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    FLOW-STABILIZED WET SCRUBBER SYSTEM FOR TREATMENT OF PROCESS GASES FROM SEMICONDUCTOR MANUFACTURING OPERATIONS
    1.
    发明申请
    FLOW-STABILIZED WET SCRUBBER SYSTEM FOR TREATMENT OF PROCESS GASES FROM SEMICONDUCTOR MANUFACTURING OPERATIONS 审中-公开
    用于处理来自半导体制造工艺的工艺气体的流动稳定的湿式SCRUBBER系统

    公开(公告)号：WO1997037056A1

    公开(公告)日：1997-10-09

    申请号：PCT/US1997006060

    申请日：1997-03-28

    Applicant: ATMI ECOSYS CORPORATION

    Inventor： ATMI ECOSYS CORPORATION ,  LANE, Scott ,  SHAH, Dinesh ,  COLMAN, Ronald ,  HEADING, Liam, R. ,  SIMPSON, Eric

    IPC: C23C16/00

    CPC classification number: C23C16/4412 ,  B01D53/74 ,  B01J3/002

    Abstract: A pressure stabilization system for damping pressure variations in a process (10) discharging an effluent gas stream, in which the process is pressure-sensitive and downstream pressure variations can adversely affect the upstream process, comprising a motive fluid driver (38) to receive the effluent gas stream, and means (3) for sensing a pressure characteristic of the effluent gas stream and adjusting the flow of the effluent gas stream to damp pressure fluctuations. The pressure stabilization system may further comprise: (i) a variable frequency drive (170) for operating the motive fluid driver at a variable rotational speed; (ii) a pressure transducer monitor (186) for monitoring the pressure characteristic of the effluent gas stream and generating a pressure transduced signal; and (iii) a proportional integral derivative controller (188) coupled with the pressure transducer monitor (186), and responsive to the pressure transduced signal to adjust the variable frequency drive to damp pressure fluctuations.

    Abstract translation: 一种压力稳定系统，用于减轻排出流出气体流的过程（10）中的压力变化的压力变化，其中所述过程是压敏和下游压力变化可能不利地影响上游过程，包括运动流体驱动器（38） 流出气流，以及用于感测流出气流的压力特性并调节流出气流的流动以减轻压力波动的装置（3）。 压力稳定系统还可以包括：（i）用于以可变转速操作动力流体驱动器的变频驱动器（170）; （ii）压力传感器监测器（186），用于监测废气流的压力特性并产生压力转换信号; 和（iii）与压力传感器监视器（186）耦合的比例积分微分控制器（188），并且响应于压力传导信号来调节变频驱动器以减轻压力波动。

    EFFLUENT GAS STREAM TREATMENT SYSTEM FOR OXIDATION TREATMENT OF SEMICONDUCTOR MANUFACTURING EFFLUENT GASES
    2.
    发明申请
    EFFLUENT GAS STREAM TREATMENT SYSTEM FOR OXIDATION TREATMENT OF SEMICONDUCTOR MANUFACTURING EFFLUENT GASES 审中-公开
    用于氧化处理半导体制造流体气体的气体流处理系统

    公开(公告)号：WO1998029181A1

    公开(公告)日：1998-07-09

    申请号：PCT/US1997023741

    申请日：1997-12-31

    Applicant: ATMI ECOSYS CORPORATION

    Inventor： ATMI ECOSYS CORPORATION ,  HOLST, Mark, R. ,  CARPENTER, Kent ,  LANE, Scott ,  ARYA, Prakash, V. ,  BALLIEW, Patrick ,  SWEENEY, Joseph, D.

    IPC: B01D50/00

    CPC classification number: B01D53/14 ,  B01D53/68 ,  B01J2219/00065 ,  B01J2219/00076 ,  B01J2219/00094 ,  B01J2219/0015 ,  B01J2219/00164 ,  C23C16/4412 ,  Y02C20/30

    Abstract: An effluent gas stream treatment system (903) for treatment of gaseous effluents such as waste gases from semiconductor manufacturing operations (901). The effluent gas stream treatment system comprises a pre-oxidation treatment unit (905), which may for example comprise a scrubber, an oxidation unit (913) such an electrothermal oxidizer, and a post-oxidation treatment unit (917), such as a wet or dry scrubber. The effluent gas stream treatment system of the invention may utilize an integrated oxidizer (852), quench (862) and wet scrubber assembly (870), for abatement of hazardous or otherwise undesired components from the effluent gas stream. Gas or liquid shrouding of gas streams in the treatment system may be provided by high efficiency inlet structures (1060, 1110).

    Abstract translation: 用于处理来自半导体制造操作的废气的气体流出物的流出气流处理系统（903）（901）。 废气流处理系统包括预氧化处理单元（905），其可以例如包括洗涤器，诸如电热氧化器的氧化单元（913）和后氧化处理单元（917），例如 湿式或干式洗涤器。 本发明的流出气流处理系统可以利用集成的氧化剂（852），淬火（862）和湿式洗涤器组件（870），用于从流出气流中减少危险或其他不希望的组分。 处理系统中的气流或气体罩罩可以由高效的入口结构（1060,1110）提供。

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