1.
    发明专利
    未知

    公开(公告)号:DE102004041299A1

    公开(公告)日:2006-03-09

    申请号:DE102004041299

    申请日:2004-08-25

    Applicant: BASF AG

    Abstract: Preparation of polyurethane-foaming substance (A) with reduced emission comprises: reacting polyisocyante with a compound (B) containing at least two reactive hydrogen atoms of isocyanates in the presence of a catalysts, where the catalyst is at least an alcohol compound (I). Preparation of polyurethane-foaming substance (A) with reduced emission comprises: reacting polyisocyanate with a compound containing at least two reactive hydrogen atoms of isocyanates in the presence of a catalyst, where the catalyst is an alcohol compound of formula (I). R1, R2 : -C aH 2a+1 or -C bH cN d; a : 1-4; b : 3-7; c : 6-14; d : 0-2; R3 : C eH fO g; e : 0-4; f : 0-8; g : 0-2; R4 : H, CH 3 or C 2H 5; and n, m : 1-5. An independent claim is also included for the polyurethane-foaming substance obtained by the method with a content of volatile organic compounds (less than 100 ppm) and condensable compounds (less than 250 ppm). [Image].

    2.
    发明专利
    未知

    公开(公告)号:DE102004013408A1

    公开(公告)日:2005-10-06

    申请号:DE102004013408

    申请日:2004-03-18

    Applicant: BASF AG

    Abstract: The invention relates to polyether alcohols, to a process for preparing polyether alcohols by reacting alkylene oxides in the presence of a double metal cyanide (DMC) catalyst with at least one saturated OH component which may, if appropriate, have previously been reacted with an alkylene oxide, wherein an antioxidant is added before or during the reaction, and also to the further processing of the polyether alcohols to form polyurethanes.

    New substituted bis(tetrakis(hydroxymethyl)phosphonium) salts are useful for the production of flame retardant polyurethane foams

    公开(公告)号:DE10304344A1

    公开(公告)日:2004-08-12

    申请号:DE10304344

    申请日:2003-02-03

    Applicant: BASF AG

    Abstract: Substituted bis[tetrakis(hydroxymethyl)phosphonium] salts are new. Substituted bis[tetrakis(hydroxymethyl)phosphonium] salts (I) of formula (1) are new. [Image] A : -CH2 or CH2-CH-E; E : 1-8(1-4)C alkylene; R : an organic group which in polyurethane comprises the corresponding isocyanate or its reaction products or in a prepolymer is the group of the added isocyanate; w, x, y, z : 1-20. Independent claims are included for: (1) a process for the production of salts (I) by reaction of tetrakis(hydroxymethyl)phosphonium salts of formula (10) with alkylene oxides; (2) polyurethanes, preferably rigid polyurethane foams having at least one structure of formula (2) - (9) in its matrix; (3) an isocyanate or hydroxyl group containing prepolymer containing at least one structure of formula (2) - (9) and; (4) a process for the production of flame retardant polyurethanes by reaction of polyisocyanates with isocyanate-reactive compounds having at least 2 reactive hydrogen atoms in the presence of a compound of formula (1) or (10). [Image] [Image] D : -CH2 or -CH2-CH-E; B : anion; a : whole number ensuring electroneutrality.

    6.
    发明专利
    未知

    公开(公告)号:AT386763T

    公开(公告)日:2008-03-15

    申请号:AT05015599

    申请日:2005-07-19

    Applicant: BASF AG

    Abstract: Preparation of polyurethane-foaming substance (A) with reduced emission comprises: reacting polyisocyante with a compound (B) containing at least two reactive hydrogen atoms of isocyanates in the presence of a catalysts, where the catalyst is at least an alcohol compound (I). Preparation of polyurethane-foaming substance (A) with reduced emission comprises: reacting polyisocyanate with a compound containing at least two reactive hydrogen atoms of isocyanates in the presence of a catalyst, where the catalyst is an alcohol compound of formula (I). R1, R2 : -C aH 2a+1 or -C bH cN d; a : 1-4; b : 3-7; c : 6-14; d : 0-2; R3 : C eH fO g; e : 0-4; f : 0-8; g : 0-2; R4 : H, CH 3 or C 2H 5; and n, m : 1-5. An independent claim is also included for the polyurethane-foaming substance obtained by the method with a content of volatile organic compounds (less than 100 ppm) and condensable compounds (less than 250 ppm). [Image].

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