公开(公告)号：JPH09328669A

公开(公告)日：1997-12-22

申请号：JP5970997

申请日：1997-03-14

Applicant: BASF AG

Inventor： HORUSUTO ZAIBERUTO ,  URURIKE RIHITO ,  SHIYUTEFUAN ENDEISHIYU ,  TOOMASU ANZERUMAN ,  PEETAA FUITSUKAIZEN ,  HANSUUYOAHIMU FURITSUKE ,  ANDOREE DORAGON ,  HANSU YOTSUTO NOIMAN ,  RENAATE BUYUSUTENFUERUTO ,  ETSUKEHARUTO BUISUTSUUUBA

IPC: C09J125/04 ,  C08G18/08 ,  C08L75/04 ,  C09J131/02 ,  C09J133/06 ,  C09J133/08 ,  C09J175/04 ,  C09J201/00

公开(公告)号：JPH06313161A

公开(公告)日：1994-11-08

申请号：JP9007494

申请日：1994-04-27

Applicant: BASF AG

Inventor： URURIKE RIHITO ,  AREKUSANDAA BUARON ,  GERUHARUTO AUHOTAA ,  ROTAARU MENPERU ,  HORUSUTO ZAIBERUTO ,  KAARU HEEBERURE ,  BUERUNAA FURIISU

IPC: C08G18/08 ,  C08G18/00 ,  C08G18/65 ,  C08K5/00 ,  C08L75/00 ,  C08L75/04 ,  C09J175/00 ,  C09J175/04

公开(公告)号：JPH07165860A

公开(公告)日：1995-06-27

申请号：JP31188392

申请日：1992-11-20

Applicant: BASF AG

Inventor： URURIKE RIHITO ,  KAARU HEBERE ,  EERIHI GURUBINSU ,  MARIIA GIYOPARU RAU ,  GERUNOTO FURANTSUMAN ,  MIHIYAERU PORUTOUGARU

IPC: C08G18/00 ,  C08G18/08 ,  C08G18/42 ,  C08G18/75 ,  C09D175/06 ,  C09J175/00 ,  C09J175/06

公开(公告)号：JPH0718046A

公开(公告)日：1995-01-20

申请号：JP13907894

申请日：1994-06-21

Applicant: BASF AG

Inventor： AREKUSANDAA BUARON ,  GERUHARUTO AUHOTAA ,  URURIKE RIHITO ,  KAARU HEEBERURE ,  ANGERIKA FUNHOFU

IPC: C08G18/08 ,  C08G18/00 ,  C08L75/00 ,  C08L75/04 ,  C08L101/00 ,  C09D175/04 ,  C09J175/04

公开(公告)号：JPH06340804A

公开(公告)日：1994-12-13

申请号：JP3666994

申请日：1994-03-08

Applicant: BASF AG

Inventor： URURIKE RIHITO ,  AREKUSANDAA BUARON ,  GEERUHARUTO AUHOTAA ,  ROTARU MEMUPERU ,  HORUSUTO ZAIBERUTO ,  GIYUNTAA SHIERU

IPC: C08L61/00 ,  C08G18/10 ,  C08L61/04 ,  C08L75/00 ,  C08L75/04 ,  C09J175/04

公开(公告)号：JPH04290542A

公开(公告)日：1992-10-15

申请号：JP25078791

申请日：1991-09-30

Applicant: BASF AG

Inventor： HAARARUTO FUKUSU ,  URURIKE RIHITO ,  BUORUFUGANGU SHIYUREPU

IPC: B01J19/00 ,  B05D1/20 ,  C08F22/36 ,  C08F222/40 ,  C08G73/10 ,  C08G73/12 ,  C08J5/18 ,  H01L21/312

Abstract: PURPOSE: To provide an ultrathin thermostable bismaleimide film wherein especially the insulating properties and the pattern-forming ability through high- energy radiation are improved. CONSTITUTION: An ultrathin, thermostable, uniform bismaleimide film with an adjustable thickness of 1 μm or thinner is obtained by converting an ionic precursor, obtained by allowing a reaction product of a diamine and an anhydrous maleic acid to react with a long-chain amine, to an imide.

