公开(公告)号：JP2004343103A

公开(公告)日：2004-12-02

申请号：JP2004133419

申请日：2004-04-28

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： LEENDERS MARTINUS HENDRIKUS AN ,  MEIJER HENDRICUS JOHANNES MARI ,  VAN DER PASCH ENGELBERTUS ANTO ,  RENKENS MICHAEL JOZEF MATHIJS ,  RUIJL THEO ANJES MARIA

IPC: G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70258 ,  G03F7/7085

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus, a method of manufacturing device and an anglar decoder.
SOLUTION: A system for measuring the position of a projection system PL with respect to a reference frame RF in the lithographic system includes a sensor rigidly mounted in relation to a corresponding sensor of a system for measuring the position of a substrate table WT. Rotation of the projection system PL about its optical axis is measured using an anglar decoder for transmitting a light from a target 41 to two optical paths having an opposite inclination sensitivity.
COPYRIGHT: (C)2005,JPO&NCIPI

公开(公告)号：NL2014160A

公开(公告)日：2015-08-06

申请号：NL2014160

申请日：2015-01-20

Applicant: ASML NETHERLANDS BV

Inventor： AANGENENT WILHELMUS HENRICUS THEODORUS MARIA ,  KOORNEEF LUCAS FRANCISCUS ,  RUIJL THEO ANJES MARIA ,  BERG STANLEY CONSTANT JOHANNES MARTINUS ,  MEULEN STAN HENRICUS ,  EIJK JAN ,  WULLMS PIETER HUBERTUS GODEFRIDA ,  LIESHOUT RICHARD HENRICUS ADRIANUS

IPC: G03F7/20 ,  H01L21/68

Abstract: A stage positioning system, includes a first body, a second body and a coupling arranged to couple the first body and the second body to each other. The coupling includes a visco-elastic element arranged to couple the first body and the second body to each other. The stage positioning system may further include a sensor to provide a signal representative of a position of the first body. The stage positioning system may further include an actuator to move the first body. The second body may be arranged to couple the actuator and the coupling to each other.

公开(公告)号：SG11201606276QA

公开(公告)日：2016-08-30

申请号：SG11201606276Q

申请日：2015-01-20

Applicant: ASML NETHERLANDS BV

Inventor： AANGENENT WILHELMUS HENRICUS THEODORUS MARIA ,  KOORNEEF LUCAS FRANCISCUS ,  RUIJL THEO ANJES MARIA ,  VAN DEN BERG STANLEY CONSTANT JOHANNES MARTINUS ,  VAN DER MEULEN STAN HENRICUS ,  VAN EIJK JAN ,  WULLMS PIETER HUBERTUS GODEFRIDA ,  VAN LIESHOUT RICHARD HENRICUS ADRIANUS

IPC: G03F7/20

Abstract: A stage positioning system, includes a first body, a second body and a coupling arranged to couple the first body and the second body to each other. The coupling includes a visco-elastic element arranged to couple the first body and the second body to each other. The stage positioning system may further include a sensor to provide a signal representative of a position of the first body. The stage positioning system may further include an actuator to move the first body. The second body may be arranged to couple the actuator and the coupling to each other.

公开(公告)号：SG147288A1

公开(公告)日：2008-11-28

申请号：SG2004021929

申请日：2004-04-22

Applicant: ASML NETHERLANDS BV

Inventor： LEENDERS MARTINUS HENDRIKUS ANTONIUS ,  MEIJER HENDRICUS JOHANNES MARIA ,  VAN DER PASCH ENGELBERTUS ANTONIUS ,  RENKENS MICHAEL JOZEF MATHIJS ,  RUIJL THEO ANJES MARIA

IPC: G03F7/20 ,  H01L21/027

Abstract: Lithographic Apparatus, Device Manufacturing Method and Angular Encoder In a lithographic projection apparatus, a measuring system for measuring the position of the projection system PL relative to a reference frame RF includes sensors rigidly mounted in relation to counterpart sensors of a measuring system measuring the substrate table WT position. An angular encoder which sends light from a target 41 down two optical paths having opposite sensitivities to tilt is used to measure rotation of the projection system PL about its optical axis.