公开(公告)号：WO2020247378A1

公开(公告)日：2020-12-10

申请号：PCT/US2020/035723

申请日：2020-06-02

Applicant: AXCELIS TECHNOLOGIES, INC.

Inventor： SPORLEDER, David ,  BASSOM, Neil ,  COLVIN, Neil ,  AMEEN, Mike ,  XU, Xiao

IPC: H01J37/317 ,  C23C14/06 ,  C23C14/48 ,  H01J37/08

Abstract: An ion source assembly (202) and method has a source gas supply (210) to provide a molecular carbon source gas (211) to an ion source chamber (206). A source gas flow controller (219) controls flow of the molecular carbon source gas to the ion source chamber. An excitation source (214) excites the molecular carbon source gas to form carbon ions and radicals. An extraction electrode (207) extracts the carbon ions from the ion source chamber, forming an ion beam (204). An oxidizing co-gas supply (220) provides oxidizing co-gas (221) to chamber. An oxidizing co-gas flow controller (222) controls flow of the oxidizing co-gas to the chamber. The oxidizing co-gas decomposes and reacts with carbonaceous residues and atomic carbon forming carbon monoxide and carbon dioxide within the ion source chamber. A vacuum pump system (234) removes the carbon monoxide and carbon dioxide, where deposition of atomic carbon within the ion source chamber is reduced and a lifetime of the ion source is increased.

公开(公告)号：WO2022093404A1

公开(公告)日：2022-05-05

申请号：PCT/US2021/049406

申请日：2021-09-08

Applicant: AXCELIS TECHNOLOGIES, INC.

Inventor： COLVIN, Neil ,  BASSOM, Neil ,  XU, Xiao

IPC: H01J37/08 ,  C23C14/48 ,  H01J37/317

Abstract: An ion implantation system 101, ion source 108, and method are provided, where an ion source is configured to ionize an aluminum- based ion source material 113,132 and to form an ion beam 112 and a by-product including a non-conducting material. An etchant gas mixture has a predetermined concentration of fluorine and a noble gas that is in fluid communication with the ion source. The predetermined concentration of fluorine is associated with a predetermined health safety level, such as approximately a 20% maximum concentration of fluorine. The etchant gas mixture can have a co-gas with a concentration less than approximately 5% of argon. The aluminum-based ion source material can be a ceramic member, such as a repeller shaft, a shield, or other member within the ion source.