公开(公告)号：NL2005863A

公开(公告)日：2011-06-29

申请号：NL2005863

申请日：2010-12-16

Applicant: ASML NETHERLANDS BV

Inventor： TINNEMANS PATRICIUS ,  PELLEMANS HENRICUS ,  ZOUW GERBRAND ,  COENE WILLEM

IPC: G03F7/20

公开(公告)号：NL2010849A

公开(公告)日：2013-12-16

申请号：NL2010849

申请日：2013-05-23

Applicant: ASML NETHERLANDS BV

Inventor： PELLEMANS HENRICUS ,  ANTSIFEROV PAVEL ,  KRIVTSUN VLADIMIR ,  WIT JOHANNES ,  ZOUW GERBRAND ,  SMEETS RALPH

IPC: G03F7/20

公开(公告)号：SG178368A1

公开(公告)日：2012-04-27

申请号：SG2012009551

申请日：2010-08-05

Applicant: ASML NETHERLANDS BV

Inventor： SMILDE HENDRIK ,  DEN BOEF ARIE ,  COENE WILLEM ,  BLEEKER ARNO ,  KOOLEN ARMAND ,  PELLEMANS HENRICUS ,  PLUG REINDER

Abstract: A metrology apparatus is arranged to illuminate a plurality of targets with an off-axis illumination mode. Images of the targets are obtained using only one first order diffracted beam. Where the target is a composite grating, overlay measurements can be obtained from the intensities of the images of the different gratings. Overlay measurements can be corrected for errors caused by variations in the position of the gratings in an image field.

公开(公告)号：NL2009508A

公开(公告)日：2013-04-25

申请号：NL2009508

申请日：2012-09-24

Applicant: ASML NETHERLANDS BV

Inventor： KOOLEN ARMAND ,  PELLEMANS HENRICUS ,  SCHAAR MAURITS ,  VANOPPEN PETER ,  KUBIS MICHAEL

IPC: G01N21/47 ,  G03F7/20

公开(公告)号：SG11201407782QA

公开(公告)日：2015-01-29

申请号：SG11201407782Q

申请日：2013-05-23

Applicant: ASML NETHERLANDS BV

Inventor： PELLEMANS HENRICUS ,  VAN DER ZOUW GERBRAND ,  SMEETS RALPH ,  DE WIT JOHANNES ,  ANTSIFEROV PAVEL ,  KRIVTSUN VLADIMIR

IPC: G03F7/20 ,  H05H1/24

公开(公告)号：NL2005192A

公开(公告)日：2011-02-28

申请号：NL2005192

申请日：2010-08-05

Applicant: ASML NETHERLANDS BV

Inventor： SMILDE HENDRIK ,  BLEEKER ARNO ,  BOEF ARIE ,  KOOLEN ARMAND ,  PELLEMANS HENRICUS ,  PLUG REINDER ,  COENE WILLEM

IPC: G03F7/20 ,  G01N21/47

Abstract: A metrology apparatus is arranged to illuminate a plurality of targets with an off-axis illumination mode. Images of the targets are obtained using only one first order diffracted beam. Where the target is a composite grating, overlay measurements can be obtained from the intensities of the images of the different gratings. Overlay measurements can be corrected for errors caused by variations in the position of the gratings in an image field.

公开(公告)号：NL2004094A

公开(公告)日：2010-08-12

申请号：NL2004094

申请日：2010-01-14

Applicant: ASML NETHERLANDS BV

Inventor： CRAMER HUGO ,  KIERS ANTOINE ,  PELLEMANS HENRICUS

IPC: G01N21/47 ,  G03F7/20