公开(公告)号：NL2013700A

公开(公告)日：2015-05-27

申请号：NL2013700

申请日：2014-10-29

Applicant: ASML NETHERLANDS BV

Inventor： DERKS SANDER CATHARINA REINIER ,  CASIMIRI ERIC WILLEM FELIX ,  DIERICHS MARCEL MATHIJS THEODORE MARIE ,  OEMRAWSINGH SUMANT SUKDEW RAMANUJAN ,  EINDEN WILHELMUS THEODORUS ANTHONIUS JOHANNES ,  VELTHUIS JOHANNES FRANSISCUS MARIA ,  ZDRAVKOV ALEXANDER NIKOLOV ,  ZEIN EDDINE WASSIM

IPC: G03F7/20

Abstract: An apparatus comprising at least one sealing aperture (40) comprising a hollow part (41), having an inner surface (42), extending at an interface between different zones (50;60) of the apparatus; and a member (43) positioned in the hollow part configured to substantially transmit EUV radiation and to substantially filter non-EUV radiation at the interface; wherein the inner surface of the hollow part has a surface treatment configured to increase absorption of the non-EUV radiation that is transferred by the member to the hollow part.

公开(公告)号：SG188036A1

公开(公告)日：2013-03-28

申请号：SG2012052569

申请日：2012-07-17

Applicant: ASML NETHERLANDS BV

Inventor： KUNNEN JOHAN GERTRUDIS CORNELIS ,  JACOBS JOHANNES HENRICUS WILHELMUS ,  VERSPAGET COEN CORNELIS WILHELMUS ,  VAN DER HAM RONALD ,  THOMAS IVO ADAM JOHANNES ,  HOUBEN MARTIJN ,  LAURENT THIBAULT SIMON MATHIEU ,  CORCORAN GREGORY MARTIN MASON ,  BLOKS RUUD HENDRIKUS MARTINUS JOHANNES ,  PIETERSE GERBEN ,  GUNTER PIETER LEIN JOSEPH ,  REMIE MARINUS JAN ,  DERKS SANDER CATHARINA REINIER

Abstract: LITHOGRAPHIC APPARATUS, SUPPORT TABLE FOR A LITHOGRAPHICA support table configured to support a substrate, the support table having a support section to support a substrate and a conditioning system to supply heat energy to and/or remove heat energy from the support section, wherein the conditioning system comprises a plurality of conditioning units that are independently controllable.(Figure 8)