公开(公告)号：US20150001192A1

公开(公告)日：2015-01-01

申请号：US13928264

申请日：2013-06-26

Applicant: Apple Inc.

Inventor： Simon R. Lancaster-Larocque ,  Collin Chan ,  Kensuke Uemura ,  Purwadi Raharjo

IPC: H01J37/317 ,  B23K15/00

CPC classification number: B23K15/00 ,  B23K15/02 ,  B23K20/122 ,  H01J37/05 ,  H01J37/305 ,  H01J2237/05

Abstract: The described embodiments relate generally to adjusting output or conditioning of an electron beam. More specifically various configurations are disclosed that relate to maintaining a footprint of the electron beam incident to a workpiece within a defined energy level. Such a configuration allows the electron beam to heat only specific portions of the workpiece to a superheated state in which intermetallic compounds are dissolved. In one embodiment a mask is disclosed that prevents low energy portions of an electron beam from contacting the workpiece. In another embodiment the electron beam can be focused in a way that maintains the electron beam at an energy level such that substantially all of the electron beam is above a threshold energy level.

Abstract translation: 所描述的实施例一般涉及调整电子束的输出或调节。 更具体地，公开了涉及将入射到工件的电子束的覆盖区保持在限定的能级内的各种构造。 这种构造允许电子束仅将工件的特定部分加热到金属间化合物溶解的过热状态。 在一个实施例中，公开了防止电子束的低能量部分接触工件的掩模。 在另一个实施例中，电子束可以以将电子束维持在能量水平使得基本上所有的电子束都高于阈值能级的方式聚焦。

公开(公告)号：US10384299B2

公开(公告)日：2019-08-20

申请号：US13928264

申请日：2013-06-26

Applicant: Apple Inc.

Inventor： Simon R. Lancaster-Larocque ,  Collin Chan ,  Kensuke Uemura ,  Purwadi Raharjo

IPC: B23K15/00 ,  B23K15/02 ,  B23K20/12 ,  H01J37/05 ,  H01J37/305

Abstract: The described embodiments relate generally to adjusting output or conditioning of an electron beam. More specifically various configurations are disclosed that relate to maintaining a footprint of the electron beam incident to a workpiece within a defined energy level. Such a configuration allows the electron beam to heat only specific portions of the workpiece to a superheated state in which intermetallic compounds are dissolved. In one embodiment a mask is disclosed that prevents low energy portions of an electron beam from contacting the workpiece. In another embodiment the electron beam can be focused in a way that maintains the electron beam at an energy level such that substantially all of the electron beam is above a threshold energy level.