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    EFFLUENT GAS STREAM TREATMENT SYSTEM FOR OXIDATION TREATMENT OF SEMICONDUCTOR MANUFACTURING EFFLUENT GASES
    1.
    发明申请
    EFFLUENT GAS STREAM TREATMENT SYSTEM FOR OXIDATION TREATMENT OF SEMICONDUCTOR MANUFACTURING EFFLUENT GASES 审中-公开
    用于氧化处理半导体制造流体气体的气体流处理系统

    公开(公告)号：WO1998029181A1

    公开(公告)日：1998-07-09

    申请号：PCT/US1997023741

    申请日：1997-12-31

    Applicant: ATMI ECOSYS CORPORATION

    Inventor： ATMI ECOSYS CORPORATION ,  HOLST, Mark, R. ,  CARPENTER, Kent ,  LANE, Scott ,  ARYA, Prakash, V. ,  BALLIEW, Patrick ,  SWEENEY, Joseph, D.

    IPC: B01D50/00

    CPC classification number: B01D53/14 ,  B01D53/68 ,  B01J2219/00065 ,  B01J2219/00076 ,  B01J2219/00094 ,  B01J2219/0015 ,  B01J2219/00164 ,  C23C16/4412 ,  Y02C20/30

    Abstract: An effluent gas stream treatment system (903) for treatment of gaseous effluents such as waste gases from semiconductor manufacturing operations (901). The effluent gas stream treatment system comprises a pre-oxidation treatment unit (905), which may for example comprise a scrubber, an oxidation unit (913) such an electrothermal oxidizer, and a post-oxidation treatment unit (917), such as a wet or dry scrubber. The effluent gas stream treatment system of the invention may utilize an integrated oxidizer (852), quench (862) and wet scrubber assembly (870), for abatement of hazardous or otherwise undesired components from the effluent gas stream. Gas or liquid shrouding of gas streams in the treatment system may be provided by high efficiency inlet structures (1060, 1110).

    Abstract translation: 用于处理来自半导体制造操作的废气的气体流出物的流出气流处理系统（903）（901）。 废气流处理系统包括预氧化处理单元（905），其可以例如包括洗涤器，诸如电热氧化器的氧化单元（913）和后氧化处理单元（917），例如 湿式或干式洗涤器。 本发明的流出气流处理系统可以利用集成的氧化剂（852），淬火（862）和湿式洗涤器组件（870），用于从流出气流中减少危险或其他不希望的组分。 处理系统中的气流或气体罩罩可以由高效的入口结构（1060,1110）提供。

    POINT-OF-USE CATALYTIC OXIDATION APPARATUS AND METHOD FOR TREATMENT OF VOC-CONTAINING GAS STREAMS
    3.
    发明申请
    POINT-OF-USE CATALYTIC OXIDATION APPARATUS AND METHOD FOR TREATMENT OF VOC-CONTAINING GAS STREAMS 审中-公开
    使用要点的催化氧化装置和处理含VOC气体流的方法

    公开(公告)号：WO1997030275A1

    公开(公告)日：1997-08-21

    申请号：PCT/US1997002679

    申请日：1997-02-14

    Applicant: ATMI ECOSYS CORPORATION

    Inventor： ATMI ECOSYS CORPORATION ,  HOLST, Mark, R. ,  OLANDER, W., Karl ,  TOM, Glenn, M.

    IPC: F01N03/10

    CPC classification number: B01D53/8668 ,  B01D53/72 ,  Y02A50/235

    Abstract: A point-of-use catalytic oxidation system (100), for treatment of a VOC-containing gas stream, including: a heat exchanger (22) for heat exchange of a VOC-containing gas stream and a VOC-reduced gas stream at higher temperature than the VOC-containing gas stream, for heat recovery from the VOC-reduced gas stream for cooling thereof, to preheat the VOC-containing gas stream; a supplemental heater (30) for supplemental heating of preheated VOC-containing gas, if and as required, to an elevated temperature for catalytic oxidation of VOC therein; and a bed of catalytic oxidizer material (34) for catalytic oxidation of VOC in the VOC-containing gas stream, to yield the VOC-reduced gas stream. The heat exchanger, supplemental heater, and bed of catalytic oxidizer material are sized, constructed, arranged, and operated to effect autothermal catalytic oxidation of VOC in the bed of catalytic oxidizer material. The system may further employ a smoother (14) to attenuate influent VOC spikes in the feed gas, and/or a concentrator (14) to concentrate the feed gas VOC species for high efficiency VOC removal in the catalytic oxidation.

    Abstract translation: 一种用于处理含VOC的气流的使用点催化氧化系统（100），包括：用于在较高温度下使含VOC的气流和VOC还原气流的热交换的热交换器（22） 温度高于含VOC气体流，用于从VOC还原气流中回收热量以进行冷却，以预热含VOC气体流; 补充加热器（30），用于如果和根据需要将预热的含VOC的气体补充加热到用于催化氧化VOC的升高的温度; 以及催化氧化剂材料床（34），用于在含VOC的气流中催化氧化VOC，产生VOC还原气流。 催化氧化剂材料的热交换器，补充加热器和床的尺寸，构造，布置和操作以在催化氧化剂床的床中进行VOC的自热催化氧化。 该系统可以进一步使用更平滑的（14）来减少进料气体中的流入VOC峰值和/或浓缩器（14）以浓缩进料气体VOC物质以在催化氧化中去除高效率VOC。

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