公开(公告)号：WO2011110467A3

公开(公告)日：2011-11-24

申请号：PCT/EP2011053171

申请日：2011-03-03

Applicant: ASML NETHERLANDS BV ,  IVANOV VLADIMIR ,  ANTSIFEROV PAVEL ,  SIDELNIKOV YURII ,  SCACCABAROZZI LUIGI ,  NEERHOF HENDRIK ,  YAKUNIN ANDREI

Inventor： IVANOV VLADIMIR ,  ANTSIFEROV PAVEL ,  SIDELNIKOV YURII ,  SCACCABAROZZI LUIGI ,  NEERHOF HENDRIK ,  YAKUNIN ANDREI

IPC: G03F7/20

CPC classification number: G03F7/70916

Abstract: A system for removing contaminant particles from the path of the beam of EUV radiation is provided in which at least a first AC voltage is provided to a pair of electrodes on opposite sides of the path of the beam of EUV radiation as a first stage of a regime of voltages and, as a second stage of the regime of voltages, a DC voltage is provided to the electrodes.

Abstract translation: 提供了用于从EUV辐射束的路径去除污染物粒子的系统，其中至少第一AC电压被提供给EUV辐射束的路径的相对侧上的一对电极，作为第一级 电压状态，并且作为电压状态的第二阶段，将DC电压提供给电极。

公开(公告)号：NL2005554A

公开(公告)日：2010-12-07

申请号：NL2005554

申请日：2010-10-21

Applicant: ASML NETHERLANDS BV

Inventor： IVANOV VLADIMIR ,  ANTSIFEROV PAVEL ,  SIDELNIKOV YURII ,  SCACCABAROZZI LUIGI

IPC: G03F7/20

公开(公告)号：NL2010849A

公开(公告)日：2013-12-16

申请号：NL2010849

申请日：2013-05-23

Applicant: ASML NETHERLANDS BV

Inventor： PELLEMANS HENRICUS ,  ANTSIFEROV PAVEL ,  KRIVTSUN VLADIMIR ,  WIT JOHANNES ,  ZOUW GERBRAND ,  SMEETS RALPH

IPC: G03F7/20

公开(公告)号：SG11201407782QA

公开(公告)日：2015-01-29

申请号：SG11201407782Q

申请日：2013-05-23

Applicant: ASML NETHERLANDS BV

Inventor： PELLEMANS HENRICUS ,  VAN DER ZOUW GERBRAND ,  SMEETS RALPH ,  DE WIT JOHANNES ,  ANTSIFEROV PAVEL ,  KRIVTSUN VLADIMIR

IPC: G03F7/20 ,  H05H1/24