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公开(公告)号：JP2019020729A
公开(公告)日：2019-02-07
申请号：JP2018133192
申请日：2018-07-13
Applicant: ASML NETHERLANDS BV
Inventor： BIJNEN FRANCISCUS GODEFRIDUS CASPER , KANEHARA JUNICHI , KEIJ STEFAN CAROLUS J A , MATAR THOMAS AUGUSTUS , FRANCISCUS VAN GILS PETRUS
Abstract: 【課題】計測装置のスループット性能及び/又は経済性を改善する。【解決手段】本計測装置は、第1の測定装置と、第2の測定装置と、第1の基板及び/又は第2の基板を保持するように構成された第1の基板ステージと、第1の基板及び/又は第2の基板を保持するように構成された第2の基板ステージと、第1の基板及び/又は第2の基板をハンドリングするように構成された第1の基板ハンドラと、第1の基板及び/又は第2の基板をハンドリングするように構成された第2の基板ハンドラと、を備え、第1の基板は、第1、第2又は第3のFOUPからロードされ、第2の基板は、第1、第2又は第3のFOUPからロードされ、第1の測定装置は、アライメント測定装置であり、第2の測定装置は、レベルセンサ、膜厚測定装置又は分光反射率測定装置である。【選択図】図4
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公开(公告)号：SG11201906413XA
公开(公告)日：2019-08-27
申请号：SG11201906413X
申请日：2018-01-30
Applicant: ASML NETHERLANDS BV
Inventor： KANEHARA JUNICHI
Abstract: INTERNATIONAL APPLICATION PUBLISHED UNDER THE PATENT COOPERATION TREATY (PCT) (19) World Intellectual Property Organization International Bureau (43) International Publication Date 09 August 2018 (09.08.2018) WIPO I PCT ill 1111u°11101VIIIVIIIVIIIolo mil How olli nium oimiE (10) International Publication Number WO 2018/141713 Al (51) International Patent Classification: G03F 9/00 (2006.01) GO3F 7/20 (2006.01) (21) International Application Number: PCT/EP2018/052211 (22) International Filing Date: 30 January 2018 (30.01.2018) (25) Filing Language: English (26) Publication Language: English (30) Priority Data: 17154551.0 03 February 2017 (03.02.2017) EP 17169025.8 02 May 2017 (02.05.2017) EP 17193990.3 29 September 2017 (29.09.2017) EP 17201092.8 10 November 2017 (10.11.2017) EP (71) Applicant: ASML NETHERLANDS B.V. [NL/NL]; P.O. Box 324, 5500 AH Veldhoven (NL). (72) Inventor: KANEHARA, Junichi; P.O. Box 324, 5500 AH Veldhoven (NL). (74) Agent: RAS, Michael; PO Box 324, 5500 AH Veldhoven (NL). (81) Designated States (unless otherwise indicated, for every kind of national protection available): AE, AG, AL, AM, AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DJ, DK, DM, DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, HN, HR, HU, ID, IL, IN, IR, IS, JO, JP, KE, KG, KH, KN, KP, KR, KW, KZ, LA, LC, LK, LR, LS, LU, LY, MA, MD, ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, RW, SA, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW. (84) Designated States (unless otherwise indicated, for every kind of regional protection available): ARIPO (BW, GH, GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, ST, SZ, TZ, UG, ZM, ZW), Eurasian (AM, AZ, BY, KG, KZ, RU, TJ, TM), European (AL, AT, BE, BG, CH, CY, CZ, DE, DK, EE, ES, FI, FR, GB, GR, HR, HU, IE, IS, IT, LT, LU, LV, MC, MK, MT, NL, NO, PL, PT, RO, RS, SE, SI, SK, SM, = (54) Title: EXPOSURE APPARATUS Figure 9 910 920 930 (57) : There is provided an exposure apparatus comprising a first substrate holder, a second substrate holder, a sensor holder, a projection system, a measurement device and a further measurement device. The first substrate holder is configured to hold a substrate. The second substrate holder is configured to hold the substrate. The sensor holder is configured to hold a sensor. The projection system is configured to expose the substrate with an exposure beam. The measurement device is configured to provide measurement information of the substrate. The further measurement device is configured to provide further measurement information of the substrate. The sensor is configured to measure a property of the exposure beam and/or the projection system. The projection system is configured to expose the sensor with the exposure beam. [Continued on next page] WO 2018/141713 Al MIDEDIMOMMIONEEMOMOMMMOMORIEVOIS TR), OAPI (BF, BJ, CF, CG, CI, CM, GA, GN, GQ, GW, KM, ML, MR, NE, SN, TD, TG). Published: — with international search report (Art. 21(3))
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公开(公告)号：SG10202108028WA
公开(公告)日：2021-08-30
申请号：SG10202108028W
申请日：2016-09-30
Applicant: ASML NETHERLANDS BV
Inventor： KANEHARA JUNICHI , BUTLER HANS , DE WIT PAUL , VAN DER PASCH ENGELBERTUS
Abstract: A method of operating a lithographic apparatus that comprises: a projection system configured to provide exposure radiation for patterning a substrate underneath the projection system; a first stage configured to support a first substrate; a second stage configured to support a second substrate; and a third stage accommodating a component that includes at least one of a sensor and a cleaning device; wherein the method comprises starting a pre-exposure scrum sweep operation after starting a substrate exchange operation; wherein during the pre-exposure scrum sweep operation, the third stage moves away from underneath the projection system while the second stage moves to underneath the projection system; wherein during the substrate exchange operation, the first substrate is unloaded from the first stage.
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公开(公告)号：SG11201804115UA
公开(公告)日：2018-06-28
申请号：SG11201804115U
申请日：2016-09-30
Applicant: ASML NETHERLANDS BV
Inventor： KANEHARA JUNICHI , BUTLER HANS , DE WIT PAUL , VAN DER PASCH ENGELBERTUS
IPC: G03F7/20
Abstract: A method of operating a lithographic apparatus that comprises: a projection system configured to provide exposure radiation for patterning a substrate underneath the projection system; a first stage configured to support a first substrate; a second stage configured to support a second substrate; and a third stage accommodating a component that includes at least one of a sensor and a cleaning device; wherein the method comprises starting a pre-exposure scrum sweep operation after starting a substrate exchange operation; wherein during the pre-exposure scrum sweep operation, the third stage moves away from underneath the projection system while the second stage moves to underneath the projection system; wherein during the substrate exchange operation, the first substrate is unloaded from the first stage.
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