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    APPARATUS AND METHOD FOR PROVIDING DATA TO A PROGRAMMABLE PATTERNING DEVICE, A LITHOGRAPHY APPARATUS AND A DEVICE MANUFACTURING METHOD
    1.
    发明申请
    APPARATUS AND METHOD FOR PROVIDING DATA TO A PROGRAMMABLE PATTERNING DEVICE, A LITHOGRAPHY APPARATUS AND A DEVICE MANUFACTURING METHOD 审中-公开
    用于将数据提供给可编程模式设备的设备和方法，平面设备和设备制造方法

    公开(公告)号：WO2013079316A3

    公开(公告)日：2013-07-25

    申请号：PCT/EP2012072497

    申请日：2012-11-13

    Applicant: ASML NETHERLANDS BV

    Inventor： TINNEMANS PATRICIUS ,  BONTEKOE MARCEL ,  PEETERS PATRICK

    IPC: G03F7/20

    CPC classification number: G06K15/1836 ,  G03F7/70291 ,  G03F7/70508

    Abstract: A method for converting a vector-based representation of a desired device pattern for an exposure apparatus, a lithography or exposure apparatus, an apparatus and method to provide data to a programmable patterning device, and a device manufacturing method. In an embodiment, the method for converting outputs a rasterized representation of the desired dose pattern of radiation corresponding to the desired device pattern, wherein the vector-based representation comprises primitive data identifying one or more primitive patterns; and instance data identifying how at least a portion of the desired device pattern is formed from one or more instances of each identified primitive pattern, the method including forming a rasterized primitive of each primitive pattern identified in the primitive data, and forming the rasterized representation by storing each rasterized primitive in association with the instance data corresponding to that rasterized primitive.

    Abstract translation: 一种用于转换用于曝光设备，光刻或曝光设备的所需设备图案的向量表示的方法，向可编程图案形成设备提供数据的设备和方法以及设备制造方法。 在一个实施例中，用于转换的方法输出对应于期望的设备图案的期望的辐射剂量图案的光栅化表示，其中基于矢量的表示包括识别一个或多个基本图案的原始数据; 以及背景数据，其识别如何从每个识别的原始图案的一个或多个实例形成期望的设备图案的至少一部分，该方法包括形成在原始数据中标识的每个基元图案的光栅化图元，以及通过 存储与对应于该光栅化图元的实例数据相关联的每个光栅化图元。

    INSPECTION APPARATUS AND ASSOCIATED METHOD AND MONITORING AND CONTROL SYSTEM.
    6.
    发明专利
    INSPECTION APPARATUS AND ASSOCIATED METHOD AND MONITORING AND CONTROL SYSTEM. 未知

    公开(公告)号：NL2006322A

    公开(公告)日：2011-09-20

    申请号：NL2006322

    申请日：2011-03-01

    Applicant: ASML NETHERLANDS BV

    Inventor： CRAMER HUGO ,  TINNEMANS PATRICIUS

    IPC: G03F7/20 ,  G01N21/47

    Abstract: A method, a lithographic apparatus, and a computer-readable medium provide a model of a metrology tool to determine a measurement error and/or covariance of particular parameters, such as the critical dimension and the sidewall angle, of a number of targets, such as gratings. The model can include at least one measurement error source. The method can include using a metrology tool to measure each target and using the model to determine the measurement error of the measured parameters of the particular target when measured by said metrology tool. The value of the measured parameter along with the corresponding measurement error is then determined in the metrology tool output for each particular target, and can be used in exposure focus and dose control in a lithographic process.

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