公开(公告)号：JP2005064514A

公开(公告)日：2005-03-10

申请号：JP2004234445

申请日：2004-08-11

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： VINK JACOB WILLEM ,  DONDERS SJOERD NICOLAAS LAMBER ,  MODDERMAN THEODORUS MARINUS ,  CADEE THEODORUS PETRUS MARIA

IPC: H01L21/683 ,  G03F7/20 ,  H01L21/027 ,  H01L21/68

CPC classification number: G03F7/707 ,  G03F7/70783 ,  G03F7/70925 ,  G03F7/70975

Abstract: PROBLEM TO BE SOLVED: To provide an improvement of lithography projection equipment to offset the influence of irregularity of projection on a supporting table, and a method of operating the equipment like that. SOLUTION: Height adjusting equipment equalizes the height of the projection by adding and/or removing material to/from abnormal projection in such a way that a detector detects which projection has an abnormal height in accordance with the grade of its abnormality under the control of a control unit. Since this work is executed in the actual working condition of the projection equipment, the irregularity generated by assembly can be removed. This method can be applied to the support of not only a substrate but also a mask or the like. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供光刻投影设备的改进以抵消投影不平坦对支撑台的影响，以及如此操作设备的方法。

解决方案：高度调节设备通过向异常投影添加和/或移除材料来均衡突起的高度，使得检测器根据其异常的等级根据其异常等级检测哪个突起具有异常高度 控制单元的控制。 由于这种工作是在投影设备的实际工作状态下执行的，因此可以消除组装产生的不规则现象。 该方法不仅可以应用于基板的支撑，还可以应用于掩模等。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2005020012A

公开(公告)日：2005-01-20

申请号：JP2004188162

申请日：2004-06-25

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： MARIA HENNUS PIETER RENAAT ,  VINK JACOB WILLEM

IPC: G01B11/00 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027

CPC classification number: G03F7/70633 ,  G03F7/70716 ,  G03F9/7011 ,  G03F9/7015

Abstract: PROBLEM TO BE SOLVED: To provide a method for positioning a substrate on a substrate table in a lithography projection apparatus, particularly capable of reducing or avoiding the accumulation of errors.
SOLUTION: In the method, when a substrate (W) is first positioned with respect to a substrate table (WT), a first relative position of the substrate (W) is determined with respect to the substrate table (WT), and after this, when the substrate (W) is positioned for the second time with respect to the substrate table (WT), a second relative position is determined with respect to the substrate table (WT), and at the second time, the position of the substrate table (WT) with respect to the substrate (W) is adjusted based on the first and second relative positions so that the substrate (W) is positioned substantially at the same position as the first relative position with respect to the substrate table (WT).
COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种在光刻投影设备中的衬底台上定位衬底的方法，特别是能够减少或避免错误的累积。 解决方案：在该方法中，当相对于衬底台（WT）首先定位衬底（W）时，相对于衬底台（WT）确定衬底（W）的第一相对位置， 之后，当基板（W）相对于基板台（WT）第二次定位时，相对于基板台（WT）确定第二相对位置，而在第二时间，位置 基于第一和第二相对位置来调整衬底台（WT）相对于衬底（W）的位置，使得衬底（W）基本上位于与第一相对位置相对于衬底台的相同位置 （WT）。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：SG109555A1

公开(公告)日：2005-03-30

申请号：SG200404419

申请日：2004-08-06

Applicant: ASML NETHERLANDS BV

Inventor： VINK JACOB WILLEM ,  DONDERS SJOERD NICOLAAS LAMBER ,  MODDERMAN THEODORUS MARINUS ,  CADEE THEODORUS PETRUS MARIA

IPC: H01L21/683 ,  G03F7/20 ,  H01L21/027

Abstract: A lithographic projection apparatus comprises a support table for holding a substrate or a mask etc. across a beam path. The support table has a support surface and an array of protrusions extending from the support surface, so as to support a backside of the substrate etc. on the protrusions. A detector is provided for detecting height deviations of respective ones of the protrusions that affect a surface flatness of the substrate etc.. A position selective material removing and/or adding device, is arranged to act independently on individual protrusions when the substrate table is operable in the apparatus, in the case of a removing device with sufficient removing strength to remove part of the protrusion material from the individual protrusion. A control unit controls the material removing and/or adding device to remove and/or add an amount of material corresponding to respective detected height deviations of respective ones of the protrusions selectively from or to the respective ones of the protrusions.