公开(公告)号：JP2013135217A

公开(公告)日：2013-07-08

申请号：JP2012259496

申请日：2012-11-28

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： CATHARINA MARIA BEERENS RUUD ANTONIUS ,  VAN DER PASCH ENGELBERTUS ANTONIUS FRANSISCUS ,  VERMEULEN JOHANNES PETRUS MARTINUS ,  CADEE THEODORUS PETRUS MARIA ,  LAFARRE RAYMOND WILHELMUS LOUIS

IPC: H01L21/027 ,  G01B11/00 ,  H01L21/68

CPC classification number: G01B11/14 ,  G03F7/70008 ,  G03F7/70775

Abstract: PROBLEM TO BE SOLVED: To provide a displacement measuring system of high accuracy in a lithography device.SOLUTION: A displacement measuring system comprises at least one retroreflector, and a diffraction grating. The displacement measuring system is configured to measure displacement by providing a first radiation beam to a measuring system, and the diffraction grating diffracts the first radiation beam first time to form plural diffracted beams. At least one retroreflector sequentially turns the diffracted beams in a direction to diffract the beams on the diffraction grating second time. At least one reflector turns the diffracted beams on the diffraction grating at least third time before the diffracted beams are re-coupled to form a second beam. Then, a displacement system is provided with a sensor configured to receive the second beam and determine displacement according to a strength of the second beam.

Abstract translation: 要解决的问题：在光刻设备中提供高精度的位移测量系统。解决方案：位移测量系统包括至少一个后向反射器和衍射光栅。 位移测量系统被配置为通过向测量系统提供第一辐射束来测量位移，并且衍射光栅首先衍射第一辐射束以形成多个衍射光束。 至少一个后向反射器顺序地将衍射光束沿着衍射光束的方向第二次衍射到衍射光栅上。 在衍射光束被重新耦合以形成第二光束之前，至少一个反射器在衍射光栅上至少三次转动衍射光束。 然后，位移系统设置有被配置为接收第二光束并根据第二光束的强度确定位移的传感器。

公开(公告)号：JP2007281462A

公开(公告)日：2007-10-25

申请号：JP2007090110

申请日：2007-03-30

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： WIJCKMANS MAURICE ,  CUIJPERS MARTINUS AGNES WILLEM ,  DE JONG FREDERIK EDUARD ,  VAN GOMPEL EDWIN AUGUSTINUS MA ,  JANSEN ROB ,  KUSTERS GERARDUS ADRIANUS ANTO ,  CADEE THEODORUS PETRUS MARIA ,  SMEETS MARTIN FRANS PIERRE ,  VAN DER MEULEN FRITS ,  SIMONS WILHELMUS FRANCISCUS JO ,  ANTONIUS LEENDERS MARTINUS HEN ,  OTTENS JOOST JEROEN ,  VAN BAREN MARTIJN

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/68

CPC classification number: G03F7/70875 ,  F16L55/053 ,  G03F7/70341 ,  G03F7/70783

Abstract: PROBLEM TO BE SOLVED: To vary fluid pressure by accelerating a substrate table and accelerating regulating fluid in a supplying device, in a removing device and/or in the substrate table. SOLUTION: A lithography apparatus comprises the substrate table WT which is formed for holding a substrate W and retains the regulating fluid and a regulation system 100 for regulating the substrate table. The regulation system 100 comprises a pressure damper 104 which is communicated with the regulation system 100 through fluid and controls pressure change of the system 100. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：通过加速衬底台和加速供给装置中的调节流体，在去除装置和/或衬底台中来改变流体压力。 解决方案：光刻设备包括形成用于保持基板W并保持调节流体的基板台WT和用于调节基板台的调节系统100。 调节系统100包括压力调节器104，其通过流体与调节系统100连通并控制系统100的压力变化。版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2006237606A

公开(公告)日：2006-09-07

申请号：JP2006043460

申请日：2006-02-21

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： SEVERIJNS RONALD WALTHER J ,  HUBERTUS MUITJENS MARCEL JOHAN ,  CADEE THEODORUS PETRUS MARIA ,  SONIA MARGART SKELLY

