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    RADIATION-SENSITIVE COMPOSITION FOR POSITIVE PROCESSING AND MANUFACTURE OF RELIEF STRUCTURE USING IT
    1.
    发明专利
    RADIATION-SENSITIVE COMPOSITION FOR POSITIVE PROCESSING AND MANUFACTURE OF RELIEF STRUCTURE USING IT 失效

    公开(公告)号：JPH09127700A

    公开(公告)日：1997-05-16

    申请号：JP24082196

    申请日：1996-09-11

    Applicant: BASF AG

    Inventor： RAINHORUTO SHIYUBUARUMU ,  DEIRUKU FUNHOFU ,  HORUSUTO BINDAA

    IPC: G03F7/004 ,  G03F7/039 ,  H01L21/027

    Abstract: PROBLEM TO BE SOLVED: To obtain good photosensitivity, to prevent loss in the layer thickness and to improve the contrast by incorporating a specified low mol.wt. org. compd. and tow kinds of org. compds. SOLUTION: This compsn. contains at least one kind of (a1) water-insoluble polymer binder which has an unstable group with acid and becomes soluble with an alkali soln. by the effect of acid, or (a2.1) a water-insoluble polymer binder which is soluble with an alkali soln. and (a2.2) a low mol.wt. org. compd. which increases the solubility with an alkali soln. by the effect of acid, and at least one kind of (b) org. compd. which forms acid by the effect of chemical active rays, and (c) one or more kinds of other org. compds. different from the compd. above described. The one or more components (a1) to (c) are expressed by a bonding group of formula I, especially by formula II, R'''' contains hydrogen or halogen group, or the component (c) is expressed by formula II and R is 1-6C alkyl group and n is 1 to 6.

    FORMATION OF UNIFORM THIN FILM
    2.
    发明专利
    FORMATION OF UNIFORM THIN FILM 失效

    公开(公告)号：JPH02307572A

    公开(公告)日：1990-12-20

    申请号：JP9659290

    申请日：1990-04-13

    Applicant: BASF AG

    Inventor： HAARARUTO FUKUSU ,  DEIRUKU FUNHOFU ,  URURIKE RIHITO ,  BUORUFUGANGU SHIYUREPU

    IPC: G02F1/1337 ,  B05D1/18 ,  B05D1/20 ,  C08J5/18 ,  C08J7/04 ,  C09K3/00

    Abstract: PURPOSE: To obtain a thin film having stability to oxygen plasma etching by forming a uniform thin film of 40 Å to 1 μm thickness on a substrate by the Langmuir-Blodgett technique or the self-assembly technique using a specified silicon-contg. compd. CONSTITUTION: A uniform thin film of 40 Å to 1 μm thickness is formed on a substrate by the Langmuir-Blodgett technique or the self-assembly technique using a silicon-contg. compd. of formula I [where R', R" and R"' are each 1-4C alkyl or 6-10C aryl, R and R are each halogenated alkyl, oxyalkyl or the like, R and R are each divalent optionally halogenated alkylene, oxyalkylene or the like, R and R are each OH, COOH, CN or the like and (x) and (y) are each 0-1,000] to obtain the objective thin film having stability to oxygen plasma etching. An electronic device is produced by forming an image with radiation using the thin film and microlithography using the thin film is provided.

    RADIATION-SENSITIVE COMPOSITION FOR POSITIVE PROCESSING AND MANUFACTURE OF RELIEF STRUCTURE USING IT
    6.
    发明专利
    RADIATION-SENSITIVE COMPOSITION FOR POSITIVE PROCESSING AND MANUFACTURE OF RELIEF STRUCTURE USING IT 失效

