公开(公告)号：SG187756A1

公开(公告)日：2013-03-28

申请号：SG2013009360

申请日：2011-08-25

Applicant: BASF SE

Inventor： BRAUN SIMON ,  KLIPP ANDREAS ,  ROEGER-GOEPFERT CORNELIA ,  BITTNER CHRISTIAN ,  SHEN MEICHIN ,  LIN CHENGWEI

Abstract: An aqueous acidic solution and an aqueous acidic etching solution suitable for texturizing the surface of single crystal and polycrystal silicon substrates, hydrofluoric acid; nitric acid; and at least one anionic polyether, which is surface active; a method for texturizing the surface of single crystal and polycrystal silicon substrates comprising the step of (1 ) contacting at least one major surface of a substrate with the said aqueous acidic etching solution; (2) etching the at least one major surface of the substrate for a time and at a temperature sufficient to obtain a surface texturization consisting of recesses and protrusions; and (3) removing the at least one major surface of the substrate from the contact with the aqueous acidic etching solution; and a method for manufacturing photovoltaic cells and solar cells using the said solution and the said texturizing method.

公开(公告)号：EP2611881A4

公开(公告)日：2017-08-30

申请号：EP11821199

申请日：2011-08-25

Applicant: BASF SE

Inventor： BRAUN SIMON ,  KLIPP ANDREAS ,  RÖGER-GÖPFERT CORNELIA ,  BITTNER CHRISTIAN ,  SHEN MEICHIN ,  LIN CHENGWEI

IPC: C09K13/08 ,  H01L21/302

CPC classification number: H01L21/30604 ,  C09K13/08 ,  H01L21/30608 ,  H01L31/022425 ,  H01L31/02363 ,  H01L31/18 ,  Y02E10/50 ,  Y10T428/24355