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公开(公告)号：WO03028915A9
公开(公告)日：2004-12-29
申请号：PCT/US0231075
申请日：2002-10-01
Applicant: CANDESCENT INTELLECTUAL PROP
Inventor： FAHLEN THEODORE S , HOPPLE GEORGE B , PORTER JOHN D , BARTON ROGER W , MACKEY BOB L
CPC classification number: C03C17/36 , B32B17/10018 , C03C17/002 , C03C2217/40 , C03C2218/335 , H01J9/242 , H01J2211/36 , H01J2329/00 , H01J2329/8625 , Y10T29/49126 , Y10T29/49616 , Y10T29/49812 , Y10T29/49885 , Y10T29/49904 , Y10T29/4998
Abstract: A method of fabricating a support structure (118). In one embodiment, the method is comprised of providing a mold (220). The mold (220) is for defining the physical dimension of the support structure. The mold (220) is disposed upon a substrate surface (210). In one embodiment, the method is further comprised of depositing a powder (230) into the mold (220). The present method is further comprised of compacting the powder (230) deposited in the mold (220). The compacting forms the support structure (118). In one embodiment, the method is further comprised of removing the mold (220) from the substrate surface (210) upon which it is disposed. The removal of the mold (220) exposes the support structure (118). The fabricated support structure (118) is then implementable during assembly of a display device (100). In one embodiment, the powder (230) deposited in the mold (220) is a metal powder (230).
Abstract translation: 一种制造支撑结构（118）的方法。 在一个实施例中，该方法包括提供模具（220）。 模具（220）用于限定支撑结构的物理尺寸。 模具（220）设置在基板表面（210）上。 在一个实施例中，该方法还包括将粉末（230）沉积到模具（220）中。 本方法还包括压实沉积在模具（220）中的粉末（230）。 压实形成支撑结构（118）。 在一个实施例中，该方法还包括从其上设置的基板表面（210）移除模具（220）。 模具（220）的移除使支撑结构（118）暴露。 然后，在组装显示装置（100）期间可以实现制造的支撑结构（118）。 在一个实施例中，沉积在模具（220）中的粉末（230）是金属粉末（230）。
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公开(公告)号：WO0156050A3
公开(公告)日：2002-04-25
申请号：PCT/US0100712
申请日：2001-01-08
Applicant: CANDESCENT INTELLECTUAL PROP
Inventor： PAN LAWRENCE S , SCHROPP DONALD R JR , CHARAKOV VASIL M , O'REILLY JOHN K , HOPPLE GEORGE B , SPINDT CHRISTOPHER J , BARTON ROGER W , NYSTROM MICHAEL J , RAMESH RAMAMOORTHY , DUNPHY JAMES C , PEI SHIYOU , NARAYANAN KOLLENGODE
CPC classification number: H01J9/242 , H01J29/028 , H01J29/864 , H01J31/123 , H01J61/30 , H01J61/305 , H01J2329/864 , H01J2329/8645
Abstract: The present invention provides a spacer assembly (100) which is tailored to provide a secondary electron emission coefficient of approximately 1 for the spacer assembly (100) when the spacer assembly (100) is subjected to flat panel display operating voltages. The present invention further provides a spacer assembly (100) which accomplishes the above achievement and which does not degrade severely when subjected to electron bombardment. The present invention further provides a spacer assembly (100) which accomplishes both of the above-listed achievements and which does not significantly contribute to contamination of the vacuum environment of the flat panel display or be susceptible to contamination that may evolve within the tube. Specifically, in one embodiment, the present invention is comprised of a spacer structure (102) which has a specific secondary electron emission coefficient function associated therewith. The material comprising the spacer structure (102) is tailored to provide a secondary electron emission coefficient of approximately 1 for the spacer assembly (100) when the spacer assembly (100) is subjected to flat panel display operating voltages.
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Patent Agency Ranking
公开(公告)号：DE60126747D1
公开(公告)日：2007-04-05
申请号：DE60126747
申请日：2001-01-08
Applicant: CANDESCENT INTELLECTUAL PROP
Inventor： PAN LAWRENCE S , SCHROPP DONALD R JR , CHAKAROV VASIL M , O'REILLY JOHN K , HOPPLE GEORGE B , SPINDT CHRISTOPHER J , BARTON ROGER W , NYSTROM MICHAEL J , RAMESH RAMAMOORTHY , DUNPHY JAMES C , PEI SHIYOU , NARAYANAN KOLLENGODE
Abstract: A flat panel display apparatus comprising: a faceplate, a backplate disposed opposing said faceplate, said faceplate and said backplate adapted to be connected in a sealed environment such that a low pressure region exists between said faceplate and said backplate; a spacer assembly (900) disposed within said sealed environment, said spacer assembly supporting said faceplate and said backplate against forces acting in a direction towards said sealed environment, said spacer assembly tailored to provide a secondary electron emission coefficient of approximately 1 for said spacer assembly when said spacer assembly is subjected to flat panel display operating voltages, said spacer assembly further including a spacer structure (902); and a coating material (904) applied to at least a portion of said spacer structure, wherein said coating material is comprised of a layered material that is oriented with its basal plane parallel to a face of said spacer structure (902).
