Lithographic apparatus and device manufacturing method
    1.
    发明专利
    Lithographic apparatus and device manufacturing method 有权
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号:JP2005079587A

    公开(公告)日:2005-03-24

    申请号:JP2004247643

    申请日:2004-08-27

    Abstract: PROBLEM TO BE SOLVED: To provide a sensor at a substrate height which is suitable for using with a high NA equipment, and has high sensitivity. SOLUTION: A lithographic apparatus comprises: an illumination system configured to condition a radiation beam; a support constructed to support the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; and the sensor at substrate level comprising a radiation-receiving element, a transmissive plate supporting said radiation-receiving element, and a radiation-detecting means. In the apparatus, the sensor at a substrate level is arranged to avoid a loss of radiation between said radiation-receiving element and the final element of said radiation-detecting means. COPYRIGHT: (C)2005,JPO&NCIPI

    Abstract translation: 要解决的问题:提供适合于使用高NA设备并且具有高灵敏度的基板高度的传感器。 解决方案:光刻设备包括:照明系统,被配置为调节辐射束; 构造成支撑图案形成装置的支撑件能够在其横截面中赋予辐射束图案以形成图案化的辐射束; 构造成保持基板的基板台; 投影系统,被配置为将所述图案化的辐射束投影到所述基板的目标部分上; 并且在基底层处的传感器包括辐射接收元件,支撑所述辐射接收元件的透射板和辐射检测装置。 在该装置中,布置基板级的传感器以避免所述辐射接收元件与所述辐射检测装置的最终元件之间的辐射损失。 版权所有(C)2005,JPO&NCIPI

Patent Agency Ranking