公开(公告)号：JPH02307572A

公开(公告)日：1990-12-20

申请号：JP9659290

申请日：1990-04-13

Applicant: BASF AG

Inventor： HAARARUTO FUKUSU ,  DEIRUKU FUNHOFU ,  URURIKE RIHITO ,  BUORUFUGANGU SHIYUREPU

IPC: G02F1/1337 ,  B05D1/18 ,  B05D1/20 ,  C08J5/18 ,  C08J7/04 ,  C09K3/00

Abstract: PURPOSE: To obtain a thin film having stability to oxygen plasma etching by forming a uniform thin film of 40 Å to 1 μm thickness on a substrate by the Langmuir-Blodgett technique or the self-assembly technique using a specified silicon-contg. compd. CONSTITUTION: A uniform thin film of 40 Å to 1 μm thickness is formed on a substrate by the Langmuir-Blodgett technique or the self-assembly technique using a silicon-contg. compd. of formula I [where R', R" and R"' are each 1-4C alkyl or 6-10C aryl, R and R are each halogenated alkyl, oxyalkyl or the like, R and R are each divalent optionally halogenated alkylene, oxyalkylene or the like, R and R are each OH, COOH, CN or the like and (x) and (y) are each 0-1,000] to obtain the objective thin film having stability to oxygen plasma etching. An electronic device is produced by forming an image with radiation using the thin film and microlithography using the thin film is provided.

公开(公告)号：JPH06293860A

公开(公告)日：1994-10-21

申请号：JP49094

申请日：1994-01-07

Applicant: BASF AG

Inventor： EERITSUHI GURUBINSU ,  KAARU HEBERURE ,  URURIKE RIHITO ,  AREKUSANDAA BUARON

IPC: C08L75/04 ,  C08G18/08 ,  C08K5/10 ,  C08L75/00 ,  C09D175/00 ,  C09D175/04 ,  C09J175/04

公开(公告)号：JPH03246300A

公开(公告)日：1991-11-01

申请号：JP32339390

申请日：1990-11-28

Applicant: BASF AG

Inventor： HAARARUTO FUKUSU ,  URURIKE RIHITO ,  HERUMUUTO RINGUSUDORUFU ,  RAINAA BURANKENBURUKU ,  MIHIYAERU AARERUSU

IPC: C07K14/00 ,  C07K17/02 ,  C12N11/00 ,  C12N11/06 ,  C12Q1/00 ,  G01N33/543

公开(公告)号：JPH03201230A

公开(公告)日：1991-09-03

申请号：JP4971890

申请日：1990-03-02

Applicant: BASF AG

Inventor： DEIRUKU FUNHOFU ,  HAARARUTO FUKUSU ,  URURIKE RIHITO ,  BUORUFUGANGU SHIYUREPU ,  BUERUNAA HITSUKERU ,  BUORUFUGANGU KUNORU ,  GEERUHARUTO BUEEGUNAA ,  GIIZERA DOUDA

IPC: G11B7/00 ,  G11B7/005 ,  G11B7/24 ,  G11B7/244 ,  G11B7/245 ,  G11B11/00

Abstract: PURPOSE: To attain the reading out of high sensitivity with slight electric power by reading out the information written into a specific polymer layer coating a metallic layer or semiconductor layer by surface plasmon. CONSTITUTION: The information written by image exposure by a laser beam 1 into the polymer layer 2 of a thickness of the layer of 0.1μm below with which the surface of a metallic layer 3 is coated is read out by the surface plasmon 6. The polymer layer 2 contains at least one kind of dyes at the prescribed concn. per unit surface area. The dyes are preferably lipophilic dyes which are soluble in an org. solvent and are dispersed uniformly into a polymer matrix. As a result, the memory of the information in the thin medium and the reading out at the high signal-to-noise ratio to the extent of allowing quantitative understanding are made possible.