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/707

Abstract: PROBLEM TO BE SOLVED: To provide lithography equipment, which can achieve more quick reaction time in such a way that buffer capacitance is offered so that gas pressure pulse buffered can be offered inside a supply line, and to provide an equipment manufacturing method. SOLUTION: The lithography equipment which comprises a lighting system offering a radiation projection beam, a gas pressure control object clamp which tightens an object arranged inside a passage of the radiation projection beam, the supply line arranged so that it can connect with the object clamp, and a pressure circuit controlling the object clamp. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供光刻设备，其可以以提供缓冲电容的方式实现更快的反应时间，从而可以在供应管线内提供气体压力脉冲缓冲，并提供设备制造方法 。 解决方案：包括提供辐射投射光束的照明系统的光刻设备，用于收紧布置在辐射投射光束的通道内的物体的气体压力控制对象夹具，其布置成使得其可与 对象夹具和控制对象夹具的压力电路。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2013247358A

公开(公告)日：2013-12-09

申请号：JP2013093305

申请日：2013-04-26

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： YAN-SHAN HUANG ,  CADEE THEODORUS PETRUS MARIA

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/68

CPC classification number: G03F7/70775 ,  G03F7/70725 ,  G03F7/70758

Abstract: PROBLEM TO BE SOLVED: To provide a substrate stage or lithographic apparatus that enables more accurate positioning of a substrate, in particular, more accurate vertical positioning of a target portion relative to a projection system.SOLUTION: A substrate stage is used in a lithographic apparatus. The substrate stage includes a substrate table to hold a substrate and a positioning device for in use positioning the substrate table relatively to a projection system of the lithographic apparatus. The positioning device includes a first positioning member mounted on the substrate table and a second positioning member cooperating with the first positioning member to position the substrate table. The second positioning member is mounted on a support structure. The substrate stage further comprises an actuator that exerts a vertical force on a bottom surface of the substrate table at a substantially fixed horizontal position relative to the support structure.

Abstract translation: 要解决的问题：提供能够更准确地定位基板的基板台或光刻设备，特别是相对于投影系统的目标部分的更精确的垂直定位。解决方案：基板台用于光刻设备 。 衬底台包括用于保持衬底的衬底台和用于使用的定位装置相对于光刻设备的投影系统定位衬底台。 所述定位装置包括安装在所述基板台上的第一定位构件和与所述第一定位构件配合以定位所述基板台的第二定位构件。 第二定位构件安装在支撑结构上。 衬底台还包括致动器，该致动器相对于支撑结构在基本上固定的水平位置上在衬底台的底表面上施加垂直力。

公开(公告)号：JP2013098551A

公开(公告)日：2013-05-20

申请号：JP2012232285

申请日：2012-10-19

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： LAFARRE RAYMOND WILHELMUS LOUIS ,  HUBERT MARIE SEGERS ,  CADEE THEODORUS PETRUS MARIA ,  YAN-SHAN HUANG ,  CHRISTIAAN LOUIS VALENTIN

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/677 ,  H01L21/683

CPC classification number: G03B27/60 ,  G03F7/707 ,  G03F7/7075

Abstract: PROBLEM TO BE SOLVED: To position a substrate on a substrate table in a low stress state or a no-stress state.SOLUTION: A lithographic apparatus arranged so as to transfer a pattern from a patterning device to the surface of a substrate includes a substrate table constructed so as to hold the substrate and a gripper arranged so as to position the substrate on the substrate table. The gripper includes a vacuum clamp arranged so as to clamp the upper surface of the substrate. In one embodiment, the vacuum clamp is arranged so as to clamp at least a part of a peripheral edge outside band of a top surface of the substrate. A substrate handling method including a step for positioning the substrate on the substrate table of the lithographic apparatus by using the gripper is also provided. The method includes a step for clamping the upper surface of the substrate by using the vacuum clamp of the gripper.

Abstract translation: 要解决的问题：将基板定位在低应力状态或无应力状态的基板台上。 解决方案：布置成将图案从图案形成装置传送到基板的表面的光刻设备包括：基板台，其被构造成保持基板;以及夹具，布置成将基板定位在基板台上 。 夹持器包括布置成夹紧基板的上表面的真空夹具。 在一个实施例中，真空夹具被布置成夹紧基板的顶表面的周边边缘外带的至少一部分。 还提供了一种基板处理方法，其包括通过使用夹持器将基板定位在光刻设备的基板台上的步骤。 该方法包括通过使用夹持器的真空夹来夹持衬底的上表面的步骤。 版权所有（C）2013，JPO＆INPIT

公开(公告)号：JP2010199581A

公开(公告)日：2010-09-09

申请号：JP2010031894

申请日：2010-02-17

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： CADEE THEODORUS PETRUS MARIA ,  GILISSEN NOUD JAN ,  COMPEN RENE THEODORUS PETRUS ,  KENNON JAMES

