公开(公告)号：JPH06203377A

公开(公告)日：1994-07-22

申请号：JP29032893

申请日：1993-11-19

Applicant: BASF MAGNETICS GMBH

Inventor： ARUFUREETO HAAGEMAIAA ,  HARUTOMUUTO HIBUSUTO ,  RIHIYARUTO MAURAA ,  HERUMUUTO YAKUSHIYU ,  DEIITAA BOIERURE ,  YOHANESU HAITSU

IPC: G11B5/842 ,  G11B5/84

Abstract: PURPOSE: To improve the adhesiveness of a magnetic layer to a polymer substrate by irradiating the substrate with UV having such energy density as not to cause ablation in a specified wavelength region by means of excimer laser. CONSTITUTION: A polymer substrate is irradiated with UV having such energy density as not to cause ablation in the wavelength region of 150-400nm by means of a noninterference excimer plan or excimer laser. The energy density depends on the polymer. In this case, UV excimer laser is preferably used and the number of pulses is preferably made as small as 1-25 pulses per unit area of the substrate. The treated substrate is coated with a magnetic coating material prepd. by dispersing a pigment in a binder mixture contg. polyurethane, a dried binder, a dispersant, a lubricant and inorg. filler particles and then orientation with a magnet and smoothening by calendering are carried out.