EFFLUENT GAS STREAM TREATMENT SYSTEM FOR OXIDATION TREATMENT OF SEMICONDUCTOR MANUFACTURING EFFLUENT GASES
    1.
    发明申请
    EFFLUENT GAS STREAM TREATMENT SYSTEM FOR OXIDATION TREATMENT OF SEMICONDUCTOR MANUFACTURING EFFLUENT GASES 审中-公开
    用于氧化处理半导体制造流体气体的气体流处理系统

    公开(公告)号:WO1998029181A1

    公开(公告)日:1998-07-09

    申请号:PCT/US1997023741

    申请日:1997-12-31

    Abstract: An effluent gas stream treatment system (903) for treatment of gaseous effluents such as waste gases from semiconductor manufacturing operations (901). The effluent gas stream treatment system comprises a pre-oxidation treatment unit (905), which may for example comprise a scrubber, an oxidation unit (913) such an electrothermal oxidizer, and a post-oxidation treatment unit (917), such as a wet or dry scrubber. The effluent gas stream treatment system of the invention may utilize an integrated oxidizer (852), quench (862) and wet scrubber assembly (870), for abatement of hazardous or otherwise undesired components from the effluent gas stream. Gas or liquid shrouding of gas streams in the treatment system may be provided by high efficiency inlet structures (1060, 1110).

    Abstract translation: 用于处理来自半导体制造操作的废气的气体流出物的流出气流处理系统(903)(901)。 废气流处理系统包括预氧化处理单元(905),其可以例如包括洗涤器,诸如电热氧化器的氧化单元(913)和后氧化处理单元(917),例如 湿式或干式洗涤器。 本发明的流出气流处理系统可以利用集成的氧化剂(852),淬火(862)和湿式洗涤器组件(870),用于从流出气流中减少危险或其他不希望的组分。 处理系统中的气流或气体罩罩可以由高效的入口结构(1060,1110)提供。

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