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    Cover for substrate table, substrate table for lithographic apparatus, lithographic apparatus, and method for manufacturing device
    1.
    发明专利
    Cover for substrate table, substrate table for lithographic apparatus, lithographic apparatus, and method for manufacturing device 有权
    底片表盖，平版印刷装置用基板，平版印刷装置及制造装置的方法

    公开(公告)号：JP2011205093A

    公开(公告)日：2011-10-13

    申请号：JP2011050948

    申请日：2011-03-09

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： LAFARRE RAYMOND WILHELMUS LOUIS ,  ROSET NIEK JACOBUS JOHANNES ,  ZDRAVKOV ALEXANDER NIKOLOV ,  STOUDAM JAN WILLEM ,  BIJL BERNARDUS LAMBERTUS JOHANNES

    IPC: H01L21/027 ,  H01L21/683

    CPC classification number: G03F7/70341 ,  G03F7/70716

    Abstract: PROBLEM TO BE SOLVED: To provide an immersion lithographic apparatus that improves a stability of meniscus to control pattern defects caused by bubbles in an immersion liquid or the like.SOLUTION: In the apparatus, a cover 25 includes a substrate table having a substantially planar upper surface, in which a recess 22 that is configured to receive a substrate W so that the substrate W is supported by the recess 22, is formed. The cover 25 includes a substantially planar body that, in use, extends around the substrate from the upper surface to a peripheral part of an upper major face of the substrate in order to cover a gap between an edge of the recess 22 and an edge of the substrate. The cover includes relatively flexible part that, in use, extends around the substrate in order to be configured to have a rigidity lower than that of the rest part of the cover.

    Abstract translation: 要解决的问题：提供一种浸没式光刻设备，其提高弯液面的稳定性以控制由浸没液体等中的气泡引起的图案缺陷。解决方案：在该设备中，盖25包括具有基本平坦的上表面 表面，其中形成有用于接收基板W以使得基板W被凹部22支撑的凹部22。 盖25包括基本上平面的主体，其在使用中围绕基板从基板的上主表面的上表面延伸到周边部分，以便覆盖凹部22的边缘与边缘之间的间隙 底物。 盖子包括相对柔性的部件，其在使用中围绕基板延伸，以便构造成具有比盖子的其余部分低的刚性。

    Lithographic apparatus and device manufacturing method
    3.
    发明专利
    Lithographic apparatus and device manufacturing method 审中-公开
    LITHOGRAPHIC装置和装置制造方法

    公开(公告)号：JP2012209551A

    公开(公告)日：2012-10-25

    申请号：JP2012062121

    申请日：2012-03-19

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： VISSER EMILIUS WILLEM ADRIAAN ,  ZDRAVKOV ALEXANDER NIKOLOV ,  DZIOMKINA NINA VLADIMIROVNA

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70341 ,  G03F7/2041

    Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus in which the likelihood or rate of deterioration of lyophobicity and/or lyophilicity is reduced.SOLUTION: An immersion lithographic apparatus includes a surface having at least one active group (e.g., lyophobic group) which, during use, comes into contact with immersion liquid, and an immersion liquid supply system configured to provide immersion liquid comprising a protection component which is more reactive with a product of photoionization of the immersion liquid than the active group of the surface, the protection component being present in an amount between 1 ppm and 0.1 ppm.

    Abstract translation: 要解决的问题：提供其中降低了疏液性和/或亲液性变差的可能性或速率的光刻设备。 解决方案：浸没式光刻设备包括具有至少一个活性基团（例如疏液基团）的表面，其在使用期间与浸没液体接触，以及浸没液体供应系统，其构造成提供包含保护的浸液 该组分与浸渍液的光电离产物比表面活性基团更具反应性，该保护组分的存在量为1ppm至0.1ppm。 版权所有（C）2013，JPO＆INPIT

    Lithography apparatus and device manufacturing method
    5.
    发明专利
    Lithography apparatus and device manufacturing method 有权
    LITHOGRAPHY设备和设备制造方法

    公开(公告)号：JP2011129914A

    公开(公告)日：2011-06-30

    申请号：JP2010276686

    申请日：2010-12-13

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： ROSET NIEK JACOBUS JOHANNES ,  KATE NICOLAAS TEN ,  LAFARRE RAYMOND WILHELMUS LOUIS ,  ZDRAVKOV ALEXANDER NIKOLOV

    IPC: H01L21/027

    CPC classification number: G03F7/70716 ,  G03F7/70341

    Abstract: PROBLEM TO BE SOLVED: To provide a lithography apparatus for reducing the possibility of, for example, a leak of drops from an immersion space or generation of air bubbles into the immersion space. SOLUTION: An immersion lithography apparatus is disclosed. The apparatus has: a fluid handling system for supplying an immersion fluid between a projection system final component and a surface having a characteristic portion in a cross section thereof; and an adjustment fluid source for locally changing the composition of the immersion fluid such that at least surface tension of the immersion fluid locally decreases when the meniscus of the immersion fluid contacts the characteristic portion. COPYRIGHT: (C)2011,JPO&INPIT

    Abstract translation: 要解决的问题：提供一种用于降低例如从浸没空间泄漏液滴或产生气泡进入浸入空间的可能性的光刻设备。 解决方案：公开了一种浸没式光刻设备。 该装置具有：流体处理系统，用于在投影系统最终部件和具有其截面中的特征部分的表面之间提供浸没流体; 以及用于局部地改变浸没流体的组成的调节流体源，使得当浸没流体的弯月面接触特征部分时，浸入流体的至少表面张力局部减小。 版权所有（C）2011，JPO＆INPIT

    Lithographic apparatus and method
    6.
    发明专利
    Lithographic apparatus and method 有权
    LITHOGRAPHIC设备和方法

    公开(公告)号：JP2008153652A

    公开(公告)日：2008-07-03

    申请号：JP2007315494

    申请日：2007-12-06

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： JACOBS HERNES ,  MONDT EVA ,  ZDRAVKOV ALEXANDER NIKOLOV

    IPC: H01L21/027 ,  G03F7/20

    CPC classification number: G03F7/70341 ,  G03F7/707

    Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus and a lithographic method which can reduce passage of air through liquid or contamination of the liquid. SOLUTION: The lithographic apparatus comprises a substrate table for holding a substrate, a projection system for projecting a patterned radiation beam projected on the substrate, a liquid supplying system which supplies liquid to a space between the projection system, the substrate table, and the substrate, and a sealing prepared to the substrate table. The sealing can be operated from opened configuration to closed configuration, and in closed configuration, when a substrate is on the substrate table, the sealing closes a gap between them. COPYRIGHT: (C)2008,JPO&INPIT

    Abstract translation: 要解决的问题：提供可以减少空气通过液体或液体污染的光刻设备和光刻方法。 解决方案：光刻设备包括用于保持基板的基板台，用于投影投影在基板上的图案化辐射束的投影系统，将液体供应到投影系统，基板台之间的空间的液体供应系统， 和衬底，以及准备到衬底台的密封。 密封可以从打开的构型操作到闭合构型，并且在封闭构造中，当衬底位于衬底台上时，密封封闭它们之间的间隙。 版权所有（C）2008，JPO＆INPIT

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