METALLO-OXOMERIC SCRUBBER COMPOSITIONS, AND METHOD OF GAS PURIFICATION UTILIZING SAME
    1.
    发明申请
    METALLO-OXOMERIC SCRUBBER COMPOSITIONS, AND METHOD OF GAS PURIFICATION UTILIZING SAME 审中-公开
    METALLO-OXOMERIC SCRUBBER组合物和使用其的气体净化方法

    公开(公告)号:WO1995018674A1

    公开(公告)日:1995-07-13

    申请号:PCT/US1995000171

    申请日:1995-01-06

    CPC classification number: B01D53/70 B01D15/02 B01D53/68 B01D53/685

    Abstract: Scavengers for removing acidic or corrosive gaseous components from semiconductor process effluents comprising a metallic macromer comprising a covalently bonded complex of (i) metal coordination atoms linked to (ii) oxomeric moieties selected from the group consisting of carbonate, sulfite, carboxylate, and silicate, and methods for synthesizing these scavengers. A method for cleaning an exhaust gas containing at least one corrosive or acidic gaseous component selected from the group consisting of hydrogen halide, chlorine, boron trihalide, thionyl chloride, and tungsten hexafluoride, which comprises contacting the exhaust gas with the metallic macromer scavenger compositions.

    Abstract translation: 用于从半导体工艺流出物中除去酸性或腐蚀性气态组分的清除剂,其包含金属大分子单体,其包含(i)与(ii)选自碳酸酯,亚硫酸酯,羧酸酯和硅酸酯的氧化物部分连接的金属配位原子的共价键合的络合物, 以及合成这些清除剂的方法。 一种用于清洁含有选自卤化氢,氯,三卤化硼,亚硫酰氯和六氟化钨中的至少一种腐蚀性或酸性气体组分的排气的方法,其包括使废气与金属大分子清除剂组合物接触。

    FLOW-STABILIZED WET SCRUBBER SYSTEM FOR TREATMENT OF PROCESS GASES FROM SEMICONDUCTOR MANUFACTURING OPERATIONS
    2.
    发明申请
    FLOW-STABILIZED WET SCRUBBER SYSTEM FOR TREATMENT OF PROCESS GASES FROM SEMICONDUCTOR MANUFACTURING OPERATIONS 审中-公开
    用于处理来自半导体制造工艺的工艺气体的流动稳定的湿式SCRUBBER系统

    公开(公告)号:WO1997037056A1

    公开(公告)日:1997-10-09

    申请号:PCT/US1997006060

    申请日:1997-03-28

    CPC classification number: C23C16/4412 B01D53/74 B01J3/002

    Abstract: A pressure stabilization system for damping pressure variations in a process (10) discharging an effluent gas stream, in which the process is pressure-sensitive and downstream pressure variations can adversely affect the upstream process, comprising a motive fluid driver (38) to receive the effluent gas stream, and means (3) for sensing a pressure characteristic of the effluent gas stream and adjusting the flow of the effluent gas stream to damp pressure fluctuations. The pressure stabilization system may further comprise: (i) a variable frequency drive (170) for operating the motive fluid driver at a variable rotational speed; (ii) a pressure transducer monitor (186) for monitoring the pressure characteristic of the effluent gas stream and generating a pressure transduced signal; and (iii) a proportional integral derivative controller (188) coupled with the pressure transducer monitor (186), and responsive to the pressure transduced signal to adjust the variable frequency drive to damp pressure fluctuations.

    Abstract translation: 一种压力稳定系统,用于减轻排出流出气体流的过程(10)中的压力变化的压力变化,其中所述过程是压敏和下游压力变化可能不利地影响上游过程,包括运动流体驱动器(38) 流出气流,以及用于感测流出气流的压力特性并调节流出气流的流动以减轻压力波动的装置(3)。 压力稳定系统还可以包括:(i)用于以可变转速操作动力流体驱动器的变频驱动器(170); (ii)压力传感器监测器(186),用于监测废气流的压力特性并产生压力转换信号; 和(iii)与压力传感器监视器(186)耦合的比例积分微分控制器(188),并且响应于压力传导信号来调节变频驱动器以减轻压力波动。

    EFFLUENT GAS STREAM TREATMENT SYSTEM FOR OXIDATION TREATMENT OF SEMICONDUCTOR MANUFACTURING EFFLUENT GASES
    3.
    发明申请
    EFFLUENT GAS STREAM TREATMENT SYSTEM FOR OXIDATION TREATMENT OF SEMICONDUCTOR MANUFACTURING EFFLUENT GASES 审中-公开
    用于氧化处理半导体制造流体气体的气体流处理系统

    公开(公告)号:WO1998029181A1

    公开(公告)日:1998-07-09

    申请号:PCT/US1997023741

    申请日:1997-12-31

    Abstract: An effluent gas stream treatment system (903) for treatment of gaseous effluents such as waste gases from semiconductor manufacturing operations (901). The effluent gas stream treatment system comprises a pre-oxidation treatment unit (905), which may for example comprise a scrubber, an oxidation unit (913) such an electrothermal oxidizer, and a post-oxidation treatment unit (917), such as a wet or dry scrubber. The effluent gas stream treatment system of the invention may utilize an integrated oxidizer (852), quench (862) and wet scrubber assembly (870), for abatement of hazardous or otherwise undesired components from the effluent gas stream. Gas or liquid shrouding of gas streams in the treatment system may be provided by high efficiency inlet structures (1060, 1110).

