公开(公告)号：JPH06200059A

公开(公告)日：1994-07-19

申请号：JP23504393

申请日：1993-09-21

Applicant: BASF MAGNETICS GMBH

Inventor： ARUFUREETO HAAGEMAIA ,  HARUTOMUUTO HIBUSUTO ,  DEIITAA BOIERE ,  YOHANESU HAITSU

IPC: B29C35/08 ,  B29C59/16 ,  B29C65/00 ,  C08J5/12 ,  C08J7/00

公开(公告)号：JPH05217164A

公开(公告)日：1993-08-27

申请号：JP21015692

申请日：1992-08-06

Applicant: BASF MAGNETICS GMBH

Inventor： ARUFUREETO HAAGEMAIYAA ,  ANDOREASU FUERUSUKE ,  HARUTOMUUTO HIBUSUTO ,  DEIITAA BOIERE ,  YOHANESU HAITSU

IPC: G11B5/64 ,  G11B5/73 ,  G11B5/84 ,  H01F10/00

Abstract: PURPOSE: To provide a method for producing a magnetic recording medium having a ferromagnetic metallic tightly adhered thin layer formed on a polymer substrate without bringing about defects arising thus far, and more particularly, greatly improves the adhesiveness of the metallic layer to the substrate, forming a uniform and mechanically stable metallic layer free from defects, such as cracks and internal strains, and assuring the homogenous characteristics over a wide area with a high-speed and short-time treatment. CONSTITUTION: This method is for production of magnetic recording medium consisting essentially of polymer substrate, ferromagnetic metallic tightly adhered thin layer applied on the surface of the substrate by PVD method and if necessary, a protective layer formed on the metallic layer. The polymer substrate is exposed to UV radiations which are induced by the cracking of excimer and has a wavelength from 150 to 400nm and has an energy density below the abrasion threshold prior to the application of the metallic layer.

公开(公告)号：JPH06203377A

公开(公告)日：1994-07-22

申请号：JP29032893

申请日：1993-11-19

Applicant: BASF MAGNETICS GMBH

Inventor： ARUFUREETO HAAGEMAIAA ,  HARUTOMUUTO HIBUSUTO ,  RIHIYARUTO MAURAA ,  HERUMUUTO YAKUSHIYU ,  DEIITAA BOIERURE ,  YOHANESU HAITSU

IPC: G11B5/842 ,  G11B5/84

Abstract: PURPOSE: To improve the adhesiveness of a magnetic layer to a polymer substrate by irradiating the substrate with UV having such energy density as not to cause ablation in a specified wavelength region by means of excimer laser. CONSTITUTION: A polymer substrate is irradiated with UV having such energy density as not to cause ablation in the wavelength region of 150-400nm by means of a noninterference excimer plan or excimer laser. The energy density depends on the polymer. In this case, UV excimer laser is preferably used and the number of pulses is preferably made as small as 1-25 pulses per unit area of the substrate. The treated substrate is coated with a magnetic coating material prepd. by dispersing a pigment in a binder mixture contg. polyurethane, a dried binder, a dispersant, a lubricant and inorg. filler particles and then orientation with a magnet and smoothening by calendering are carried out.

公开(公告)号：JPH0680805A

公开(公告)日：1994-03-22

申请号：JP8059393

申请日：1993-04-07

Applicant: BASF MAGNETICS GMBH

Inventor： ARUFUREETO HAAGEMAIYAA ,  HANSUUPEETAA SHIRUTOBERUKU ,  HARUTOMUUTO HIBUSUTO ,  DEIITAA BOIERE ,  YOHANESU HAITSU

IPC: B29C71/04 ,  B29C35/08 ,  B29C59/16 ,  B29K67/00 ,  C08J7/00