公开(公告)号：HK1016744A1

公开(公告)日：1999-11-05

申请号：HK99101507

申请日：1999-04-12

Applicant: CANDESCENT TECH CORP

Inventor： SPINDT CHRISTOPHER J ,  CHAKAROVA GABRIELA S ,  NIKOLOVA MARIA S ,  SEARSON PETER C ,  HAVEN DUANE A ,  KNALL NILS JOHAN ,  MACAULAY JOHN C ,  BARTON ROGER W

IPC: B81C1/00 ,  C25F3/14 ,  H01J9/02 ,  H01J

Abstract: An electrochemical technique is employed for removing certain material from a partially finished structure without significantly chemically attacking certain other material of the same chemical type as the removed material. The partially finished structure contains a first electrically non-insulating layer (52C) consisting at least partially of first material, typically excess emitter material that accumulates during the deposition of the emitter material to form electron-emissive elements (52A) in an electron emitter, that overlies an electrically insulating layer (44). An electrically non-insulating member, such as an electron-emissive element, consisting at least partially of the first material is situated at least partly in an opening (50) extending through the insulating layer. With the partially finished structure so arranged, at least part of the first material of the first non-insulating layer is electrochemically removed such that the non-insulating member is exposed without significantly attacking the first material of the non-insulating member.

公开(公告)号：EP0993513A4

公开(公告)日：2001-04-04

申请号：EP98931401

申请日：1998-06-29

Applicant: CANDESCENT TECH CORP

Inventor： KNALL N JOHAN ,  PORTER JOHN D ,  SPINDT CHRISTOPHER J ,  CHAKAROVA GABRIELA S ,  HAVEN DUANE A ,  MACAULAY JOHN C ,  BARTON ROGER W ,  NIKOLOVA MARIA S ,  SEARSON PETER C

IPC: C25F5/00 ,  C25F3/02 ,  C25F3/14 ,  H01J9/02 ,  C25D5/02 ,  B23H3/00 ,  B44C1/22 ,  C25D5/48 ,  C25F3/00 ,  H01J1/02 ,  H01J1/62

CPC classification number: H01J9/025

Abstract: An impedance-assisted electrochemical procedure is employed for selectively removing certain material from a structure without significantly electrochemically attacking, and thus without significantly removing, certain other material of the same chemical type as the removed material.

Abstract translation: 阻抗辅助电化学过程被用于选择性地从结构中去除某些材料，而不显着电化学攻击，因而不除去显着相同的化学类型的，某些其他材料作为移除的材料。