公开(公告)号：WO1998029181A1

公开(公告)日：1998-07-09

申请号：PCT/US1997023741

申请日：1997-12-31

Applicant: ATMI ECOSYS CORPORATION

Inventor： ATMI ECOSYS CORPORATION ,  HOLST, Mark, R. ,  CARPENTER, Kent ,  LANE, Scott ,  ARYA, Prakash, V. ,  BALLIEW, Patrick ,  SWEENEY, Joseph, D.

IPC: B01D50/00

CPC classification number: B01D53/14 ,  B01D53/68 ,  B01J2219/00065 ,  B01J2219/00076 ,  B01J2219/00094 ,  B01J2219/0015 ,  B01J2219/00164 ,  C23C16/4412 ,  Y02C20/30

Abstract: An effluent gas stream treatment system (903) for treatment of gaseous effluents such as waste gases from semiconductor manufacturing operations (901). The effluent gas stream treatment system comprises a pre-oxidation treatment unit (905), which may for example comprise a scrubber, an oxidation unit (913) such an electrothermal oxidizer, and a post-oxidation treatment unit (917), such as a wet or dry scrubber. The effluent gas stream treatment system of the invention may utilize an integrated oxidizer (852), quench (862) and wet scrubber assembly (870), for abatement of hazardous or otherwise undesired components from the effluent gas stream. Gas or liquid shrouding of gas streams in the treatment system may be provided by high efficiency inlet structures (1060, 1110).

Abstract translation: 用于处理来自半导体制造操作的废气的气体流出物的流出气流处理系统（903）（901）。 废气流处理系统包括预氧化处理单元（905），其可以例如包括洗涤器，诸如电热氧化器的氧化单元（913）和后氧化处理单元（917），例如 湿式或干式洗涤器。 本发明的流出气流处理系统可以利用集成的氧化剂（852），淬火（862）和湿式洗涤器组件（870），用于从流出气流中减少危险或其他不希望的组分。 处理系统中的气流或气体罩罩可以由高效的入口结构（1060,1110）提供。

公开(公告)号：WO1998029178A1

公开(公告)日：1998-07-09

申请号：PCT/US1997024275

申请日：1997-12-31

Applicant: ATMI ECOSYS CORPORATION

Inventor： ATMI ECOSYS CORPORATION ,  HOLST, Mark, R. ,  CARPENTER, Kent ,  LANE, Scott ,  ARYA, Prakash, V. ,  BALLIEW, Patrick ,  SWEENEY, Joseph, D.

IPC: B01D41/00

CPC classification number: C30B25/14 ,  B01D45/00 ,  B01D53/14 ,  B01J8/003 ,  B01J8/20 ,  B01J8/22 ,  B01J19/002 ,  B01J19/26 ,  B01J2219/00065 ,  B01J2219/00076 ,  B01J2219/00094 ,  B01J2219/00135 ,  B01J2219/0015 ,  B01J2219/00164 ,  B01J2219/00252 ,  B01J2219/00268 ,  C23C16/4412

Abstract: An inlet structure (60) for passage of a gas stream from an upstream source (90) of gas to a downstream locus, wherein the inlet structure (60) is constructed, arranged and operated to suppress particulate and film deposition and formation, as well as to suppress adverse hydrodynamic effects.

Abstract translation: 一种用于将气流从气体的上游源（90）传送到下游位置的入口结构（60），其中所述入口结构（60）被构造，布置和操作以抑制颗粒和膜的沉积和形成 以抑制不利的流体动力学影响。

公开(公告)号：EP0954366A1

公开(公告)日：1999-11-10

申请号：EP97952695.0

申请日：1997-12-31

Applicant: ATMI ECOSYS CORPORATION

Inventor： HOLST, Mark, R. ,  CARPENTER, Kent ,  LANE, Scott ,  ARYA, Prakash, V. ,  BALLIEW, Patrick ,  SWEENEY, Joseph, D.

IPC: B01D45 ,  B01D53 ,  B01J4 ,  B01J8 ,  B01J19 ,  C23C16 ,  C30B25

CPC classification number: C30B25/14 ,  B01D45/00 ,  B01D53/14 ,  B01J8/003 ,  B01J8/20 ,  B01J8/22 ,  B01J19/002 ,  B01J19/26 ,  B01J2219/00065 ,  B01J2219/00076 ,  B01J2219/00094 ,  B01J2219/00135 ,  B01J2219/0015 ,  B01J2219/00164 ,  B01J2219/00252 ,  B01J2219/00268 ,  C23C16/4412

Abstract: An inlet structure (60) for passage of a gas stream from an upstream source (90) of gas to a downstream locus, wherein the inlet structure (60) is constructed, arranged and operated to suppress particulate and film deposition and formation, as well as to suppress adverse hydrodynamic effects.