    Abstract translation: 用于处理来自半导体制造操作的废气的气体流出物的流出气流处理系统(903)(901)。 废气流处理系统包括预氧化处理单元(905),其可以例如包括洗涤器,诸如电热氧化器的氧化单元(913)和后氧化处理单元(917),例如 湿式或干式洗涤器。 本发明的流出气流处理系统可以利用集成的氧化剂(852),淬火(862)和湿式洗涤器组件(870),用于从流出气流中减少危险或其他不希望的组分。 处理系统中的气流或气体罩罩可以由高效的入口结构(1060,1110)提供。

    POINT-OF-USE CATALYTIC OXIDATION APPARATUS AND METHOD FOR TREATMENT OF VOC-CONTAINING GAS STREAMS
    5.
    发明申请
    POINT-OF-USE CATALYTIC OXIDATION APPARATUS AND METHOD FOR TREATMENT OF VOC-CONTAINING GAS STREAMS 审中-公开
    使用要点的催化氧化装置和处理含VOC气体流的方法

    公开(公告)号:WO1997030275A1

    公开(公告)日:1997-08-21

    申请号:PCT/US1997002679

    申请日:1997-02-14

    CPC classification number: B01D53/8668 B01D53/72 Y02A50/235

    Abstract: A point-of-use catalytic oxidation system (100), for treatment of a VOC-containing gas stream, including: a heat exchanger (22) for heat exchange of a VOC-containing gas stream and a VOC-reduced gas stream at higher temperature than the VOC-containing gas stream, for heat recovery from the VOC-reduced gas stream for cooling thereof, to preheat the VOC-containing gas stream; a supplemental heater (30) for supplemental heating of preheated VOC-containing gas, if and as required, to an elevated temperature for catalytic oxidation of VOC therein; and a bed of catalytic oxidizer material (34) for catalytic oxidation of VOC in the VOC-containing gas stream, to yield the VOC-reduced gas stream. The heat exchanger, supplemental heater, and bed of catalytic oxidizer material are sized, constructed, arranged, and operated to effect autothermal catalytic oxidation of VOC in the bed of catalytic oxidizer material. The system may further employ a smoother (14) to attenuate influent VOC spikes in the feed gas, and/or a concentrator (14) to concentrate the feed gas VOC species for high efficiency VOC removal in the catalytic oxidation.

    Abstract translation: 一种用于处理含VOC的气流的使用点催化氧化系统(100),包括:用于在较高温度下使含VOC的气流和VOC还原气流的热交换的热交换器(22) 温度高于含VOC气体流,用于从VOC还原气流中回收热量以进行冷却,以预热含VOC气体流; 补充加热器(30),用于如果和根据需要将预热的含VOC的气体补充加热到用于催化氧化VOC的升高的温度; 以及催化氧化剂材料床(34),用于在含VOC的气流中催化氧化VOC,产生VOC还原气流。 催化氧化剂材料的热交换器,补充加热器和床的尺寸,构造,布置和操作以在催化氧化剂床的床中进行VOC的自热催化氧化。 该系统可以进一步使用更平滑的(14)来减少进料气体中的流入VOC峰值和/或浓缩器(14)以浓缩进料气体VOC物质以在催化氧化中去除高效率VOC。

    STORAGE AND DELIVERY SYSTEM FOR GASEOUS COMPOUNDS
    6.
    发明申请
    STORAGE AND DELIVERY SYSTEM FOR GASEOUS COMPOUNDS 审中-公开
    用于气体化合物的储存和输送系统

    公开(公告)号:WO1996011739A1

    公开(公告)日:1996-04-25

    申请号:PCT/US1995013040

    申请日:1995-10-13

    Abstract: An adsorption-desorption apparatus (102), and process for storage and dispensing of a gas, e.g., hydride and halide gases, and organometallic Group V compounds, which is selectively dispensed by pressure differential desorption of the sorbate gas from the sorbent material. The sorbent material is preferably a material which is devoid of concentration of trace components such as water, metals and oxidic transition metal species which would significantly decompose the sorbate gas in apparatus (102).

    Abstract translation: 吸附 - 解吸装置(102)以及用于储存和分配气体例如氢化物和卤化物气体以及有机金属V族化合物的方法,其通过吸着剂材料的压力差解吸附选择性分配。 吸附剂材料优选是没有浓缩微量组分如水,金属和氧化过渡金属物质的物质,其将显着分解设备(102)中的山梨酸气体。

Patent Agency Ranking