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/683

CPC classification number: B24B31/112 ,  B24B35/00 ,  G03B27/58 ,  G03F7/707 ,  G03F7/70783

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus which prevents unevenness in supporting a substrate. SOLUTION: A lithographic projection apparatus includes: a beam production system to provide a beam of radiation, pattern the beam of radiation, and project the patterned beam onto a target portion of the substrate; a support table including protrusions to support an article; a detector to detect height deviations of the protrusions; a material removing device arranged to modify a height of protrusion material; a controller coupled between the detector and the material removing device. The material removing device includes a removal tool selected from a group consisting of a mechanical polishing device, a magneto rheological finishing tool, and a single or multipoint diamond tool. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种防止支撑基板的不均匀性的光刻设备。 光刻投影设备包括：光束产生系统，用于提供辐射束，对辐射束进行图案化，并将图案化的光束投射到基板的目标部分上; 支撑台，其包括用于支撑制品的突起; 用于检测突起的高度偏差的检测器; 布置成改变突起材料的高度的材料去除装置; 耦合在检测器和材料去除装置之间的控制器。 材料去除装置包括从由机械抛光装置，磁流变整理工具和单点或多点金刚石工具组成的组中选择的清除工具。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2010141319A

公开(公告)日：2010-06-24

申请号：JP2009275031

申请日：2009-12-03

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： GILISSEN NOUD JAN ,  CADEE THEODORUS PETRUS MARIA

IPC: H01L21/027

CPC classification number: G03F7/70875 ,  F25B21/00 ,  G03F7/70858 ,  Y02B30/66

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus with reduced imaging problems and/or overlay errors.
SOLUTION: The lithographic apparatus includes: a movable first object OB1 and a heat exchanger. The heat exchanger includes: a heat exchanging body BO which includes a material with electro-caloric or magneto-caloric properties and is configured to affect the temperature of the first object OB1 by exchanging heat with the movable first object; and a generator GEN configured to supply an electromagnetic field to the heat exchanging body BO to change the temperature of the heat exchanging body BO in order to cool or heat the first object OB1.
COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供具有降低的成像问题和/或重叠误差的光刻设备。 光刻设备包括：可运动的第一物体OB1和热交换器。 热交换器包括：热交换体BO，其包括具有电热量或磁热能特性的材料，并且被配置为通过与可移动第一物体交换热量来影响第一物体OB1的温度; 以及发电机GEN，被配置为向热交换体BO提供电磁场以改变热交换体BO的温度，以便冷却或加热第一物体OB1。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2014123778A

公开(公告)日：2014-07-03

申请号：JP2014066305

申请日：2014-03-27

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： YAN-SHAN HUANG ,  CADEE THEODORUS PETRUS MARIA

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/68

CPC classification number: G03F7/70775 ,  G03F7/70725 ,  G03F7/70758

Abstract: PROBLEM TO BE SOLVED: To provide a substrate stage or lithographic apparatus that enables more accurate positioning of a substrate, in particular, more accurate vertical positioning of a target portion relative to a projection system.SOLUTION: A substrate stage is used in a lithographic apparatus. The substrate stage includes a substrate table to hold a substrate and a positioning device for in use positioning the substrate table relatively to a projection system of the lithographic apparatus. The positioning device includes a first positioning member mounted on the substrate table and a second positioning member cooperating with the first positioning member to position the substrate table. The second positioning member is mounted on a support structure. The substrate stage further comprises an actuator that exerts a vertical force on a bottom surface of the substrate table at a substantially fixed horizontal position relative to the support structure.

Abstract translation: 要解决的问题：提供能够更准确地定位基板的基板台或光刻设备，特别是相对于投影系统的目标部分的更精确的垂直定位。解决方案：基板台用于光刻设备 。 衬底台包括用于保持衬底的衬底台和用于使用的定位装置相对于光刻设备的投影系统定位衬底台。 所述定位装置包括安装在所述基板台上的第一定位构件和与所述第一定位构件配合以定位所述基板台的第二定位构件。 第二定位构件安装在支撑结构上。 衬底台还包括致动器，该致动器相对于支撑结构在基本上固定的水平位置上在衬底台的底表面上施加垂直力。

