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    ALIGNING A DISTORTED IMAGE
    1.
    发明申请
    ALIGNING A DISTORTED IMAGE 审中-公开

    公开(公告)号：WO2023001479A1

    公开(公告)日：2023-01-26

    申请号：PCT/EP2022/067094

    申请日：2022-06-23

    Applicant: ASML NETHERLANDS B.V.

    Inventor： PISARENCO, Maxim ,  MIDDLEBROOKS, Scott, Anderson ,  VAN KRAAIJ, Markus, Gerardus, Martinus, Maria ,  VERSCHUREN, Coen, Adrianus

    IPC: G06T11/00 ,  G06T5/00

    Abstract: Disclosed herein is a non-transitory computer readable medium that has stored therein a computer program, wherein the computer program comprises code that, when executed by a computer system, instructs the computer system to perform a method for generating synthetic distorted images, the method comprising: obtaining an input set that comprises a plurality of distorted images; determining, using a model, distortion modes of the distorted images in the input set; generating a plurality of different combinations of the distortion modes; generating, for each one of the plurality of combinations of the distortion modes, a synthetic distorted image in dependence on the combination; and including each of the synthetic distorted images in an output set.

    METHOD FOR PREDICTING STOCHASTIC CONTRIBUTORS
    2.
    发明申请
    METHOD FOR PREDICTING STOCHASTIC CONTRIBUTORS 审中-公开

    公开(公告)号：WO2021229030A1

    公开(公告)日：2021-11-18

    申请号：PCT/EP2021/062772

    申请日：2021-05-12

    Applicant: ASML NETHERLANDS B.V.

    Inventor： BATISTAKIS, Chrysostomos ,  PISARENCO, Maxim ,  OYARZUN RIVERA, Bernardo, Andres ,  SLACHTER, Abraham

    IPC: G03F7/20 ,  G06T7/00 ,  G01N21/956

    Abstract: Described herein is a method for training a machine learning model to determine a source of error contribution to multiple features of a pattern printed on a substrate. The method includes obtaining training data having multiple datasets, wherein each dataset has error contribution values representative of an error contribution from one of multiple sources to the features, and wherein each dataset is associated with an actual classification that identifies a source of the error contribution of the corresponding dataset; and training, based on the training data, a machine learning model to predict a classification of a reference dataset of the datasets such that a cost function that determines a difference between the predicted classification and the actual classification of the reference dataset is reduced.

    METHODS AND APPARATUS FOR SIMULATING INTERACTION OF RADIATION WITH STRUCTURES, METROLOGY METHODS AND APPARATUS, DEVICE MANUFACTURING METHOD
    3.
    发明申请
    METHODS AND APPARATUS FOR SIMULATING INTERACTION OF RADIATION WITH STRUCTURES, METROLOGY METHODS AND APPARATUS, DEVICE MANUFACTURING METHOD 审中-公开
    用于模拟辐射与结构的相互作用的方法和装置，计量方法和装置，装置制造方法

    公开(公告)号：WO2017012840A1

    公开(公告)日：2017-01-26

    申请号：PCT/EP2016/065258

    申请日：2016-06-30

    Applicant: ASML NETHERLANDS B.V.

    Inventor： DIRKS, Remco ,  VAN KRAAIJ, Markus, Gerardus, Martinus, Maria ,  PISARENCO, Maxim

    IPC: G03F7/20

    CPC classification number: G06F17/5009 ,  G03F7/70058 ,  G03F7/705 ,  G03F7/70625 ,  H01L21/3065 ,  H01L21/308 ,  H01L22/20

    Abstract: Parameters of a structure (900) are measured by reconstruction from observed diffracted radiation. The method includes the steps: (a) defining a structure model to represent the structure in a two- or three-dimensional model space; (b) using the structure model to simulate interaction of radiation with the structure; and (c) repeating step (b) while varying parameters of the structure model. The structure model is divided into a series of slices (a-f) along at least a first dimension (Z) of the model space. By the division into slices, a sloping face (904, 906) of at least one sub-structure is approximated by a series of steps (904', 906') along at least a second dimension of the model space (X). The number of slices may vary dynamically as the parameters vary. The number of steps approximating said sloping face is maintained constant. Additional cuts (1302, 1304) are introduced, without introducing corresponding steps.

