FABRICATION OF GATED ELECTRON-EMITTING DEVICE UTILIZING DISTRIBUTED PARTICLES TO DEFINE GATE OPENINGS
    1.
    发明申请
    FABRICATION OF GATED ELECTRON-EMITTING DEVICE UTILIZING DISTRIBUTED PARTICLES TO DEFINE GATE OPENINGS 审中-公开
    使用分布式颗粒的定位电子发射装置的制造来定义门盖开口

    公开(公告)号:WO1997047021A1

    公开(公告)日:1997-12-11

    申请号:PCT/US1997009198

    申请日:1997-06-05

    CPC classification number: H01J9/025 H01J2329/00

    Abstract: An electron-emitter having a lower non-insulating emitter region (42), an overlying insulating layer (44), and a gate layer (48A, 60A, 60B, 120A, or 180A/184) is fabricated by a process in which particles (46) are distributed over one of the following layers: the insulating layer, the gate layer, a primary layer (50A, 62A, or 72) provided over the gate layer, a further layer (74) provided over the primary layer, or a pattern-transfer layer (182). The particles are utilized in defining gate openings (54, 66, 80, 122, or 186/188) through the gate layer. The gate openings are then variously employed in forming dielectric openings (56, 58, 80, 114, 128, 144, or 154) through the insulating layer. Electron-emissive elements that can, for example, be shaped like cones (58A or 70A) or like filaments (106B, 116B, 130A, 146A, or 156B) are formed in the dielectric openings.

    Abstract translation: 具有下部非绝缘发射极区域(42),上覆绝缘层(44)和栅极层(48A,60A,60B,120A或180A / 184)的电子发射体通过其中颗粒 (46)分布在以下层之一上:绝缘层,栅极层,设置在栅极层上的初级层(50A,62A或72),设置在主层上的另一层(74),或 图案转印层(182)。 这些颗粒用于通过栅极层限定栅极开口(54,66,80,122或186/188)。 然后,通过绝缘层形成电介质开口(56,58,80,114,128,144或154),各种门开口被不同地使用。 在电介质开口中形成电子发射元件,其可以例如成形为锥体(58A或70A)或类似的细丝(106B,116B,130A,146A或156B)。

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