    公开(公告)号：JPH09127699A

    公开(公告)日：1997-05-16

    申请号：JP24082096

    申请日：1996-09-11

    Applicant: BASF AG

    Inventor： RAINHORUTO SHIYUBUARUMU ,  DEIRUKU FUNHOFU ,  HORUSUTO BINDAA

    IPC: G03F7/004 ,  G03F7/039 ,  H01L21/027

    Abstract: PROBLEM TO BE SOLVED: To obtain good photosensitivity, allowance for treatment and exposure, to prevent loss in the layer thickness in each treating process and to improve the contrast by incorporating a specified polymer and two kinds of org. compds. SOLUTION: This compsn. contains (a) a polymer which contains an unstable group for acid and is insoluble with water but becomes soluble with an alkali soln. by the effect of acid, (b) an org. compd. which forms acid by the effect of chemical active rays, and (c) other org. compds. The polymer (a) contains units expressed by formulae I to III by 35-70mol% of the unit I, 35-50mol% of the unit II and 0-15mol% of the unit III. The org. compd. (b) is a sulfonium salt expressed by formula IV, and the org. compds. (c) are expressed by formula V, wherein R' and R'' are 1-4C alkyl groups, or R' and R'' are bonded with CH2 to form a five-member ring, and R''' is 1-4C alkyl group.

    ELECTROLUMINESCENCE DEVICE
    7.
    发明专利
    ELECTROLUMINESCENCE DEVICE 失效

    公开(公告)号：JPH07114987A

    公开(公告)日：1995-05-02

    申请号：JP18161794

    申请日：1994-08-02

    Applicant: BASF AG

    Inventor： DEIRUKU FUNHOFU ,  KAARU JIIMENSUMAIAA ,  RUUKASU HOISURINGU ,  KAARUUHAINTSU ETSUBATSUHA ,  DEIITORIHI HAARAA ,  YURUGEN JINMERAA

    IPC: C09K11/06 ,  G09F9/30 ,  H01L51/00 ,  H01L51/30 ,  H01L51/50 ,  H05B33/10 ,  H05B33/12 ,  H05B33/14

    Abstract: PURPOSE: To provide a new EL element by forming a laminate of one or more organic layers, and forming one or more organic layers with bridging led by heat and radiation, and forming each layer so that one kind or more charge transporting compounds exist therein. CONSTITUTION: A base electrode 2, a hole-filling layer 3, a hole-transporting layer 4, an emitter layer 5, an electron-transporting layer 6, an electron-filling layer 7, and Al top electrode 8 are laminated on a transparent glass board 1, and a contact 9 is provided, and they are covered with a capsule 10. A third aromatic amine and perylene are a compound having a group, to which cationic polymerization or radical polymerization can be performed or to which light can be added, and these are led to the layers 3, 4, 6, 7, and the net-like composition of insoluble polymer is formed by bridging led by heat and radiation. With this structure, all the compounds for transporting charges in an arbitrary form can be used as a charge-transporting compound inside of the layers. As an appropriate compound especially for a component of an emitter layer, namely, for a fluorescent dye, a compound having a group, to which anionic, cationic and radial polymerization can be performed, is used.

    MANUFACTURE OF RADIATION-SENSITIVE MIXTURE CONTAINING ACID-INSTABILITY GROUP, RELIEF PATTERN AND RELIEF IMAGE
    8.
    发明专利
    MANUFACTURE OF RADIATION-SENSITIVE MIXTURE CONTAINING ACID-INSTABILITY GROUP, RELIEF PATTERN AND RELIEF IMAGE 失效

    公开(公告)号：JPH05181264A

    公开(公告)日：1993-07-23

    申请号：JP6156692

    申请日：1992-03-18

    Applicant: BASF AG

    Inventor： RAINHORUTO SHIYUBUARUMU ,  HORUSUTO BINDAA ,  DEIRUKU FUNHOFU

    IPC: C08K5/42 ,  C08K5/51 ,  G03F7/004 ,  G03F7/039 ,  H01L21/027

    Abstract: PURPOSE: To improve preservability and processing flexibility as a photosensitive positive processing agent by adding a specified org. compd. to a radiation sensitive compsn. contg. a polymer binder and an org. compd. forming a strong acid under radiation. CONSTITUTION: A compd. represented by formula I (where R is alkyl, haloalkyl or aryl and R' is alkyl or alkoxy) or formula I' [where X is -O-, -S- or -(CR"2 )n -] is added to a radiation sensitive compsn. contg. a water-insoluble but alkyli- soluble polymer binder and an org. compd. having at least one acid- decomposable group and other group forming a strong acid by the action of radiation. The compd. represented by the formula I is preferably pyrocatechin, resorcinol, hydroquinone, pyrogallol or hydroxyhydroquinone.

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