公开(公告)号：JPH06162497A

公开(公告)日：1994-06-10

申请号：JP19851493

申请日：1993-08-10

Applicant: BASF MAGNETICS GMBH

Inventor： GERUTO FUITSUSHIYAA ,  ARUFUREETO HAAGEMAIAA ,  GEERUHARUTO KOTSUKUSU ,  HARUTOMUUTO HIBUSUTO

IPC: G11B5/64 ,  G11B5/84

Abstract: PURPOSE: To enable the increase of perpendicular coercive force and saturation magnetization without rising a substrate temp. and to improve a reproducing level by subjecting a polymer substrate film to a plasma pretreatment by etching using a prescribed gas then depositing a magnetic material layer by evaporation. CONSTITUTION: The magnetic recording medium formed by laminating cobalt/ chromium layers of coherent ferromagnetic thin layers on the polymer material is subjected to the plasma pretreatment by ion etching or plasma etching using the nitrogen- or oxygen-contg. gas. At this time, the magnetic moment per cobalt atom in the magnetic layer is increased and the perpendicular coercive force is increased. As a result, the recording properties and reproducing level are improved without rising the temp. of the substrate.