公开(公告)号：JP2014027308A

公开(公告)日：2014-02-06

申请号：JP2013228111

申请日：2013-11-01

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： CADEE THEODORUS PETRUS MARIA ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  NICOLAAS TEN KATE ,  LOOPSTRA ERIK ROELOF ,  ASHWIN RODEVICK HENDRICKS JOHANNES VAN MEHL ,  JEROEN JOHANNES SOPHIA MARIA MERTENS ,  CHRISTIANUS GERARDUS MARIA DE MOL ,  MUITJENS MARCEL JOHANNUS ELISABETH HUBERTUS ,  VAN DER NET ANTONIUS J ,  OTTENS JOOST JEROEN ,  QUAEDACKERS JOHANNES ANNA ,  REUHMAN-HUISKEN MARIA ELISABETH ,  MARCO COELHO STAUFEN ,  TINNEMANS PATRICIUS ALOYSIUS J ,  VERHAGEN MARTINUS CORNELIS MARIA ,  VERSPAIJ JACOBUS JOHANNUS LEONARDUS HENDRICUS ,  DE JONG FREDERIK EDUARD ,  GOORMAN KOEN ,  MENCHTCHIKOV BORIS ,  BOOM HERMAN ,  STOYAN NIHTIANOV ,  MOERMAN RICHARD ,  SMEETS MARTIN FRANS PIERRE ,  SCHOONDERMARK BART LEONARD PETER ,  JANSSEN FRANCISCUS JOHANNES JOSEPH ,  RIEPEN MICHEL

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70808 ,  G03F7/70341 ,  G03F7/70841 ,  G03F7/70875

Abstract: PROBLEM TO BE SOLVED: To provide a system that reduces lithography errors caused by immersion liquid.SOLUTION: A lithographic apparatus comprises: an illumination system configured to adjust a radiation beam; a support body configured to support a pattern forming device capable of imparting a pattern to the radiation beam in a cross section of the radiation beam to form a pattern formed radiation beam; a substrate table configured to hold a substrate; a projection system configured to project the pattern formed radiation beam onto a target portion of the substrate; a liquid supply system configured to fill at least a part of space between a final element of the projection system and the substrate with liquid; a seal member arranged to substantially contain the liquid within the space between the final element of the projection system and the substrate; and elements to control and/or compensate for evaporation of the immersion liquid from the substrate.

Abstract translation: 要解决的问题：提供减少由浸没液体引起的光刻误差的系统。解决方案：光刻设备包括：照明系统，被配置为调节辐射束; 支撑体，被配置为支撑图案形成装置，其能够在所述辐射束的横截面中赋予所述辐射束的图案以形成图案形成的辐射束; 被配置为保持基板的基板台; 投影系统，被配置为将所述图案形成的辐射束投影到所述基板的目标部分上; 液体供应系统，其配置成用液体填充所述投影系统的最终元件和所述基板之间的至少一部分空间; 密封构件，其布置成基本上将所述液体容纳在所述投影系统的最终元件与所述基板之间的空间内; 以及用于控制和/或补偿来自衬底的浸没液体的蒸发的元件。

公开(公告)号：JP2012109613A

公开(公告)日：2012-06-07

申请号：JP2012037310

申请日：2012-02-23

Applicant: ASML NETHERLANDS BV

Inventor： WASSINK ARNOLD CORNELIS ,  BANINE VADIM YEVGENYEVICH ,  IVANOV VLADIMIR VITALEVICH ,  KOSHELEV KONSTANTIN ,  CADEE THEODORUS PETRUS MARIA ,  CLIVITZN VLADIMIR MIKHAILOVICH ,  DERK JAN WILFRED KLUNDER ,  WILHELMUS VAN HERPEN MAARTEN MARINUS JOHANNES ,  PAUL PETER ANNA ANTONIUS BROM ,  SOER WOUTER ANTHON ,  GLUSHKOV DENIS ALEXANDROVICH

IPC: H01L21/027 ,  G03F7/20 ,  H05G2/00

Abstract: PROBLEM TO BE SOLVED: To provide a radiation system for generating a beam of radiation that defines an optical axis.SOLUTION: The radiation system comprises a plasma-produced discharge source for generating EUV radiation. The discharge source comprises: a pair of electrodes provided with a voltage difference; and a system for producing a plasma between the pair of electrodes so as to provide a discharge in the plasma between the electrodes. The radiation system also comprises a debris catching shield for catching debris from the electrodes. The debris catching shield is constructed and arranged to shield the electrodes from a line of sight provided at a predetermined spherical angle relative to the optical axis, and to provide an aperture to a central area between the electrodes in the line of sight.