    Abstract translation: 通过从观测的衍射辐射重建来测量结构（900）的参数。 该方法包括以下步骤：（a）定义结构模型以表示二维或三维模型空间中的结构; （b）利用结构模型模拟辐射与结构的相互作用; 和（c）重复步骤（b），同时改变结构模型的参数。 结构模型沿模型空间的至少第一维度（Z）分为一系列切片（a-f）。 通过划分成切片，至少一个子结构的倾斜面（904,906）通过沿着模型空间（X）的至少第二维度的一系列步骤（904'，906'）近似。 切片的数量可能随参数变化而动态变化。 接近所述倾斜面的步骤数保持恒定。 引入附加切割（1302,1304），而不引入相应的步骤。

    SYSTEM AND METHOD FOR GENERATING PREDICTIVE IMAGES FOR WAFER INSPECTION USING MACHINE LEARNING
    7.
    发明申请
    SYSTEM AND METHOD FOR GENERATING PREDICTIVE IMAGES FOR WAFER INSPECTION USING MACHINE LEARNING 审中-公开

    公开(公告)号：WO2021052918A1

    公开(公告)日：2021-03-25

    申请号：PCT/EP2020/075675

    申请日：2020-09-14

    Applicant: ASML NETHERLANDS B.V.

    Inventor： PISARENCO, Maxim ,  MIDDLEBROOKS, Scott, Anderson ,  MASLOW, Mark, John ,  VAN LARE, Marie-Claire ,  BATISTAKIS, Chrysostomos

    IPC: G06T7/00 ,  G01N21/95 ,  G03F1/80 ,  G06N3/04

    Abstract: A system and method for generating predictive images for wafer inspection using machine learning are provided. Some embodiments of the system and method include acquiring the wafer after a photoresist applied to the wafer has been developed; imaging a portion of a segment of the developed wafer; acquiring the wafer after the wafer has been etched; imaging the segment of the etched wafer; training a machine learning model using the imaged portion of the developed wafer and the imaged segment of the etched wafer; and applying the trained machine learning model using the imaged segment of the etched wafer to generate predictive images of a developed wafer. Some embodiments include imaging a segment of the developed wafer; imaging a portion of the segment of the etched wafer; training a machine learning model; and applying the trained machine learning model to generate predictive after-etch images of the developed wafer.

    METHOD AND APPARATUS FOR IMAGE ANALYSIS
    9.
    发明申请
    METHOD AND APPARATUS FOR IMAGE ANALYSIS 审中-公开
    图像分析方法和设备

    公开(公告)号：WO2016091536A1

    公开(公告)日：2016-06-16

    申请号：PCT/EP2015/076582

    申请日：2015-11-13

    Applicant: ASML NETHERLANDS B.V.

    Inventor： MIDDLEBROOKS, Scott, Anderson ,  VAN KRAAIJ, Markus, Gerardus, Martinus, Maria ,  PISARENCO, Maxim ,  KOOPMAN, Adrianus, Cornelis, Matheus ,  HUNSCHE, Stefan ,  COENE, Willem, Marie, Julia, Marcel

    IPC: G06T7/00 ,  G03F7/20

    CPC classification number: G06T7/001 ,  G03F7/705 ,  G03F7/70625 ,  G03F7/70633 ,  G06T2207/10061 ,  G06T2207/20068 ,  G06T2207/30148

    Abstract: A method and apparatus of detection, registration and quantification of an image is described. The method may include obtaining an image of a lithographically created structure, and applying a level set method to an object, representing the structure, of the image to create a mathematical representation of the structure. The method may include obtaining a first dataset representative of a reference image object of a structure at a nominal condition of a parameter, and obtaining second dataset representative of a template image object of the structure at a non- nominal condition of the parameter. The method may further include obtaining a deformation field representative of changes between the first dataset and the second dataset. The deformation field may be generated by transforming the second dataset to project the template image object onto the reference image object. A dependence relationship between the deformation field and change in the parameter may be obtained.

    Abstract translation: 描述了图像的检测，配准和量化的方法和设备。 该方法可以包括获得光刻创建的结构的图像，并且将水平集方法应用于表示图像的结构的对象以创建结构的数学表示。 该方法可以包括：在参数的标称条件下获得表示结构的参考图像对象的第一数据集，以及在参数的非标称条件下获得表示该结构的模板图像对象的第二数据集。 该方法可以进一步包括获得表示第一数据集和第二数据集之间的变化的变形场。 可以通过变换第二数据集以将模板图像对象投影到参考图像对象上来生成变形场。 可以获得变形场与参数变化之间的依赖关系。

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