公开(公告)号：SG147288A1

公开(公告)日：2008-11-28

申请号：SG2004021929

申请日：2004-04-22

Applicant: ASML NETHERLANDS BV

Inventor： LEENDERS MARTINUS HENDRIKUS ANTONIUS ,  MEIJER HENDRICUS JOHANNES MARIA ,  VAN DER PASCH ENGELBERTUS ANTONIUS ,  RENKENS MICHAEL JOZEF MATHIJS ,  RUIJL THEO ANJES MARIA

IPC: G03F7/20 ,  H01L21/027

Abstract: Lithographic Apparatus, Device Manufacturing Method and Angular Encoder In a lithographic projection apparatus, a measuring system for measuring the position of the projection system PL relative to a reference frame RF includes sensors rigidly mounted in relation to counterpart sensors of a measuring system measuring the substrate table WT position. An angular encoder which sends light from a target 41 down two optical paths having opposite sensitivities to tilt is used to measure rotation of the projection system PL about its optical axis.