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公开(公告)号：DE69835013D1
公开(公告)日：2006-08-03
申请号：DE69835013
申请日：1998-05-26
Applicant: CANDESCENT INTELLECTUAL PROP
Abstract: An electron-emitting device utilizes an emitter electrode (12) shaped like a ladder in which a line of emitter openings (18) extend through the electrode. In fabricating the device, the emitter openings can be utilized to self-align certain edges, such as edges (38C) of a focusing system (37), to other edges, such as edges (28C) of control electrodes (28), to obtain desired lateral spacings. The self-alignment is typically achieved with the assistance of a backside photolithographic exposure operation. The ladder shape of the emitter electrode also facilitates the removal of short-circuit defects involving the electrode.
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公开(公告)号：DE69835013T2
公开(公告)日：2007-01-11
申请号：DE69835013
申请日：1998-05-26
Applicant: CANDESCENT INTELLECTUAL PROP
Abstract: An electron-emitting device utilizes an emitter electrode (12) shaped like a ladder in which a line of emitter openings (18) extend through the electrode. In fabricating the device, the emitter openings can be utilized to self-align certain edges, such as edges (38C) of a focusing system (37), to other edges, such as edges (28C) of control electrodes (28), to obtain desired lateral spacings. The self-alignment is typically achieved with the assistance of a backside photolithographic exposure operation. The ladder shape of the emitter electrode also facilitates the removal of short-circuit defects involving the electrode.
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6.发明公开STRUCTURE AND FABRICATION OF ELECTRON-EMITTING DEVICE HAVING SPECIALLY CONFIGURED FOCUS COATING 失效结构和电子发射设备的方法，特别注重LAYER
公开(公告)号：EP0985222A4
公开(公告)日：2006-04-19
申请号：EP98928822
申请日：1998-05-27
Applicant: CANDESCENT INTELLECTUAL PROP
Inventor： HAVEN DUANE A , BARTON ROGER W , SPINDT CHRISTOPHER J , KNALL N JOHAN , OBERG STEPHANIE J
IPC: H01J1/304 , H01J31/12 , H01J1/30 , H01J3/02 , H01J3/18 , H01J9/02 , H01J9/14 , H01J19/24 , H01J29/46 , H01J29/62
CPC classification number: H01J3/022 , H01J9/148 , H01J29/467
Abstract: An electron-emitting device contains an electron focusing system (37 or 37A) formed with a base focusing structure (38 or 38A) and a focus coating (39 or 39A) that penetrates, preferably only pathway, into a focus opening (40) extending through the base focusing structure. The focus coating, normally of lower resistivity than the base focusing structure, is typically formed by an angled deposition technique. An access conductor (106 or 106A) is preferably electrically coupled to the lower surface of the focus coating. A potential for controlling the focusing of electrons that travel through the focus opening is provided to the focus coating via the access conductor.
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7.发明公开STRUCTURE AND FABRICATION OF ELECTRON-EMITTING DEVICE HAVING LADDER-LIKE EMITTER ELECTRODE 失效结构和电子发射装置的头部相似发射电极的制备
公开(公告)号：EP0985220A4
公开(公告)日：2002-11-27
申请号：EP98924767
申请日：1998-05-26
Applicant: CANDESCENT INTELLECTUAL PROP
Inventor： SPINDT CHRISTOPHER J , OBERG STEPHANIE J , HAVEN DUANE A , BARTON ROGER W , LEARN ARTHUR J , BASCOM VICTORIA A
CPC classification number: H01J9/025 , H01J3/022 , H01J2329/00
Abstract: An electron-emitting device utilizes an emitter electrode (12) shaped like a ladder in which a line of emitter openings (18) extend through the electrode. In fabricating the device, the emitter openings can be utilized to self-align certain edges, such as edges (38C) of a focusing system (37), to other edges, such as edges (28C) of control electrodes (28), to obtain desired lateral spacings. The self-alignment is typically achieved with the assistance of a backside photolithographic exposure operation. The ladder shape of the emitter electrode also facilitates the removal of short-circuit defects involving the electrode.
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