the surface which can be aligned to.

公开(公告)号：NL2013745A

公开(公告)日：2015-06-08

申请号：NL2013745

申请日：2014-11-05

Applicant: ASML NETHERLANDS BV

Inventor： MINK MARTIJN PETER ,  BROK JANNE MARIA ,  SETIJA IRWAN DANI

IPC: G03F7/20

公开(公告)号：IL317079A

公开(公告)日：2025-01-01

申请号：IL31707924

申请日：2024-11-17

Applicant: ASML NETHERLANDS BV ,  DEN BOEF ARIE JEFFREY ,  VAN SCHAIJK THEODORUS THOMAS MARINUS ,  SETIJA IRWAN DANI ,  CROMWIJK TAMARA CHRISTINA ,  ADHIKARY MANASHEE ,  VAN KRAAIJ MARKUS GERARDUS MARTINUS MARIA

Inventor： DEN BOEF ARIE JEFFREY ,  VAN SCHAIJK THEODORUS THOMAS MARINUS ,  SETIJA IRWAN DANI ,  CROMWIJK TAMARA CHRISTINA ,  ADHIKARY MANASHEE ,  VAN KRAAIJ MARKUS GERARDUS MARTINUS MARIA

Abstract: Disclosed is a Fourier-transform spectrometer comprising a beamsplitting arrangement operable to define a first radiation source and a second radiation source from a common radiation source, and at least one detector operable to detect interferogram data as a function of detection position in at least a first detection plane direction of a detection plane, the interferogram data resulting from interference of a first diverging beam emitted from said first radiation source and a second diverging beam emitted from said second radiation source. A processor is operable to:perform a linearization correction to said interferogram data to obtain linearized interferogram data; and Fourier transform the linearized interferogram data to obtain spectral characteristic data relating to the common radiation source.

公开(公告)号：NL2013736A

公开(公告)日：2015-05-27

申请号：NL2013736

申请日：2014-11-04

Applicant: ASML NETHERLANDS BV

Inventor： PISARENCO MAXIM ,  SETIJA IRWAN DANI

IPC: G01N21/47 ,  G03F7/20

公开(公告)号：NL1036459A1

公开(公告)日：2009-08-14

申请号：NL1036459

申请日：2009-01-26

Applicant: ASML NETHERLANDS BV

Inventor： SETIJA IRWAN DANI ,  SCHAAR MAURITS VAN DER

IPC: G03F7/20 ,  G01N21/47 ,  H01L21/66

公开(公告)号：DE60124336T2

公开(公告)日：2007-06-06

申请号：DE60124336

申请日：2001-04-26

Applicant: ASML NETHERLANDS BV

Inventor： VAN DER SCHAAR MAURITS ,  SETIJA IRWAN DANI ,  MOS EVERHARDUS CORNELIS

IPC: G01B17/00 ,  G03F9/00 ,  G01B17/02 ,  G03F7/20 ,  G03F7/22 ,  H01L21/027

Abstract: Alignment to buried marks is carried out by using electromagnetic radiation to induce waves in the layers covering the buried layer. The acoustic or thermal waves cause reflectivity changes and displacements in the surface whose position and/or time dependence reveals the true position of the buried alignment mark. The buried alignment mark may be revealed by mapping the thickness of covering layers in its vicinity, e.g. by measuring the time dependence of the decay of a standing wave induced in the covering layers or by measuring the delay time of echoes of a travelling wave created at interfaces between different ones of the covering layers. Alternatively, a travelling wave can be created over the whole area of the mark so that echoes off the top and bottom of the buried mark carry positive and negative images of the mark; these cause reflectivity differences and displacements when they reach the surface which can be aligned to.