Abstract:
A process for fabricating lasers capable of emitting blue light wherein a GaN wafer is etched to form laser waveguides and mirrors using a temperature of over 500 °C and an ion beam in excess of 500 V in CAIBE.
Abstract:
An integrated semiconductor laser device capable of emitting light of selected wavelengths includes multiple ring lasers of different cavity lengths coupled in series or in parallel to a common output to produce an output beam having a wavelength corresponding to the selected ring lasers.
Abstract:
A single-mode, etched facet distributed Bragg reflector laser includes an A1GalnAs/InP laser cavity (70), a front mirror stack (32) with multiple Fabry-Perot elements (60, 62, 64, 66), a rear DBR reflector (68), and rear detector. The front mirror stack elements and the rear reflector elements include input and output etched facets (72, 76), and the laser cavity is an etched ridge cavity, all formed from an epitaxial wafer (30) by a two-step lithography and CAIBE process.
Abstract:
Unidirectionality of lasers is enhanced by forming one or more etched gaps (78, 80) in the laser cavity. The gaps may be provided in any segment of a laser, such as any leg of a ring laser, or in one leg (62) of a V-shaped laser (60). A Brewster angle facet at the distal end of a photonic device coupled to the laser reduces back-reflection into the laser cavity. A distributed Bragg reflector is used at the output of a laser to enhance the side-mode suppression ratio of the laser.
Abstract:
A single-mode, etched facet distributed Bragg reflector laser includes an A1GalnAs/InP laser cavity (70), a front mirror stack (32) with multiple Fabry-Perot elements (60, 62, 64, 66), a rear DBR reflector (68), and rear detector. The front mirror stack elements and the rear reflector elements include input and output etched facets (72, 76), and the laser cavity is an etched ridge cavity, all formed from an epitaxial wafer (30) by a two-step lithography and CAIBE process.
Abstract:
Unidirectionality of lasers is enhanced by forming one or more etched gaps (78, 80) in the laser cavity. The gaps may be provided in any segment of a laser, such as any leg of a ring laser, or in one leg (62) of a V-shaped laser (60). A Brewster angle facet at the distal end of a photonic device coupled to the laser reduces back-reflection into the laser cavity. A distributed Bragg reflector is used at the output of a laser to enhance the side-mode suppression ratio of the laser.
Abstract:
Three-dimensional structures of arbitrary shape are fabricated on the surface of a substrate (10) through a series of processing steps wherein a monolithic structure is fabricated in successive layers. A first layer (14) of photoresist material is spun onto a substrate (10) surface (18) and is exposed (26) in a desired pattern corresponding to the shape of a final structure, at a corresponding cross-sectional level in the structure. The layer is not developed after exposure; instead, a second layer (30) of photoresist material is deposited and is also exposed (32) in a desired pattern. Subsequent layers (40,52,64) spun onto the top surface of prior layers (14,30) and exposed (44,54,66), and upon completion of the succession of layers each defining corresponding levels of the desired structure, the layers are all developed at the same time leaving the three-dimensional structure (22).
Abstract:
An integrated semiconductor laser device capable of emitting light of selected wavelengths includes multiple ring lasers of different cavity lengths coupled in series or in parallel to a common output to produce an output beam having a wavelength corresponding to the selected ring lasers.