公开(公告)号：SG11201802577PA

公开(公告)日：2018-06-28

申请号：SG11201802577P

申请日：2016-11-18

Applicant: BASF SE

Inventor： ADERMANN TORBEN ,  LOEFFLER DANIEL ,  LIMBURG CAROLIN ,  ABELS FALKO ,  WILMER HAGEN ,  GILL MONICA ,  GRIFFITHS MATTHEW ,  BARRY SÉAN

IPC: C23C16/18 ,  C07F13/00 ,  C07F15/04 ,  C07F15/06 ,  C23C16/455

Abstract: The present invention is in the field of processes for the generation of thin inorganic films on substrates, in particular atomic layer deposition processes. The present invention relates to a process comprising bringing a compound of general formula (I) into the gaseous or aerosol state and depositing the compound of general formula (I) from the gaseous or aerosol state onto a solid substrate, wherein R1, R2, R3, and R4 are independent of each other an alkyl group, an aryl group or a trialkylsilyl group, M is Mn, Ni or Co, X is a ligand which coordinates M, wherein at least one X is a neutrally charged ligand, m is 1, 2 or 3 and n is at least 1 wherein the molecular weight of the compound of general formula (I) is up to 1000 g/mol.