公开(公告)号：JPH0628104B2

公开(公告)日：1994-04-13

申请号：JP27354984

申请日：1984-12-26

Applicant: BASF AG

Inventor： AUGUSUTO REENAA ,  ARUBERUTO KOORU ,  HERUMAN RORAA ,  UERUNAA BARUTSU ,  EEBAAHARUTO KESUTAA ,  FURIIDORIHI ZOMAAMAN

IPC: C09D5/23 ,  C09D7/12 ,  C10M105/24 ,  C10M105/68 ,  C10N10/04 ,  C10N40/18 ,  G11B5/71

公开(公告)号：JPS6478885A

公开(公告)日：1989-03-24

申请号：JP13453488

申请日：1988-06-02

Applicant: BASF AG

Inventor： EEBAAHARUTO KESUTAA ,  HARARUTO KUPERUMAIERU ,  HERUMUUTO SHIYUTAININGAA ,  HANSUUBERUTORAMU BUIIGEMAN

IPC: B41M5/26 ,  G11B7/24 ,  G11B7/243

Abstract: PURPOSE: To improve the manufacture, sensitivity and S/N ratio by adjusting a content of Au in a recording layer manufactured by spattering Au and at least one of specific metals onto a base at least two times, the average particle diameter of the particles generating the surface protuberance and the average phase depth to be specific values. CONSTITUTION: A recording layer comprising a base stable in size, Au and at least one of the metals selected from Ru, Rh, Rd, Ag, Cu, Re, Oc, Tr and Pt includes 15-85 wt.% of Au to the total amount of the recording layer, and has the surface protuberance with 10-200 mm of average particle diameter. Further the average phase thickness (d) is 5-300 nm when it is represented by a formula; d=(dmin +dmax )/2 (dmin is the average thickness of ten particles of the thinnest part of the recording layer, and dmax is the average thickness of ten particles of the thickest part).

公开(公告)号：JPH0344379B2

公开(公告)日：1991-07-05

申请号：JP22720082

申请日：1982-12-27

Applicant: BASF AG

Inventor： MIRENA MERUTSUAA ,  NORUBERUTO SHUNAIDAA ,  HERUMUUTO KOPUKE ,  KURAUSU SHETORE ,  EEBAAHARUTO KESUTAA ,  UERUNAA BARUTSU ,  UERUNAA GURAU

IPC: C08L75/06 ,  C09D5/23 ,  C09D171/00 ,  C09D171/10 ,  C09D175/06 ,  G11B5/70 ,  G11B5/702 ,  G11B5/84 ,  G11B5/842

公开(公告)号：JPS6199928A

公开(公告)日：1986-05-19

申请号：JP22202085

申请日：1985-10-07

Applicant: Basf Ag

Inventor： ARUBERUTO KOORU ,  MIRENA MERUTSUAA ,  AUGUSUTO REENAA ,  NORUBERUTO SHIYUNAIDAA ,  EEBAAHARUTO KESUTAA ,  BUERUNAA BARUTSU ,  FURIIDORIHI ZOMAAMAN ,  ERUNSUTO RIKAA

IPC: G11B5/702 ,  C09D5/23 ,  C09D127/04 ,  C09D127/06 ,  C09D163/00 ,  C09D167/00 ,  C09D171/00 ,  C09D171/12 ,  C09D175/00 ,  C09D175/04 ,  C10M105/58 ,  C10N40/18 ,  G11B5/708 ,  G11B5/71

CPC classification number: G11B5/71 ,  Y10S428/90 ,  Y10T428/31504 ,  Y10T428/31935

公开(公告)号：JPS60127522A

公开(公告)日：1985-07-08

申请号：JP24092184

申请日：1984-11-16

Applicant: BASF AG

Inventor： AUGUSUTO REENAA ,  HERUMUUTO KOPUKE ,  HERUMAN RORAA ,  BUERUNAA BARUTSU ,  BUERUNAA GURAU ,  EEBAAHARUTO KESUTAA ,  FURIIDORIHI ZOMAAMAN

IPC: C09D5/23 ,  C09D127/04 ,  C09D127/06 ,  C09D175/00 ,  C09D175/02 ,  C09D175/04 ,  G11B5/702 ,  H01F10/10

公开(公告)号：JPS60160025A

公开(公告)日：1985-08-21

申请号：JP27354984

申请日：1984-12-26

Applicant: BASF AG

Inventor： AUGUSUTO REENAA ,  ARUBERUTO KOORU ,  HERUMAN RORAA ,  BUERUNAA BARUTSU ,  EEBAAHARUTO KESUTAA ,  FURIIDORIHI ZOMAAMAN

IPC: C09D5/23 ,  C09D7/12 ,  C10M105/24 ,  C10M105/68 ,  C10N10/04 ,  C10N40/18 ,  G11B5/71

公开(公告)号：JPS59139130A

公开(公告)日：1984-08-09

申请号：JP24498583

申请日：1983-12-27

Applicant: Basf Ag

Inventor： ARUBERUTO KOORU ,  BUERUNAA BARUTSU ,  MIRENA MERUTSUAA ,  NORUBERUTO SHIYUNAIDAA ,  EEBAAHARUTO KESUTAA ,  AUGUSUTO REENAA

IPC: C08F20/26 ,  C08F220/26 ,  C09D5/23 ,  C09D133/04 ,  C09D133/08 ,  C09D175/00 ,  C09D175/04 ,  G11B5/70 ,  G11B5/702

CPC classification number: G11B5/7013 ,  G11B5/7022 ,  G11B5/7023 ,  G11B5/7028

公开(公告)号：JPS58115630A

公开(公告)日：1983-07-09

申请号：JP22720082

申请日：1982-12-27

Applicant: BASF AG

Inventor： MIRENA MERUTSUAA ,  NORUBERUTO SHIYUNAIDAA ,  HERUMUUTO KOPUKE ,  KURAUSU SHIETORE ,  EEBAAHARUTO KESUTAA ,  BUERUNAA BARUTSU ,  BUERUNAA GURAU

IPC: C08L75/06 ,  C09D5/23 ,  C09D171/00 ,  C09D171/10 ,  C09D175/06 ,  G11B5/70 ,  G11B5/702 ,  G11B5/84 ,  G11B5/842