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    방사선과 구조체의 상호작용을 시뮬레이션하기 위한 방법 및 장치, 계측 방법 및 장치, 디바이스 제조 방법
    1.
    发明公开
    방사선과 구조체의 상호작용을 시뮬레이션하기 위한 방법 및 장치, 계측 방법 및 장치, 디바이스 제조 방법 审中-公开
    用于模拟辐射和结构的相互作用的方法和设备，用于测量设备的方法和设备

    公开(公告)号：KR20180030162A

    公开(公告)日：2018-03-21

    申请号：KR20187004492

    申请日：2016-06-30

    Applicant: ASML NETHERLANDS BV

    Inventor： DIRKS REMCO ,  VAN KRAAIJ MARKUS GERARDUS MARTINUS MARIA ,  PISARENCO MAXIM

    IPC: G03F7/20 ,  G06F17/50 ,  H01L21/3065 ,  H01L21/308 ,  H01L21/66

    CPC classification number: G06F17/5009 ,  G03F7/70058 ,  G03F7/705 ,  G03F7/70625 ,  H01L21/3065 ,  H01L21/308 ,  H01L22/20

    Abstract: 구조체(900)의파라미터가관찰된회절방사선으로부터의복원에의해측정된다. 이방법은: (a) 2차원또는 3차원모델공간에서구조체를표현하는구조체모델을규정하는단계; (b) 구조체모델을사용하여방사선과상기구조체의상호작용을시뮬레이션하는단계; 및 (c) 구조체모델의파라미터를변경하면서단계 (b)를반복하는단계를포함한다. 구조체모델은모델공간의적어도제 1 차원(Z)에따라슬라이스들(a-f)의시리즈로분할된다. 슬라이스들로분할됨으로써, 적어도하나의서브-구조체의경사면(904, 906)은상기모델공간(X)의적어도제 1 차원을따라스텝들(904', 906')의시리즈에의해근사화된다. 슬라이스들의개수는파라미터가변함에따라동적으로변동할수 있다. 상기경사면을근사화하는스텝들의개수는일정하게유지된다. 대응하는스텝을도입하지않고, 추가절개부(1302, 1304)가도입된다.

    Abstract translation: 通过从观察到的衍射辐射中恢复来测量结构900的参数。 该方法包括：（a）定义表示二维或三维模型空间中的结构的结构模型; （b）使用结构模型模拟结构与辐射的相互作用; （c）在改变结构模型的参数的同时重复步骤（b）。 根据模型空间的至少第一维度（Z），结构模型被划分为一系列切片（a-f）。 切片，使得至少一个子结构的斜面904和906也沿着向上模型空间X的第一维度通过一系列步骤904'和906'近似。 切片的数量可能会随着参数的变化而动态变化。 近似斜率的步数保持不变。 插入额外的切口1302和1304而不引入相应的步骤。

    Training a model to generate predictive data
    3.
    发明专利
    Training a model to generate predictive data 未知

    公开(公告)号：IL317107A

    公开(公告)日：2025-01-01

    申请号：IL31710724

    申请日：2024-11-18

    Applicant: ASML NETHERLANDS BV ,  PISARENCO MAXIM ,  BATISTAKIS CHRYSOSTOMOS

    Inventor： PISARENCO MAXIM ,  BATISTAKIS CHRYSOSTOMOS

    Abstract: A method of training a generator model comprising: using the generator model to generate the predictive data based on the first measured data, wherein the first measured data and the predictive data can be used to form images of the sample; pairing subsets of the first measured data with subsets of the predictive data, the subsets corresponding to locations within the images of the sample that can be formed from the first measured data and the predictive data; using a discriminator to evaluate a likelihood that the predictive data comes from a same data distribution as second measured data measured from a sample after an etching process; and training the generator model based on: correlation for the pairs corresponding to a same location relative to correlation for pairs corresponding to different locations, the correlation being the correlation between the paired subsets of data, and the likelihood evaluated by the discriminator.

    REFERENCE LIBRARY GENERATION METHOD FOR METHODS OF INSPECTION, INSPECTION APPARATUS AND LITHOGRAPHIC APPARATUS.
    4.
    发明专利
    REFERENCE LIBRARY GENERATION METHOD FOR METHODS OF INSPECTION, INSPECTION APPARATUS AND LITHOGRAPHIC APPARATUS. 未知

    公开(公告)号：NL2009066A

    公开(公告)日：2013-02-05

    申请号：NL2009066

    申请日：2012-06-26

    Applicant: ASML NETHERLANDS BV

    Inventor： PISARENCO MAXIM ,  SETIJA IRWAN

    IPC: G03F7/20 ,  G01N21/47

    Abstract: A library of model diffraction patterns is generated where each represents a diffraction pattern expected from a target structure defined by a set of parameters and having a first part and a second part, the first part comprising a scattering object. The target structure is defined. The scattering effect of the first part of the target structure is defined by a set of first part parameters, for a plurality of different sets of first part parameters. The scattering effect of the second part of the target structure defined by a set of second part parameters, for a plurality of different sets of second part parameters. The results of the calculations is used to calculate the model diffraction patterns.

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