公开(公告)号：DE59610655D1

公开(公告)日：2003-09-18

申请号：DE59610655

申请日：1996-10-15

Applicant: BASF AG

Inventor： REICH DR ,  SCHWALM DR ,  BECK DR ,  HAEUSSLING DR ,  NUYKEN PROF DR ,  RAETHER ROMAN-BENEDIKT

IPC: C07D307/26 ,  C07D307/34 ,  C08F8/14 ,  C08F34/00 ,  C08F34/02 ,  C08G59/24 ,  C08G61/10 ,  C08G61/12 ,  C08G65/14 ,  C08G65/16 ,  C09D4/00 ,  C09D163/00

公开(公告)号：DE59711065D1

公开(公告)日：2004-01-15

申请号：DE59711065

申请日：1997-03-29

Applicant: BASF AG

Inventor： HAEUSSLING DR ,  KOCH DR ,  LEBKUECHER WERNER

IPC: C07D211/94 ,  C08F2/40 ,  C08J3/03 ,  C08K5/3432 ,  C08K5/3435 ,  C08K5/353 ,  C08L57/00 ,  C08L75/16 ,  C09D7/45 ,  C09D175/14 ,  C09D7/02

Abstract: Aqueous dispersions of compounds with copolymerisable ethylenically unsaturated groups contain a stabiliser containing at least a piperidin-N-oxyl group tetrasubstituted in 2,2,6,6-position by a 1-6C hydrocarbon group. he stabiliser is most preferably of formula (V). The stabiliser is present in an amount of 0.001-0.5 wt.%. The dispersions contains polyurethane compounds in an amount of 0.005-0.4 mol. ethylenically unsaturated groups per 100 g polyurethane.

公开(公告)号：DE59806322D1

公开(公告)日：2003-01-02

申请号：DE59806322

申请日：1998-07-13

Applicant: BASF AG

Inventor： MUELLER DR ,  PAULUS DR ,  HAEUSSLING DR

IPC: A61K9/52 ,  A61K47/02 ,  B01J21/04 ,  B01J25/04 ,  C01B37/00 ,  C01F7/02 ,  C01F7/34 ,  C01F7/36 ,  C09C1/40 ,  C12N11/14

Abstract: A solid (I) containing aluminIum oxide (Al2O3) is claimed, which is obtained by a process comprising contacting Al2O3 precursor(s) (II) with template compound(s) in a liquid medium, in which the template is a dendrimeric molecular nano-system (III) or mixture of 2 or more of these. Also claimed are: (i) the method of producing (I) in this way; and (ii) the use of (III) as template in the production of (I). Preferably The nano-system contains a nitrogen (N), phosphorus (P) or carbon (C) atom or a mixture of 2 or more of these as branch point. (I) also contains element(s) selected from sodium, potassium, calcium, magnesium, beryllium, boron, gallium, indium, silicon, germanium, tin, lead, bismuth, titanium, zirconium, hafnium, vanadium, niobium, tantalum, chromium, molybdenum, tungsten, manganese, rhenium, iron, cobalt, nickel, ruthenium, copper, zinc, cadmium, mercury and cerium.