公开(公告)号：JPH05197154A

公开(公告)日：1993-08-06

申请号：JP15043592

申请日：1992-06-10

Applicant: BASF AG

Inventor： RAINHORUTO SHIYUBUARUMU ,  HORUSUTO BINDAA ,  DEIRUKU FUNHOFU ,  YOOAHIMU ROOZAA ,  ANGERIKA FUNHOFU

IPC: G03F7/004 ,  G03F7/029 ,  G03F7/033 ,  G03F7/039 ,  G03F7/38 ,  H01L21/027

Abstract: PURPOSE: To treat a pure org. single-layer photoresist by acid catalyst reaction and to form a relief pattern by incorporating a specified org. binder or polymer binder and a specified org. compd. CONSTITUTION: This positive process radiation-sensitive mixture contains an org. binder or polymer binder which has an acidunstable ether, ester or carbonate groups and is insoluble with water but soluble with an alkali soln., and an org. compd. which increases its solubility with a water-based alkali developer by the effect of acid, or an org. compd. having a group which is opened by acid or a group which produces strong acid by the effect of radiation, or a mixture of these org. compds. Further, the mixture contains an org. compd. expressed by formula R -SO2 -SO2 -R which produces strong acid by the effect of radiation. In formula, each R , R is an alkyl group and the like having

公开(公告)号：JPH0718046A

公开(公告)日：1995-01-20

申请号：JP13907894

申请日：1994-06-21

Applicant: BASF AG

Inventor： AREKUSANDAA BUARON ,  GERUHARUTO AUHOTAA ,  URURIKE RIHITO ,  KAARU HEEBERURE ,  ANGERIKA FUNHOFU

IPC: C08G18/08 ,  C08G18/00 ,  C08L75/00 ,  C08L75/04 ,  C08L101/00 ,  C09D175/04 ,  C09J175/04

公开(公告)号：JPH03134098A

公开(公告)日：1991-06-07

申请号：JP27251590

申请日：1990-10-12

Applicant: BASF AG

Inventor： AREKISANDAA KUUTO ,  RIHIARUTO BAURU ,  ANGERIKA FUNHOFU ,  BUARUTAA DENTSUINGAA ,  HAINRITSUHI HARUTOMAN ,  HANSUUYURUGEN RAUBENHAIMAA

IPC: C08F8/06 ,  C11D3/37