公开(公告)号：AU1024501A

公开(公告)日：2001-04-23

申请号：AU1024501

申请日：2000-10-12

Applicant: BASF AG

Inventor： MEIER ANTJE ,  KRANIG WOLFGANG ,  BECK ERICH ,  REICH WOLFGANG ,  PAULUS WOLFGANG ,  SCHROF WOLFGANG

IPC: C08F222/10 ,  C08F222/20 ,  C08F290/06 ,  C09D4/00 ,  C09D4/06

Abstract: The invention relates to a method for the production of adhesive-free, reduced-migration and reduced-yellowing coatings, in particular Foliendeckstrichen. Inventive coating materials containing less than 0.1 weight % of a photoinitiator and even in the absence of a photoinitiator can be hardened by exposure to UV-radiation, if the coating materials contain (meth)acrylate groups (A) and >CH-O-ether structure units (B) in certain minimum amounts, whereby (A) and (B) can also be accommodated in one molecule or in different molecules. The method exhibits many economic, technical and toxicological advantages due to said reduction of the amount of photoinitiators or the absence of photoinitiators.

公开(公告)号：DE19949383A1

公开(公告)日：2001-04-19

申请号：DE19949383

申请日：1999-10-13

Applicant: BASF AG

Inventor： MEIER ANTJE ,  KRANIG WOLFGANG ,  BECK ERICH ,  REICH WOLFGANG ,  PAULUS WOLFGANG ,  SCHROF WOLFGANG

IPC: C08F222/10 ,  C08F222/20 ,  C08F290/06 ,  C09D133/06 ,  B05D3/06

Abstract: The invention relates to a method for the production of adhesive-free, reduced-migration and reduced-yellowing coatings, in particular Foliendeckstrichen. Inventive coating materials containing less than 0.1 weight % of a photoinitiator and even in the absence of a photoinitiator can be hardened by exposure to UV-radiation, if the coating materials contain (meth)acrylate groups (A) and >CH-O-ether structure units (B) in certain minimum amounts, whereby (A) and (B) can also be accommodated in one molecule or in different molecules. The method exhibits many economic, technical and toxicological advantages due to said reduction of the amount of photoinitiators or the absence of photoinitiators.