公开(公告)号：JP2009088530A

公开(公告)日：2009-04-23

申请号：JP2008250641

申请日：2008-09-29

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： OTTENS JOOST JEROEN ,  BIJVOET DIRK-JAN ,  VAN DER ZOUW GERBRAND ,  DE JONG FREDERIK E

IPC: H01L21/027 ,  H01L21/68

CPC classification number: G03F7/70725 ,  G03F7/70783 ,  G03F9/7003

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic device with a chuck constructed to hold a substrate table, to provide a stage device on which an object is arranged, and to provide a method of manufacturing a device. SOLUTION: Disclosed is the lithography device which includes: an illumination system constructed to adjust a radiation beam; a supporter constructed to support a patterning device capable of generating a pattern imparted emitted beam by giving a pattern on a cross section of an emitted beam; a substrate table constructed to hold a substrate; a projection system constructed to project the pattern imparted radiation beam to a target part of the substrate; a chuck constructed to hold the substrate table; a positioning device for displacing the chuck in use; and a control unit constructed to control the positioning device. The control unit drives the positioning device to excite the chuck by substantially dynamical force that enables deformation of the chuck before positioning the patterning device. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：为了提供一种平版印刷设备，其具有构造成保持基板台的卡盘，以提供其上布置物体的平台装置，并提供制造装置的方法。 解决方案：公开了光刻设备，其包括：构造成调整辐射束的照明系统; 支撑件，其被构造成支撑能够通过在发射光束的横截面上给出图案来产生赋予发射光束的图案的图案形成装置; 构造成保持基板的基板台; 投影系统，被构造成将图案赋予的辐射束投射到基板的目标部分; 夹持构造成夹持衬底台的卡盘; 用于在使用中移动卡盘的定位装置; 以及构造成控制定位装置的控制单元。 控制单元驱动定位装置以通过在定位图案形成装置之前能够使卡盘变形的基本动力来激发卡盘。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2012151490A

公开(公告)日：2012-08-09

申请号：JP2012063528

申请日：2012-03-21

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： OTTENS JOOST JEROEN ,  BIJVOET DIRK-JAN ,  VAN DER ZOUW GERBRAND ,  DE JONG FREDERIK E

IPC: H01L21/027 ,  H01L21/68

CPC classification number: G03F7/70725 ,  G03F7/70783 ,  G03F9/7003

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus including a chuck constructed to hold a substrate table, a stage apparatus for positioning an object, and a device manufacturing method.SOLUTION: The lithographic apparatus comprises: an illumination system IL configured to condition a radiation beam; a support MT constructed to support a patterning device MA which is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table WT constructed to hold a substrate W; a projection system PS configured to project the patterned radiation beam onto a target portion of the substrate; a chuck constructed to hold the substrate table WT; a positioning device for, in use, displacing the chuck; and a control unit configured to control the positioning device. The control unit is arranged to drive the positioning device to excite the chuck by a substantially dynamic force to enable deformation of the chuck.

Abstract translation: 要解决的问题：提供一种包括夹持基板台的卡盘，用于定位物体的平台装置和装置制造方法的光刻设备。 解决方案：光刻设备包括：被配置为调节辐射束的照明系统IL; 构造成支撑图案形成装置MA的支撑件MT，其能够在其横截面中赋予辐射束图案以形成图案化的辐射束; 构造成保持衬底W的衬底台WT; 投影系统PS被配置为将图案化的辐射束投影到基板的目标部分上; 构造成夹持衬底台WT的卡盘; 用于在使用中移动卡盘的定位装置; 以及控制单元，被配置为控制所述定位装置。 控制单元布置成驱动定位装置以通过基本上动态的力来激励卡盘，以使卡盘变形。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2004260163A

公开(公告)日：2004-09-16

申请号：JP2004036909

申请日：2004-02-13

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： VAN DER ZOUW GERBRAND

IPC: G03F9/00 ,  H01L21/027

CPC classification number: G03F9/7088 ,  G03F9/7034 ,  G03F9/7046 ,  G03F9/7049

Abstract: PROBLEM TO BE SOLVED: To provide a wafer alignment apparatus having reduced tilt sensitivity related to tilt of optical markers on a wafer.
SOLUTION: A substrate alignment system comprises a light source generating incoming light beams IB and IB2, which fall on a substrate composed of gratings positioned so as to generate at least one diffraction order, and optical equipment 1 which forms an image according to at least one diffraction order with a sensor device DET. The system is equipped with an aperture means TA, having apertures PH1 and PH2 at predetermined positions to pass structure-diffracted beams DB1 and DB2, the structure-diffracted beams DB1 and DB2 have diffracted beam diameters BD1 and BD2 on the faces of the apertures PH1 and PH2, respectively; and the diffracted beam diameters BD1 and BD2 are greater than the diameters of the apertures PH1 and PH2, respectively.
COPYRIGHT: (C)2004,JPO&NCIPI

公开(公告)号：SG138445A1

公开(公告)日：2008-01-28

申请号：SG2004006540

申请日：2004-02-12

Applicant: ASML NETHERLANDS BV

Inventor： VAN DER ZOUW GERBRAND

IPC: G03F9/00 ,  H01L21/027

Abstract: A wafer or substrate alignment system for a lithographic apparatus, capable of exhibiting reduced tilt sensitivity, is presented herein. In particular, the substrate alignment system detects a position of a substrate relative to a position of a patterning device and includes a source configured to generate an incoming optical beam, at least one grating, provided on the substrate, having a diffracting length, in which the at least one grating is configured to generate at least one diffraction order of constituent diffracted beams based on an interaction with the incoming optical beam over the diffracting length. The system further includes an optical device, configured to image the at least one diffracted order on a sensor device, and includes aperture at a predetermined location to allow the constituent diffracted beams to pass through. The optical device is arranged to broaden the constituent diffracted beams such that a beam diameter of the constituent diffracted beams is larger than a diameter of the aperture, in order to reduce the sensitivity to tilt.

公开(公告)号：SG11201407782QA

公开(公告)日：2015-01-29

申请号：SG11201407782Q

申请日：2013-05-23

Applicant: ASML NETHERLANDS BV

Inventor： PELLEMANS HENRICUS ,  VAN DER ZOUW GERBRAND ,  SMEETS RALPH ,  DE WIT JOHANNES ,  ANTSIFEROV PAVEL ,  KRIVTSUN VLADIMIR

IPC: G03F7/20 ,  H05H1/24