公开(公告)号：DE602007000251D1

公开(公告)日：2009-01-02

申请号：DE602007000251

申请日：2007-03-09

Applicant: ASML NETHERLANDS BV

Inventor： KLAVER RENATUS GERARDUS ,  LOOPSTRA ERIK ROELOF ,  VAN DER PASCH ENGELBERTUS

IPC: G01D5/38

公开(公告)号：SG10202108028WA

公开(公告)日：2021-08-30

申请号：SG10202108028W

申请日：2016-09-30

Applicant: ASML NETHERLANDS BV

Inventor： KANEHARA JUNICHI ,  BUTLER HANS ,  DE WIT PAUL ,  VAN DER PASCH ENGELBERTUS

Abstract: A method of operating a lithographic apparatus that comprises: a projection system configured to provide exposure radiation for patterning a substrate underneath the projection system; a first stage configured to support a first substrate; a second stage configured to support a second substrate; and a third stage accommodating a component that includes at least one of a sensor and a cleaning device; wherein the method comprises starting a pre-exposure scrum sweep operation after starting a substrate exchange operation; wherein during the pre-exposure scrum sweep operation, the third stage moves away from underneath the projection system while the second stage moves to underneath the projection system; wherein during the substrate exchange operation, the first substrate is unloaded from the first stage.

公开(公告)号：SG11201804115UA

公开(公告)日：2018-06-28

申请号：SG11201804115U

申请日：2016-09-30

Applicant: ASML NETHERLANDS BV

Inventor： KANEHARA JUNICHI ,  BUTLER HANS ,  DE WIT PAUL ,  VAN DER PASCH ENGELBERTUS

IPC: G03F7/20

Abstract: A method of operating a lithographic apparatus that comprises: a projection system configured to provide exposure radiation for patterning a substrate underneath the projection system; a first stage configured to support a first substrate; a second stage configured to support a second substrate; and a third stage accommodating a component that includes at least one of a sensor and a cleaning device; wherein the method comprises starting a pre-exposure scrum sweep operation after starting a substrate exchange operation; wherein during the pre-exposure scrum sweep operation, the third stage moves away from underneath the projection system while the second stage moves to underneath the projection system; wherein during the substrate exchange operation, the first substrate is unloaded from the first stage.