6.
    发明专利
    未知

    公开(公告)号:DE10345798A1

    公开(公告)日:2005-04-14

    申请号:DE10345798

    申请日:2003-09-30

    Applicant: BASF AG

    Abstract: Ethylene copolymer waxes containing amino groups, and use thereof Ethylene copolymer waxes with a molecular weight M w in the range from 1000 to 20 000 g/mol, which comprise, as copolymerized comonomers, (c) from 50 to 95% by weight of ethylene, (d) from 5 to 50% by weight of at least one comonomer which has at least one alkylated or cycloalkylated amino group, each of which has bonding via a spacer to a polymerizable group, (e) from 0 to 30% by weight of other comonomers, where all % by weight data are based on the entire weight of ethylene copolymer wax.

    Aqueous dispersion, useful e.g. as microbicide agent, comprises an ethylene copolymer comprising ethylene and comonomer

    公开(公告)号:DE102005007158A1

    公开(公告)日:2006-08-24

    申请号:DE102005007158

    申请日:2005-02-16

    Applicant: BASF AG

    Abstract: Aqueous dispersion (A) comprises at least an ethylene copolymer (A1) (with a molecular weight of 1000-20000 g/mol and which is contained as a polymerized comonomer) comprising ethylene (a) (50-99 wt.%), comonomer (b) (1-50 wt.%) exhibiting at least a nitrogen containing heteroaromatic group and a further comonomer (c) (0-49 wt.%), where the components constitutes the total mass of (A1). Independent claims are included for: (1) at least a partially protonated (A1); (2) the preparation of a partially protonated (A1) comprising reaction of (A1) with at least a partially protonated Bronsted acid; (3) the preparation of at least a partially alkylated or benzylated ethylene copolymer comprising preparing the non-quaternized ethylene copolymer, and reacting ethylene copolymer with an alkyl compound of formula (R3>-Z); and (4) the preparation of (A1) comprising reacting ethylene with at least a comonomer of formula (IV) in the presence of a polymer analogue of formula (A2>-Ar). R1>, R2>H or 1-10C alkyl; Ar : a heteraromatic group optionally containing one/two nitrogen atoms and a further heteroatom; R3>1-10C alkyl or benzyl; Z : leaving group; A2>residues with up to 50 atoms and at least OH or NH2 or NHR1>4> group; Y1>OH, O-R1>3>, NH2, NHR1>4> or N(R1>4>)2; R1>3>1-4C alkyl (particularly methyl); and R1>4>1-10C alkyl. [Image].

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